Abstract
A diamond film was deposited on YT14 hard alloy cutting tool using a chemical vapor deposition. The coefficients of friction and wear behaviors of the obtained diamond films at 500, 600, and 700°C were investigated using a high temperature tribological tester. The results show that the C of diamond film is fully released at 700°C, generating CO and CO2. The (220) plane of diamond film is oxidized fully at 500°C, while the (110) plane of diamond film is oxidized at 700°C. The average coefficients of friction of diamond film at 500, 600 and 700°C are 0.55, 0.49, and 0.48, respectively, the wear mechanism is primarily oxidation wear, adhesive wear and abrasive wear, accompanied with fatigue wear.
Similar content being viewed by others
References
Zhu, R.H., Miao, J.Y., Liu, J.L., Chen, L.X., Guo, J.C., Hua, C.Y., Ding, T., Lian, H.K., and Li, C.M., High temperature thermal conductivity of free-standing diamond films prepared by DC arc plasma jet CVD, Diamond Relat. Mater., 2014, vol. 50, pp. 55–59.
Wei. Q.P., Yu. Z.M., Ashfold. M.N.R., Ye. J., and Ma, L., Synthesis of micro- or nano-crystalline diamond films on WC-Co substrates with various pretreatments by hot filament chemical vapor deposition, Appl. Surf. Sci., 2010, vol. 256, no. 13, pp. 4357–4364.
Vasconcellos de Siqueira Brandão, L.E., Michels, A.F., Camargo, K.C., Balzaretti, N.M., and Horowitz, F., Wet ability of PTFE coated diamond films, Surf. Coat. Technol., 2013, vol. 232, pp. 384–388.
Nasiekaa, I., Strelchuk, V., Boyko, M., Voevodin, V., Vierovkin, A., Rybka, A., Kutniy, V., Dudnik, S., Gritsina, V., Opalev, O., and Strel’nitskij, V., Raman and photoluminescence characterization of diamond films forradiation detectors, Sens. Actuators A: Phys., 2015, vol. 223, pp. 18–23.
Morales, J., Apátiga, L.M., and Castaño, V.M., Synthesis of diamond films from organic compounds by pulsed liquid injection CVD, Surf Coat Technol., 2008, vol. 203, no. 5, pp. 610–613.
Long, H.Y., Luo, H., Luo, J.Q., Xie, Y.N., Deng, Z.J., Zhang, X.W., Wang, Y.J., Wei, Q.P., and Yu, Z.M., The concentration gradient of boron along the growth direction in boron doped chemical vapor deposited diamond, Mater. Lett., 2015, vol. 157, pp. 34–37.
Long, H.Y., Li, S., Luo, H., Wang, Y.J., Weia, Q.P., and Yu, Z.M., The effect of periodic magnetic field on the fabrication and field emission properties of nanocrystalline diamond films, Appl. Surf. Sci., 2015, vol. 353, pp. 548–552.
Liu, M.N., Bian, Y.B., Zheng, S.J., Zhu, T., Chen, Y.G., Chen, Y.L., and Wang, J.S., Growth and mechanical properties of diamond films on cemented carbide with buffer layers, Thin Solid Films, 2015, vol. 584, pp. 165–169.
Iyuke, S.E., Daramola, M.O., Mokena, P., and Marshall, A., Thermodynamic stability of graphitic diamond films produced from catalytic chemical vapor deposition reactor, J. Ind. Eng. Chem., 2015, vol. 30, pp. 336–341.
Cui, Y., Zhang, J.G., Sun, F.H., and Zhang, Z.M., Si-doped diamond films prepared by chemical vapor deposition, Trans. Nonfer. Met. Soc. China, 2013, vol. 23, no. 10, pp. 2962–2970.
Catena, A., McJunkin, T., Agnello, S., Gelardi, F.M., Wehner, S., and Fischer, C.B., Surface morphology and grain analysis of successively industrially grown amorphous hydrogenated carbon films (a-C: H) on silicon, Appl. Surf. Sci., 2015, vol. 347, pp. 657–667.
Benarioua, Y., Lesage, J., Chicot, D., and Moisan M., Structure and hardness of diamond films deposited on WC-Co by CVD technique, Surf. Coat. Technol., 2013, vol. 227, no. 29, pp. 70–74.
Pu, J.C., Wang, S.F., and Sung, J.C., High-temperature oxidation behaviors of CVD diamond films, Appl. Surf. Sci., 2009, vol. 256, no. 3, pp. 668–673.
Maida, O., Tada, S., Nishio, H., and Ito, T., Substrate temperature optimization for heavily-phosphorus-doped diamond films grown on vicinal (001) surfaces using high-power-density microwave-plasma chemical-vapor-deposition, J. Cryst Growth, 2015, vol. 424, pp. 33–37.
Huang, K., Hu, X.J., Xu, H., Shen, Y.G., and Khomich A., The oxidization behavior and mechanical properties of ultrananocrystalline diamond films at high temperature annealing, Appl. Surf. Sci., 2014, vol. 317, pp. 11–18.
Qian, J., McMurray, C.E., Mukhopadhyay, D.K., Wiggins, J.K., Vail, M.A., and Bertagnolli, K.E., Polycrystalline diamond cutters sintered with magnesium carbonate in cubic anvil press, Int. J. Refract. Met. Hard Mater., 2012, vol. 31, no. 3, pp. 71–75.
Konicek, A.R., Grierson, D.S., Gilbert, P.U.P.A, Sawyer, W.G., Sumant, A.V., and Carpick, R.W., Origin of ultralow friction and wear in ultrananocrystalline diamond, Phys. Rev. Lett., 2008, vol. 23, no. 100, pp. 1151–1156.
Sun, X.F., Qiao, Y.L., Song, W., Ma, S.N., and Hu, C.H., High temperature tribological properties of modified nanodiamond additive in lubricating oil, Phys. Procedia, 2013, vol. 50, pp. 343–347.
Shabani, M., Abreu, C.S., Gomes, J.R., Silva, R.F., and Oliveira, F.J., Effect of relative humidity and temperature on the tribology of multilayer micro/nanocrystalline CVD diamond coatings, Diamond Relat Mater., 2017, vol. 73, pp. 190–198.
Liu, S., Liu, J.L., Li, C.M., Guo, J.C., Chen, L.X., Wei, J.J., Hei, L.F., and Lu, F.X., The mechanical enhancement of chemical vapor deposited diamond film by plasma low-pressure/high-temperature treatment, Carbon, 2013, vol. 65, no. 12, pp. 365–370.
Ueda, K., Kasu, M., Tallaire, A., and Makimoto T., High-pressure and high-temperature annealing effects on CVD homoepitaxial diamond films, Diamond Relat. Mater., 2006, vol. 15, no. 11–12, pp. 1789–1791.
Liu, J.M. and Lv, X., Oxidation behavior of high quality freestanding diamond films, Trans. Mater. Heat Treat., 2007, vol. 28, no. 2, pp. 89–93.
Chen, N.C., Ai, J., Chen, Y.C., He, P., Ren, J.X., and Ji, D.M., Multilayer strategy and mechanical grinding for smoothing CVD diamond coated defective substrate, Mater. Design, 2016, vol. 103, pp. 194–200.
Author information
Authors and Affiliations
Corresponding author
Additional information
The text was submitted by the authors in English.
About this article
Cite this article
Dejun, K., Wen, Z. & Ling, Z. Friction-Wear Behaviors of Chemical Vapor Deposited Diamond Films at High Temperatures. J. Superhard Mater. 41, 98–105 (2019). https://doi.org/10.3103/S1063457619020047
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.3103/S1063457619020047