Abstract
Resistive-switching memristors are promising device structures for future memory and neuromorphic computing applications. Defects are shown to be critical for the conducting filament formation, and resulting device performance metrics of memristors. In this prospective article, we investigate the role of defects in the resistive-switching dynamics of filamentary-type memristors, and explore defect-engineering as an effective method to rationally design controllable conduction pathways. Specifically, we propose a data-centric approach that combines the defect-knowledge obtained from first-principles calculations with the materials engineering and characterization efforts.
Graphical abstract
Similar content being viewed by others
Data availability
The datasets generated during and/or analysed during the current study are available from the corresponding author on reasonable request.
References
G.E. Moore, Cramming more components onto integrated circuits, Reprinted from Electronics, 38,(8), April 19, 1965, pp114 ff. IEEE Solid-State Circuits Soc. Newsl. 11(3), 33–35 (2006). https://doi.org/10.1109/n-ssc.2006.4785860
D. Ielmini, H.-S.P. Wong, In-memory computing with resistive switching devices. Nat. Electron. 1(6), 333–343 (2018). https://doi.org/10.1038/s41928-018-0092-2
J. Zhu, T. Zhang, Y. Yang, R. Huang, A comprehensive review on emerging artificial neuromorphic devices. Appl. Phys. Rev. 7(1), 011312 (2020). https://doi.org/10.1063/1.5118217
Q. Xia, J.J. Yang, Memristive crossbar arrays for brain-inspired computing. Nat. Mater. 18(4), 309–323 (2019). https://doi.org/10.1038/s41563-019-0291-x
D.B. Strukov, G.S. Snider, D.R. Stewart, R.S. Williams, The missing memristor found. Nature 453(7191), 80–83 (2008). https://doi.org/10.1038/nature06932
L. Chua, Memristor: the missing circuit element. IEEE Trans. Circuit Theory 18(5), 507–519 (1971). https://doi.org/10.1109/tct.1971.1083337
L. Chua, Resistance switching memories are memristors. Appl. Phys. A 102(4), 765–783 (2011). https://doi.org/10.1007/s00339-011-6264-9
J.J. Yang, D.B. Strukov, D.R. Stewart, Memristive devices for computing. Nat. Nanotechnol. 8(1), 13–24 (2013). https://doi.org/10.1038/nnano.2012.240
Y. Yang, R. Huang, Probing memristive switching in nanoionic devices. Nat. Electron. 1(5), 274–287 (2018). https://doi.org/10.1038/s41928-018-0069-1
G.-S. Park, Y.B. Kim, S.Y. Park, X.S. Li, S. Heo, M.-J. Lee, M. Chang, J.H. Kwon, M. Kim, U.-I. Chung, R. Dittmann, R. Waser, K. Kim, In situ observation of filamentary conducting channels in an asymmetric Ta-O5-x/TaO2-x bilayer structure. Nat. Commun. 4(1), 2382 (2013). https://doi.org/10.1038/ncomms3382
W. Sun, B. Gao, M. Chi, Q. Xia, J.J. Yang, H. Qian, H. Wu, Understanding memristive switching via in situ characterization and device modeling. Nat. Commun. 10(1), 3453 (2019). https://doi.org/10.1038/s41467-019-11411-6
D.-H. Kwon, K.M. Kim, J.H. Jang, J.M. Jeon, M.H. Lee, G.H. Kim, X.-S. Li, G.-S. Park, B. Lee, S. Han, M. Kim, C.S. Hwang, Atomic structure of conducting nanofilaments in TiO2 resistive switching memory. Nat. Nanotechnol. 5(2), 148–153 (2010). https://doi.org/10.1038/nnano.2009.456
