Abstract
The implantation formation of InAs nanoclusters in silicon and silica and their modification via irradiation with Xe ions with an energy of 167 MeV and a fluence of 3 × 1014 cm–2 are studied. It is found that post-implantation annealing and irradiation with high-energy ions alter the size and shape of nanoclusters and cause structural transformations within them. The ordering of nanoclusters and their elongation along the trajectory of Xe ions in a SiO2 matrix is observed.
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Original Russian Text © F.F. Komarov, O.V. Milchanin, V.A. Skuratov, M.A. Makhavikou, A. Janse van Vuuren, J.N. Neethling, E. Wendler, L.A. Vlasukova, I.N. Parkhomenko, V.N. Yuvchenko, 2016, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2016, Vol. 80, No. 2, pp. 160–164.
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Komarov, F.F., Milchanin, O.V., Skuratov, V.A. et al. Ion-beam formation and track modification of InAs nanoclusters in silicon and silica. Bull. Russ. Acad. Sci. Phys. 80, 141–145 (2016). https://doi.org/10.3103/S106287381602012X
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DOI: https://doi.org/10.3103/S106287381602012X