Journal of Applied Electrochemistry

, Volume 24, Issue 3, pp 189–194 | Cite as

Origin of ohmic losses at Co3O4/Ti electrodes

  • D. Baronetto
  • I. M. Kodintsev
  • S. Trasatti
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Abstract

Co3O4/Ti and NiCo2O4/Ti electrodes were prepared in different ways to investigate the origin of the ohmic losses observed experimentally. In particular, titanium was pretreated in various ways including etching with a HF mixture, and reduction by cathodic hydrogen discharge prior to coating. Different types of commercial titanium and different concentrations of the precursors in solution were also tried. Some electrodes were prepared with a RuO2 interlayer. Nickel and mild steel were also used as supports. Parameters to quantify the ohmic losses were the peak distance in voltammetric curves, and the initial slope and the deviation from linearity of current vs sweep rate plots. The experimental picture corroborates the view that the main component of the ohmic drop comes from the insulating barrier which forms at the support/oxide layer interface. The intrinsic conductivity of spinels does not appear to represent the main problem for thermal layers as usually prepared.

Keywords

Hydrogen Titanium Nickel Mild Steel Layer Interface 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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References

  1. [1]
    S. Trasatti and W. E. O'Grady, in ‘Advances in Electrochemistry and Electrochemical Engineering’, Vol. 12 (edited by H. Gerischer and C. W. Tobias), Wiley-Interscience, New York (1980), p. 177.Google Scholar
  2. [2]
    M. B. Konovalov, V. I. Bystrov and V. L. Kubasov, Electrokhimiya 11 (1975) 239.Google Scholar
  3. [3]
    S. Trasatti, Mater. Chem. Phys. 16 (1987) 157.Google Scholar
  4. [4]
    R. Boggio, A. Carugati, G. Lodi and S. Trasatti, J. Appl. Electrochem. 15 (1985) 335.Google Scholar
  5. [5]
    R. Boggio, A. Carugati and S. Trasatti, ibid. 17 (1987) 828.Google Scholar
  6. [6]
    L. D. Burke and M. M. McCarthy, J. Electrochem. Soc. 135 (1988) 1175.Google Scholar
  7. [7]
    S. Valeri, G. Battaglin, G. Lodi and S. Trasatti, Colloids Surf. 19 (1986) 387.Google Scholar
  8. [8]
    C. Iwakura, A. Honji and H. Tamura, Electrochim. Acta 26 (1981) 1319.Google Scholar
  9. [9]
    V. K. Spynu, V. V. Shalaginov, N. V. Kozlova, I. A. Groza and D. M. Shub, Elektrokhimiya 22 (1986) 709.Google Scholar
  10. [10]
    M. Hamdani, J. F. Koenig and P. Chartier, J. Appl. Electrochem. 18 (1988) 568.Google Scholar
  11. [11]
    R. M. Torresi and C. P. De Pauli, Thin Solid Films 162 (1988) 353.Google Scholar
  12. [12]
    T. Ohtsuka, M. Masuda and N. Sato, J. Electrochem. Soc. 134 (1987) 2406.Google Scholar
  13. [13]
    C. Pirovano and S. Trasatti, J. Electroanal. Chem. 180 (1984) 171.Google Scholar
  14. [14]
    S. Trasatti and G. Lodi, in ‘Electrodes of Conductive Metallic Oxides’, (edited by S. Trasatti), Elsevier, Amsterdam (1980) Part A, p. 301.Google Scholar
  15. [15]
    M. Valigi and D. Gazzoli, in ‘Solid State Chemistry 1982’, Elsevier, Amsterdam (1983) p. 197.Google Scholar
  16. [16]
    M. Hamdani, J. F. Koenig and P. Chartier, J. Appl. Electrochem. 18 (1988) 561.Google Scholar
  17. [17]
    I. D. Belova, V. V. Shalaginov, B. Sh. Galyamov, Yu. E. Roginskaya and D. M. Shub, Zh. Neorg. Khim. 23 (1978) 286.Google Scholar
  18. [18]
    I. D. Belova, B. Sh. Galyamov and Yu. E. Roginskaya, Elektrokhimiya 18 (1982) 777.Google Scholar
  19. [19]
    P. Rasiyah and A. C. C. Tseung, J. Electrochem. Soc. 130 (1983) 365.Google Scholar

Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • D. Baronetto
    • 1
  • I. M. Kodintsev
    • 1
  • S. Trasatti
    • 1
  1. 1.Department of Physical Chemistry and ElectrochemistryUniversity of MilanMilanItaly

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