M.-J. Lee, C.B. Lee, D. Lee, S.R. Lee, M. Chang, J.H. Hur, Y.-B. Kim, C.-J. Kim, D.H. Seo, S. Seo, U.-I. Chung, I.-K. Yoo, K. Kim, A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5-x/TaO2-x bilayer structures. Nat. Mater. 10(8), 625–630 (2011). https://doi.org/10.1038/nmat3070
C. Chang, J. Chen, C. Huang, C. Chiu, T. Lin, P. Yeh, W. Wu, Direct observation of dual-filament switching behaviors in Ta2O5-based memristors. Small 13(15), 1603116 (2017). https://doi.org/10.1002/smll.201603116
S. Pi, C. Li, H. Jiang, W. Xia, H. Xin, J.J. Yang, Q. Xia, Memristor crossbar arrays with 6-nm half-pitch and 2-nm critical dimension. Nat. Nanotechnol. 14(1), 35–39 (2019). https://doi.org/10.1038/s41565-018-0302-0
M. Zhao, B. Gao, J. Tang, H. Qian, H. Wu, Reliability of analog resistive switching memory for neuromorphic computing. Appl. Phys. Rev. 7(1), 011301 (2020). https://doi.org/10.1063/1.5124915
W. Song, H.K. Lee, W. Wang, M. Li, Z. Chen, J.-C. Liu, I.-T. Wang, V.Y.-Q. Zhuo, Y. Zhu, Investigation of Retention Failure Behavior in Analog RRAM Devices, in 2020 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, pp. 1–4 (2020)
W. Banerjee, Q. Liu, H. Hwang, Engineering of defects in resistive random access memory devices. J. Appl. Phys. 127(5), 051101 (2020). https://doi.org/10.1063/1.5136264
A. Fantini, L. Goux, R. Degraeve, D.J. Wouters, N. Raghavan, G. Kar, A. Belmonte, Y.-Y. Chen, B. Govoreanu, M. Jurczak, Intrinsic Switching Variability in HfO2 RRAM. in 2013 5th IEEE International Memory Workshop, pp. 30–33 (2013). https://doi.org/10.1109/imw.2013.6582090
C. Li, B. Gao, Y. Yao, X. Guan, X. Shen, Y. Wang, P. Huang, L. Liu, X. Liu, J. Li, C. Gu, J. Kang, R. Yu, Direct observations of nanofilament evolution in switching processes in HfO2-based resistive random access memory by in situ TEM studies. Adv. Mater. 29(10), 1602976 (2017). https://doi.org/10.1002/adma.201602976
S.M. Hus, R. Ge, P.-A. Chen, L. Liang, G.E. Donnelly, W. Ko, F. Huang, M.-H. Chiang, A.-P. Li, D. Akinwande, Observation of single-defect memristor in an MoS2 atomic sheet. Nat. Nanotechnol. 16(1), 58–62 (2021). https://doi.org/10.1038/s41565-020-00789-w
M. Lübben, F. Cüppers, J. Mohr, M.V. Witzleben, U. Breuer, R. Waser, C. Neumann, I. Valov, Design of defect-chemical properties and device performance in memristive systems. Sci. Adv. 6(19), 9079 (2020). https://doi.org/10.1126/sciadv.aaz9079
Y. Yang, P. Gao, S. Gaba, T. Chang, X. Pan, W. Lu, Observation of conducting filament growth in nanoscale resistive memories. Nat. Commun. 3(1), 732 (2012). https://doi.org/10.1038/ncomms1737
H. Jiang, L. Han, P. Lin, Z. Wang, M.H. Jang, Q. Wu, M. Barnell, J.J. Yang, H.L. Xin, Q. Xia, Sub-10 nm Ta channel responsible for superior performance of a HfO2 memristor. Sci. Rep. 6(1), 28525 (2016). https://doi.org/10.1038/srep28525
A. Jain, S.P. Ong, G. Hautier, W. Chen, W.D. Richards, S. Dacek, S. Cholia, D. Gunter, D. Skinner, G. Ceder, K.A. Persson, Commentary: the materials project: a materials genome approach to accelerating materials innovation. APL Mater. 1(1), 011002 (2013). https://doi.org/10.1063/1.4812323
