Fresenius' Journal of Analytical Chemistry

, Volume 353, Issue 3–4, pp 456–463 | Cite as

Comparative investigation on copper oxides by depth profiling using XPS, RBS and GDOES

  • H. Bubert
  • E. Grallath
  • A. Quentmeier
  • M. Wielunski
  • L. Borucki
Postersession New Possibilities For Quantification

Abstract

Depth profiling has been performed by using X-ray photoelectron spectrometry (XPS) in combination with Ar-ion sputtering, Rutherford backscattering spectrometry (RBS) and glow discharge optical emission spectrometry (GDOES). The data obtained by XPS have been subjected to factor analysis in order to determine the compositional layering of the copper oxides. This leads to two or three relevant components within the oxide layers consisting of Cu2O or CuO dependent on the sample preparation. GDOES measurements show sputtering profiles which are seriously influenced by a varying sputter rate. To ensure the results obtained so far, RBS measurements of the oxide layers have been carried out in order to discover artefacts of the other methods used and to demonstrate the excellent suitability of RBS for quantitative analysis of these layers. Chemical analysis consisting of (1) carrier-gas fusion analysis (CGFA) and (2) selective dissolution of Cu2O/CuO allows the determination of the total amount of oxygen and copper, respectively, and can serve as a cornerstone of quantitative analysis.

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Copyright information

© Springer-Verlag 1995

Authors and Affiliations

  • H. Bubert
    • 1
  • E. Grallath
    • 2
  • A. Quentmeier
    • 1
  • M. Wielunski
    • 3
  • L. Borucki
    • 4
  1. 1.Institut für Spektrochemie und angewandte Spektroskopie (ISAS)DortmundGermany
  2. 2.Laboratorium für ReinststoffanalytikMlas-Planck-Institut für MetallforschungDortmundGermany
  3. 3.Dynamitron-Tandem-LaboratoriumRuhr-Universität BochumBochumGermany
  4. 4.Institut für Experimentalphysik IIIRuhr-Universität BochumBochumGermany

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