Abstract—In this article, we studied the growth characteristics of AlN epitaxial layers on 3С-SiC/Si(111) templates at various values of atomic flux of aluminum at a constant growth temperature and a constant flow of atomic nitrogen. The AFM method was used to study the morphology of the resulting structures. The minimum roughness was achieved at a growth rate of 150 nm/h on on-axis templates, and at 90 nm/h on off-axis templates. Epitaxial layers of hexagonal AlN with root mean square roughness of less than 3 nm were obtained on 3С-SiC/Si(111) templates with a diameter of 100 mm, in which there was no grain structure. Single-crystal AlN (0002) layers with FWHM (ω‑geometry) values of about 1.4° were obtained.
Similar content being viewed by others
REFERENCES
N.Sinha, G. E. Wabiszewski, R. Mahameed, et al., “Piezoelectric aluminum nitride nanoelectromechanical actuators,” Appl. Phys. Lett. 95, 053106 (2009).
R. B. Karabalin, M. H. Matheny, X. L. Feng, et al., “Piezoelectric nanoelectromechanical resonators based on aluminum nitride thin films,” Appl. Phys. Lett.95, 103111 (2009).
Y. Taniyasu, M. Kasu, and T. Makimoto, “An aluminium nitride light-emitting diode with a wavelength of 210 nanometres,” Nature 441, 325–328 (2006).
L. W. Yin, et al., “Growth and field emission of hierarchical single crystalline wurtzite AlN nanoarchitectures,” Adv. Mater. 17, 110–114 (2005).
H. M. Liaw, R. Venugopal, J. Wan, and M. R. Melloch, “Epitaxial GaN films grown on Si(111) with varied buffer layers,” Solid-State Electron. 45, 1173–1177 (2001).
E. Feltin, B. Beaumont, M. Laugt, et al., “Stress control in GaN grown on silicon (111) by MOVPE,” Appl. Phys. Lett. 79, 3230 (2001).
H. Schenk, E. Frayssinet, A. Bavard, D. Rondi et al., “Growth of thick, continuous GaN layers on 4-in. Si Substrates by MOCVD,” J. Crystal Growth. 314, 85–91 (2011).
T. Chen Jr., “GaN-SiC hybrid material for high-frequency and power electronics,” Appl. Phys. Lett. 113, 041605 (2013).
H. Amano, Y. Baines, E. Beam, et al., “The 2018 GaN power electronics roadmap,” J. Phys. D: Appl. Phys. 51 (16), 1–48 (2018).
G. Colston, M. Myronov, S. Rhead, and D. Leadley, “Analysis of surface defects in Si1–yCy epilayers formed by the oversaturation of carbon,” Semicond. Sci. Technol. 30, 1–6 (2015).
M. Myronov, S. D. Rhead, G. Colston, et al., “RP-CVD Growth of High Carbon Content SiC Epilayers Using Disilane and Trimethylsilane Precursors,” in Proc. 2014 Int. Si-Ge Technology and Device Meeting (ISTDM, 2014), pp. 69–70.
O. N. Sergeeva, A. V. Solnyshkin, D. A. Kiselev, et al., “Influence of orientation of a silicon substrate with a buffer silicon carbide layer on dielectric and polar properties of aluminum nitride films,” Phys. Sol. State 61, 2386–2391 (2019).
V. Bessolov, A. Kalmykov, S. Konenkov, et al., “Semipolar AlN on Si(100): Technology and properties,” Microelectron. Eng. 178, 34–37 (2017).
S. A. Kukushkin and S. S. Sharofidinov, “A new method of growing AlN, GaN, and AlGaN bulk crystals using hybrid SiC/Si substrates,” Phys. Sol. State 61, 2342–2347 (2019).
K. A. Tsarik, S. D. Fedotov, V. K. Nevolin, and V. N. Statsenko, “Structural and Morphological Properties of Ga(Al)N Grown by MBE on 3C-SiC/Si(111) Templates with Off-Axis and On-Axis Substrate Orientation,” in Proc. SPIE 11022, Int. Conf. on Micro- and Nano-Electronics2018, 1102219.
Funding
This work was financially supported by the Innovation Assistance Fund, agreement no. 1ГТС1/48804.
Author information
Authors and Affiliations
Corresponding author
Additional information
Translated by I.K. Katuev
About this article
Cite this article
Babaev, A.V., Nevolin, V.K., Statsenko, V.N. et al. Singularities of the Thin AlN Layers Formation by Molecular Beam Epitaxy On 3C-SiC/Si(111) Templates with On-Axis and 4° Off-Axis Disorientation. Mech. Solids 55, 84–89 (2020). https://doi.org/10.3103/S0025654420010045
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.3103/S0025654420010045