J.P. Perdew, K. Burke, M. Ernzerhof, Generalized gradient approximation made simple. Phys. Rev. Lett. 77(18), 3865–3868 (1996). https://doi.org/10.1103/physrevlett.77.3865
P.E. Blöchl, Projector augmented-wave method. Phys. Rev. B 50(24), 17953–17979 (1994). https://doi.org/10.1103/physrevb.50.17953
A. Marchewka, B. Roesgen, K. Skaja, H. Du, C. Jia, J. Mayer, V. Rana, R. Waser, S. Menzel, Nanoionic resistive switching memories: on the physical nature of the dynamic reset process. Adv. Electron. Mater. 2(1), 1500233 (2016). https://doi.org/10.1002/aelm.201500233
Z. Wang, M. Yin, T. Zhang, Y. Cai, Y. Wang, Y. Yang, R. Huang, Engineering incremental resistive switching in TaO x based memristors for brain-inspired computing. Nanoscale 8(29), 14015–14022 (2016). https://doi.org/10.1039/c6nr00476h
S. Yu, X. Guan, H.-S.P. Wong, On the stochastic nature of resistive switching in metal oxide RRAM: physical modeling, monte carlo simulation, and experimental characterization. in International Electron Devices Meeting 2011, 17–311734 (2011). https://doi.org/10.1109/iedm.2011.6131572
S. Kim, S. Choi, W. Lu, Comprehensive physical model of dynamic resistive switching in an oxide memristor. ACS Nano 8(3), 2369–2376 (2014). https://doi.org/10.1021/nn405827t
J. Lee, W. Schell, X. Zhu, E. Kioupakis, W.D. Lu, Charge transition of oxygen vacancies during resistive switching in oxide-based RRAM. ACS Appl. Mater. Interfaces 11(12), 11579–11586 (2019). https://doi.org/10.1021/acsami.8b18386
S. Clima, K. Sankaran, Y.Y. Chen, A. Fantini, U. Celano, A. Belmonte, L. Zhang, L. Goux, B. Govoreanu, R. Degraeve, D..J. Wouters, M. Jurczak, W. Vandervorst, S..D. Gendt, G. Pourtois, RRAMs based on anionic and cationic switching: a short overview: RRAMs based on anionic and cationic switching:a short overview. Physica Status Solidi 8(6), 501–511 (2014). https://doi.org/10.1002/pssr.201409054
Y. Yang, P. Gao, L. Li, X. Pan, S. Tappertzhofen, S. Choi, R. Waser, I. Valov, W.D. Lu, Electrochemical dynamics of nanoscale metallic inclusions in dielectrics. Nat. Commun. 5(1), 4232 (2014). https://doi.org/10.1038/ncomms5232
S.T. Pantelides, The electronic structure of impurities and other point defects in semiconductors. Rev. Mod. Phys. 50(4), 797–858 (1978). https://doi.org/10.1103/revmodphys.50.797
H.J. Queisser, E.E. Haller, Defects in semiconductors: some fatal. Some Vital. Sci. 281(5379), 945–950 (1998). https://doi.org/10.1126/science.281.5379.945
W. Li, J. Shi, K.H.L. Zhang, J.L. MacManus-Driscoll, Defects in complex oxide thin films for electronics and energy applications: challenges and opportunities. Mater. Horiz. 7(11), 2832–2859 (2020). https://doi.org/10.1039/d0mh00899k
F.-C. Chiu, A review on conduction mechanisms in dielectric films. Adv. Mater. Sci. Eng. 2014, 1–18 (2014). https://doi.org/10.1155/2014/578168
C. Funck, S. Menzel, Comprehensive model of electron conduction in oxide-based memristive devices. ACS Appl. Electron. Mater. 3(9), 3674–3692 (2021). https://doi.org/10.1021/acsaelm.1c00398
H. Schroeder, Poole-Frenkel-effect as dominating current mechanism in thin oxide films-An illusion?! J. Appl. Phys. 117(21), 215103 (2015). https://doi.org/10.1063/1.4921949
