Skip to main content
SpringerLink
Log in

A Study on the properties of tellurium-oxide thin films based on the variable sputtering gas ratio

  • Published:
Journal of the Korean Physical Society Aims and scope Submit manuscript

Abstract

The properties of tellurium-oxide (TeO x ) thin films were investigated for applications in optical devices. The TeO x thin films were deposited by using the radio-frequency (RF) reactive sputtering method with TeO2 composite and Te metallic targets under various sputtering gas ratios. The effect of the Ar:O2 gas ratio on the composition and on the structural and optical properties of the TeO x thin films was evaluated for the two types of targets. The variation of the stoichiometry of the TeO x thin films was observed by using X-ray photoelectron spectroscopy (XPS). The formation of the Te-O bond was confirmed by using Fourier-transform infrared spectroscopy (FTIR). The O:Te atomic ratio of the TeO x thin films was divided into two ranges (1 < x < 2 and 2 < x < 3) for increasing O2 content in the sputtering gas mixture. Different optical properties were observed in the two groups of TeO x thin films. These study results demonstrated that TeO x is a useful material for realizing optical devices based on various O:Te atomic ratios.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. J. Liebertz, Kristall und Technik 4, 221 (1969).

    Article  Google Scholar 

  2. A. Mecseki, I. Foldvari and R. Voszka, Acta Phys. Acad. Sci. Hung. 53, 15 (1982).

    Article  Google Scholar 

  3. I. Abdulhalim, C. N. Pannell, J. Wang, G. Wylangowski and D. N. Payne, J. Appl. Phys. 75, 519 (1994).

    Article  ADS  Google Scholar 

  4. T. Yano, A. Fukumoto and A. Watanabe, J. Appl. Phys. 42, 3674 (1971).

    Article  ADS  Google Scholar 

  5. V. M. Kotov, G. N. Shkerdin, D. G. Shkerdin and E. V. Kotov, J. Opt. Technol. 72, 511 (2005).

    Article  ADS  Google Scholar 

  6. R. Nayak, V. Gupta, A. L. Dawar and K. Sreenivas, Thin Solid Films 445, 118 (2003).

    Article  ADS  Google Scholar 

  7. N. Dewan, V. Gupta, K. Sreenivas and R. S. Katiyar, J. Appl. Phys. 101, 084910 (2007).

    Article  ADS  Google Scholar 

  8. S. Kumar and A. Mansingh, J. Phys. D: Appl. Phys. 23, 1252, (1990).

    Article  ADS  Google Scholar 

  9. M. Takenaga, N. Yamada, K. Nishiuchi, N. Akahira, T. Ohta, S. Nakamura and T. Yamashita, J. Appl. Phys. 54, 5376 (1983).

    Article  ADS  Google Scholar 

  10. K. Arshak and O. Korostynska, Sensors 2, 347 (2002).

    Article  Google Scholar 

  11. S. M. Pietralunga, M. Lanata, M. Fere, D. Piccinin, G. Cusmai, M. Torregiani and M. Martinelli, Opt. Express 16, 21662 (2008).

    Article  ADS  Google Scholar 

  12. N. Dewan, K. Sreenivas and V. Gupta, Sens. Actuators A 147, 115 (2008).

    Article  Google Scholar 

  13. S. Sen, K. P. Muthe, N. Joshi, S. C. Gadkari, S. K. Gupta, Jagannath, M. Roy, S. K. Deshpande and J. V. Yakhmi, Sens. Actuators B 98, 154 (2004).

    Article  Google Scholar 

  14. T. Siciliano, M. Di Giulio, M. Tepore, E. Filippo, G. Micocci and A. Tepore, Sens. Actuators B 137, 644 (2009).

    Article  Google Scholar 

  15. T. Siciliano, M. Di Giulio, M. Tepore, E. Filippo, G. Micocci and A. Tepore, Sens. Actuators B 138, 550 (2009).

    Article  Google Scholar 

  16. T. Siciliano, A. Tepore, G. Micocci, A. Genga and E. Filippo, Sens. Actuators B 138, 207 (2009).

    Article  Google Scholar 

  17. B. Jeansannetas et al., J. Solid State Chem. 146, 329 (1999).

    Article  ADS  Google Scholar 

  18. T. Siciliano, M. Di Giulio, M. Tepore, E. Filippo, G. Micocci and A. Tepore, Vaccum 84, 935 (2010).

    Article  Google Scholar 

  19. M. F. Al-Kuhaili, S. M. A. Durrani, E. E. Khawaja and J. Shirokoff, J. Phys. D: Appl. Phys. 35, 910 (2002).

    Article  ADS  Google Scholar 

  20. S. N. B. Hodgson, and L. Weng, J. Sol-Gel Sci. Technol. 18, 145 (2000).

    Article  Google Scholar 

  21. N. Dewan, K. Sreenivas and V. Gupta, J. Cryst. Growth 305, 237 (2007).

    Article  ADS  Google Scholar 

  22. L. I. Qinghui, G. U. Donghong and G. A. N. Fuxi, J. Mater. Sci. Technol. 20, 678 (2004).

    Google Scholar 

  23. N. Uchida, Phys. Rev. B 4, 3736 (1971).

    Article  ADS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Department of Advanced Chemicals & Engineering, Chonnam National University, Gwangju, 500-757, Korea

    Heon Kong, Jong-Bin Yeo & Hyun-Yong Lee

Authors
  1. Heon Kong
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Jong-Bin Yeo
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Hyun-Yong Lee
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Hyun-Yong Lee.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Kong, H., Yeo, JB. & Lee, HY. A Study on the properties of tellurium-oxide thin films based on the variable sputtering gas ratio. Journal of the Korean Physical Society 66, 1744–1749 (2015). https://doi.org/10.3938/jkps.66.1744

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.3938/jkps.66.1744

Keywords

Search

Navigation