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Purion XEmax, Axcelis ultra-high energy implanter with Boost™ technology

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Abstract

Axcelis Purion XEmax is an ultra-high energy implanter, producing up to 15 MeV arsenic and 14.5 MeV phosphorus beams. With the patented Boost™ technology, the highest energy beams are generated from a 3 + charge state extracted at the ion source, which delivers higher beam current, longer source life and eliminates energetic metal contamination. Its beam line is optimized for angle control to give the best angle performance in the industry.

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The datasets generated during and/or analyzed during the current study are available from the corresponding author on reasonable request.

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Correspondence to Shu Satoh.

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Satoh, S., Platow, W., Kondratenko, S. et al. Purion XEmax, Axcelis ultra-high energy implanter with Boost™ technology. MRS Advances 7, 1490–1494 (2022). https://doi.org/10.1557/s43580-022-00442-9

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  • DOI: https://doi.org/10.1557/s43580-022-00442-9

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