S.-J. Choi, G.-S. Park, K.-H. Kim, W.-Y. Yang, H.-J. Bae, K.-J. Lee, H.-I. Lee, S.Y. Park, S. Heo, H.-J. Shin, S. Lee, S. Cho, In situ observation of vacancy dynamics during resistance changes of oxide devices. J. Appl. Phys. 110(5), 056106 (2011). https://doi.org/10.1063/1.3626816
Z. Yong, K.-M. Persson, M.S. Ram, G. D’Acunto, Y. Liu, S. Benter, J. Pan, Z. Li, M. Borg, A. Mikkelsen, L.-E. Wernersson, R. Timm, Tuning oxygen vacancies and resistive switching properties in ultra-thin HfO2 RRAM via TiN bottom electrode and interface engineering. Appl. Surf. Sci. 551, 149386 (2021). https://doi.org/10.1016/j.apsusc.2021.149386
M. Saadi, P. Gonon, C. Vallée, C. Mannequin, H. Grampeix, E. Jalaguier, F. Jomni, A. Bsiesy, On the mechanisms of cation injection in conducting bridge memories: the case of HfO2 in contact with noble metal anodes (Au, Cu, Ag). J. Appl. Phys. 119(11), 114501 (2016). https://doi.org/10.1063/1.4943776
S. Clima, Y.Y. Chen, C.Y. Chen, L. Goux, B. Govoreanu, R. Degraeve, A. Fantini, M. Jurczak, G. Pourtois, First-principles thermodynamics and defect kinetics guidelines for engineering a tailored RRAM device. J. Appl. Phys. 119(22), 225107 (2016). https://doi.org/10.1063/1.4953673
M.L. Urquiza, M.M. Islam, A.C.T.V. Duin, X. Cartoixa, A. Strachan, Atomistic insights on the full operation cycle of a HfO2-based resistive random access memory cell from molecular dynamics. ACS Nano 15(8), 12945–12954 (2021). https://doi.org/10.1021/acsnano.1c01466
M.N.K. Alam, S. Clima, B.J. O’Sullivan, B. Kaczer, G. Pourtois, M. Heyns, J.V. Houdt, First principles investigation of charge transition levels in monoclinic, orthorhombic, tetragonal, and cubic crystallographic phases of HfO2. J. Appl. Phys. 129(8), 084102 (2021). https://doi.org/10.1063/5.0033957
N. Kaiser, T. Vogel, A. Zintler, S. Petzold, A. Arzumanov, E. Piros, R. Eilhardt, L. Molina-Luna, L. Alff, Defect-stabilized substoichiometric polymorphs of hafnium oxide with semiconducting properties. ACS Appl. Mater. Interfaces 14(1), 1290–1303 (2022). https://doi.org/10.1021/acsami.1c09451
Y.Y. Lebedinskii, A.G. Chernikova, A.M. Markeev, D.S. Kuzmichev, Effect of dielectric stoichiometry and interface chemical state on band alignment between tantalum oxide and platinum. Appl. Phys. Lett. 107(14), 142904 (2015). https://doi.org/10.1063/1.4932554
T.V. Perevalov, V.S. Aliev, V.A. Gritsenko, A.A. Saraev, V.V. Kaichev, Electronic structure of oxygen vacancies in hafnium oxide. Microelectron. Eng. 109, 21–23 (2013). https://doi.org/10.1016/j.mee.2013.03.005
K.V. Egorov, D.S. Kuzmichev, P.S. Chizhov, Y.Y. Lebedinskii, C.S. Hwang, A..M.. Markeev, In situ control of oxygen vacancies in TaO x thin films via plasma-enhanced atomic layer deposition for resistive switching memory applications. ACS Appl. Mater. Interfaces 9(15), 13286–13292 (2017). https://doi.org/10.1021/acsami.7b00778
A. Kumar, S. Mondal, K.S.R.K. Rao, Experimental evidences of charge transition levels in ZrO2 and at the Si: ZrO2 interface by deep level transient spectroscopy. Appl. Phys. Lett. 110(13), 132904 (2017). https://doi.org/10.1063/1.4979522
K. Sugawara, H. Shima, M. Takahashi, Y. Naitoh, H. Suga, H. Akinaga, Low-frequency-noise spectroscopy of TaOx-based resistive switching memory. Adv. Electron. Mater. 2021, 2100758 (2021). https://doi.org/10.1002/aelm.202100758
X. Wang, B. Gao, H. Wu, X. Li, D. Hong, Y. Chen, H. Qian, A nondestructive approach to study resistive switching mechanism in metal oxide based on defect photoluminescence mapping. Nanoscale 9(36), 13449–13456 (2017). https://doi.org/10.1039/c7nr02023f
V.A. Gritsenko, T.V. Perevalov, D.R. Islamov, Electronic properties of hafnium oxide: a contribution from defects and traps. Phys. Rep. 613, 1–20 (2016). https://doi.org/10.1016/j.physrep.2015.11.002
J. Chen, C. Huang, C. Chiu, Y. Huang, W. Wu, Switching kinetic of VCM-based memristor: evolution and positioning of nanofilament. Adv. Mater. 27(34), 5028–5033 (2015). https://doi.org/10.1002/adma.201502758
P. Gao, Z. Wang, W. Fu, Z. Liao, K. Liu, W. Wang, X. Bai, E. Wang, In situ TEM studies of oxygen vacancy migration for electrically induced resistance change effect in cerium oxides. Micron 41(4), 301–305 (2010). https://doi.org/10.1016/j.micron.2009.11.010
D. Cooper, C. Baeumer, N. Bernier, A. Marchewka, C.L. Torre, R.E. Dunin-Borkowski, S. Menzel, R. Waser, R. Dittmann, Anomalous resistance hysteresis in oxide ReRAM: oxygen evolution and reincorporation revealed by in situ TEM. Adv. Mater. 29(23), 1700212 (2017). https://doi.org/10.1002/adma.201700212
U. Celano, J..O..d Beeck, S. Clima, M.. Luebben, P..M.. Koenraad, L.. Goux, I. Valov, W.. Vandervorst, Direct probing of the dielectric scavenging-layer interface in oxide filamentary-based valence change memory. ACS Appl. Mater. Interfaces 9(12), 10820–10824 (2017). https://doi.org/10.1021/acsami.6b16268
C..G..V..d Walle, A. Janotti, Advances in electronic structure methods for defects and impurities in solids. Physica Status Solidi (b) 248(1), 19–27 (2011). https://doi.org/10.1002/pssb.201046290
H. Cheng, A. Selloni, Surface and subsurface oxygen vacancies in anatase TiO2 and differences with rutile. Phys. Rev. B 79(9), 092101 (2009). https://doi.org/10.1103/physrevb.79.092101
G. Sassine, C. Nail, P. Blaise, B. Sklenard, M. Bernard, R. Gassilloud, A. Marty, M. Veillerot, C. Vallée, E. Nowak, G. Molas, Hybrid-RRAM toward next generation of nonvolatile memory: coupling of oxygen vacancies and metal ions. Adv. Electron. Mater. 5(2), 1800658 (2019). https://doi.org/10.1002/aelm.201800658
H. Jiang, D.A. Stewart, Enhanced oxygen vacancy diffusion in Ta2O5 resistive memory devices due to infinitely adaptive crystal structure. J. Appl. Phys. 119(13), 134502 (2016). https://doi.org/10.1063/1.4945579
H. Jiang, D.A. Stewart, Using dopants to tune oxygen vacancy formation in transition metal oxide resistive memory. ACS Appl. Mater. Interfaces 9(19), 16296–16304 (2017). https://doi.org/10.1021/acsami.7b00139
W. He, H. Sun, Y. Zhou, K. Lu, K. Xue, X. Miao, Customized binary and multi-level HfO2-x-based memristors tuned by oxidation conditions. Sci. Rep. 7(1), 10070 (2017). https://doi.org/10.1038/s41598-017-09413-9
J. Ge, M. Chaker, Oxygen vacancies control transition of resistive switching mode in single-crystal TiO2 memory device. ACS Appl. Mater. Interfaces 9(19), 16327–16334 (2017). https://doi.org/10.1021/acsami.7b03527
S.U. Sharath, T. Bertaud, J. Kurian, E. Hildebrandt, C. Walczyk, P. Calka, P. Zaumseil, M. Sowinska, D. Walczyk, A. Gloskovskii, T. Schroeder, L. Alff, Towards forming-free resistive switching in oxygen engineered HfO2-x. Appl. Phys. Lett. 104(6), 063502 (2014). https://doi.org/10.1063/1.4864653
A. Hardtdegen, C.L. Torre, F. Cüppers, S. Menzel, R. Waser, S. Hoffmann-Eifert, Improved switching stability and the effect of an internal series resistor in HfO2/TiOx bilayer ReRAM cells. IEEE Trans. Electron Devices 65(8), 3229–3236 (2018). https://doi.org/10.1109/ted.2018.2849872
X. Zhong, I. Rungger, P. Zapol, H. Nakamura, Y. Asai, O. Heinonen, The effect of a Ta oxygen scavenger layer on HfO 2 -based resistive switching behavior: thermodynamic stability, electronic structure, and low-bias transport. Phys. Chem. Chem. Phys. 18(10), 7502–7510 (2016). https://doi.org/10.1039/c6cp00450d
W. Kim, S. Menzel, D.J. Wouters, Y. Guo, J. Robertson, B. Roesgen, R. Waser, V. Rana, Impact of oxygen exchange reaction at the ohmic interface in Ta2O5 -based ReRAM devices. Nanoscale 8(41), 17774–17781 (2016). https://doi.org/10.1039/c6nr03810g
D.-Y. Cho, M. Luebben, S. Wiefels, K.-S. Lee, I. Valov, Interfacial metal-oxide interactions in resistive switching memories. ACS Appl. Mater. Interfaces 9(22), 19287–19295 (2017). https://doi.org/10.1021/acsami.7b02921
Y.Y. Chen, L. Goux, S. Clima, B. Govoreanu, R. Degraeve, G.S. Kar, A. Fantini, G. Groeseneken, D.J. Wouters, M. Jurczak, Endurance/retention trade-off on \({\text{HfO}}_2\)/metal cap 1T1R bipolar RRAM. IEEE Trans. Electron Devices 60(3), 1114–1121 (2013). https://doi.org/10.1109/ted.2013.2241064
O. Pirrotta, L. Larcher, M. Lanza, A. Padovani, M. Porti, M. Nafría, G. Bersuker, Leakage current through the poly-crystalline HfO2: trap densities at grains and grain boundaries. J. Appl. Phys. 114(13), 134503 (2013). https://doi.org/10.1063/1.4823854
V. Iglesias, M. Lanza, K. Zhang, A. Bayerl, M. Porti, M. Nafría, X. Aymerich, G. Benstetter, Z.Y. Shen, G. Bersuker, Degradation of polycrystalline HfO2-based gate dielectrics under nanoscale electrical stress. Appl. Phys. Lett. 99(10), 103510 (2011). https://doi.org/10.1063/1.3637633
G. Bersuker, J. Yum, L. Vandelli, A. Padovani, L. Larcher, V. Iglesias, M. Porti, M. Nafría, K. McKenna, A. Shluger, P. Kirsch, R. Jammy, Grain boundary-driven leakage path formation in HfO2 dielectrics. Solid-State Electron. 65, 146–150 (2011). https://doi.org/10.1016/j.sse.2011.06.031
K. Szot, W. Speier, G. Bihlmayer, R. Waser, Switching the electrical resistance of individual dislocations in single-crystalline SrTiO3. Nat. Mater. 5(4), 312–320 (2006). https://doi.org/10.1038/nmat1614
L. Zhao, S.-W. Ryu, A. Hazeghi, D. Duncan, B. Magyari-Köpe, Y. Nishi, Dopant selection rules for extrinsic tunability of hfo<inf>x</inf> rram characteristics: a systematic study. in, 2013 Symposium on VLSI Technology, pp. 106–107 (2013)
R. Schmitt, J. Spring, R. Korobko, J.L.M. Rupp, Design of Oxygen Vacancy Configuration for Memristive Systems. ACS Nano 11(9), 8881–8891 (2017). https://doi.org/10.1021/acsnano.7b03116
S. Kim, S. Choi, J. Lee, W.D. Lu, Tuning resistive switching characteristics of tantalum oxide memristors through Si doping. ACS Nano 8(10), 10262–10269 (2014). https://doi.org/10.1021/nn503464q
D. Carta, I. Salaoru, A. Khiat, A. Regoutz, C. Mitterbauer, N.M. Harrison, T. Prodromakis, Investigation of the switching mechanism in TiO2-based RRAM: a two-dimensional EDX approach. ACS Appl. Mater. Interfaces 8(30), 19605–19611 (2016). https://doi.org/10.1021/acsami.6b04919
A. Wedig, M. Luebben, D.-Y. Cho, M. Moors, K. Skaja, V. Rana, T. Hasegawa, K.K. Adepalli, B. Yildiz, R. Waser, I. Valov, Nanoscale cation motion in TaOx, HfOx and TiOx memristive systems. Nat. Nanotechnol. 11(1), 67–74 (2016). https://doi.org/10.1038/nnano.2015.221
M. Lübben, P. Karakolis, V. Ioannou-Sougleridis, P. Normand, P. Dimitrakis, I. Valov, Graphene-modified interface controls transition from VCM to ECM switching modes in Ta/TaOx based memristive devices. Adv. Mater. 27(40), 6202–6207 (2015). https://doi.org/10.1002/adma.201502574
R. Waser, R. Dittmann, G. Staikov, K. Szot, Redox-based resistive switching memories - nanoionic mechanisms, prospects, and challenges. Adv. Mater. 21(25–26), 2632–2663 (2009). https://doi.org/10.1002/adma.200900375
U. Celano, L. Goux, A. Belmonte, K. Opsomer, A. Franquet, A. Schulze, C. Detavernier, O. Richard, H. Bender, M. Jurczak, W. Vandervorst, Three-dimensional observation of the conductive filament in nanoscaled resistive memory devices. Nano Lett. 14(5), 2401–2406 (2014). https://doi.org/10.1021/nl500049g
T. Gu, T. Tada, S. Watanabe, Conductive path formation in the Ta2O5 atomic switch: first-principles analyses. ACS Nano 4(11), 6477–6482 (2010). https://doi.org/10.1021/nn101410s
K. Sankaran, L. Goux, S. Clima, M. Mees, J.A. Kittl, M. Jurczak, L. Altimime, G.-M. Rignanese, G. Pourtois, Modeling of copper diffusion in amorphous aluminum oxide in CBRAM memory stack. ECS Trans. 45(3), 317–330 (2012). https://doi.org/10.1149/1.3700896
N. Elgrishi, K.J. Rountree, B.D. McCarthy, E.S. Rountree, T.T. Eisenhart, J.L. Dempsey, A practical beginner’s guide to cyclic voltammetry. J. Chem. Educ. 95(2), 197–206 (2018). https://doi.org/10.1021/acs.jchemed.7b00361
S. Chen, I. Valov, Design of materials configuration for optimizing redox-based resistive switching memories. Adv. Mater. 34(3), 2105022 (2022). https://doi.org/10.1002/adma.202105022
T. Tsuruoka, I. Valov, S. Tappertzhofen, J.V.D. Hurk, T. Hasegawa, R. Waser, M. Aono, Redox reactions at Cu, Ag/Ta2O5 interfaces and the effects of Ta2O5 film density on the forming process in atomic switch structures. Adv. Funct. Mater. 25(40), 6374–6381 (2015). https://doi.org/10.1002/adfm.201500853
M. Lübben, I. Valov, Active electrode redox reactions and device behavior in ECM type resistive switching memories. Adv. Electron. Mater. 5(9), 1800933 (2019). https://doi.org/10.1002/aelm.201800933
X. Guo, C. Schindler, S. Menzel, R. Waser, Understanding the switching-off mechanism in Ag+ migration based resistively switching model systems. Appl. Phys. Lett. 91(13), 133513 (2007). https://doi.org/10.1063/1.2793686
F. Yuan, Z. Zhang, C. Liu, F. Zhou, H.M. Yau, W. Lu, X. Qiu, H.-S.P. Wong, J. Dai, Y. Chai, Real-time observation of the electrode-size-dependent evolution dynamics of the conducting filaments in a SiO2 layer. ACS Nano 11(4), 4097–4104 (2017). https://doi.org/10.1021/acsnano.7b00783
M. Lanza, U. Celano, F. Miao, Nanoscale characterization of resistive switching using advanced conductive atomic force microscopy based setups. J. Electroceram. 39(1–4), 94–108 (2017). https://doi.org/10.1007/s10832-017-0082-1
S. Prada, M. Rosa, L. Giordano, C.D. Valentin, G. Pacchioni, Density functional theory study of TiO2/Ag interfaces and their role in memristor devices. Phys. Rev. B 83(24), 245314 (2011). https://doi.org/10.1103/physrevb.83.245314
M. Zhou, Q. Zhao, W. Zhang, Q. Liu, Y. Dai, The conductive path in HfO2: first principles study. J. Semicond. 33(7), 072002 (2012). https://doi.org/10.1088/1674-4926/33/7/072002
W. Banerjee, S.H. Kim, S. Lee, D. Lee, H. Hwang, An efficient approach based on tuned nanoionics to maximize memory characteristics in Ag-based devices. Adv. Electron. Mater. 7(4), 2100022 (2021). https://doi.org/10.1002/aelm.202100022
S. Coffa, J.M. Poate, D.C. Jacobson, W. Frank, W. Gustin, Determination of diffusion mechanisms in amorphous silicon. Phys. Rev. B 45(15), 8355–8358 (1991). https://doi.org/10.1103/physrevb.45.8355
K.-H. Kim, S. Gaba, D. Wheeler, J.M. Cruz-Albrecht, T. Hussain, N. Srinivasa, W. Lu, A functional hybrid memristor crossbar-array/CMOS system for data storage and neuromorphic applications. Nano Lett. 12(1), 389–395 (2012). https://doi.org/10.1021/nl203687n
S.H. Jo, T. Chang, I. Ebong, B.B. Bhadviya, P. Mazumder, W. Lu, Nanoscale memristor device as synapse in neuromorphic systems. Nano Lett. 10(4), 1297–301 (2010). https://doi.org/10.1021/nl904092h
H. Yeon, P. Lin, C. Choi, S.H. Tan, Y. Park, D. Lee, J. Lee, F. Xu, B. Gao, H. Wu, H. Qian, Y. Nie, S. Kim, J. Kim, Alloying conducting channels for reliable neuromorphic computing. Nat. Nanotechnol. 15(7), 574–579 (2020). https://doi.org/10.1038/s41565-020-0694-5
S. Choi, S.H. Tan, Z. Li, Y. Kim, C. Choi, P.-Y. Chen, H. Yeon, S. Yu, J. Kim, SiGe epitaxial memory for neuromorphic computing with reproducible high performance based on engineered dislocations. Nat. Mater. 17(4), 335–340 (2018). https://doi.org/10.1038/s41563-017-0001-5
P. Blennow, A. Hagen, K.K. Hansen, L.R. Wallenberg, M. Mogensen, Defect and electrical transport properties of Nb-doped SrTiO3. Solid State Ion. 179(35–36), 2047–2058 (2008). https://doi.org/10.1016/j.ssi.2008.06.023
S.-H. Yoon, H. Kim, Effect of donor (Nb) concentration on the bulk electrical resistivity of Nb-doped barium titanate. J. Appl. Phys. 92(2), 1039–1047 (2002). https://doi.org/10.1063/1.1486049
X.T. Zhang, Q.X. Yu, Y.P. Yao, X.G. Li, Ultrafast resistive switching in SrTiO3: Nb single crystal. Appl. Phys. Lett. 97(22), 222117 (2010). https://doi.org/10.1063/1.3524216
B. Chae, J. Seol, J. Song, K. Baek, S. Oh, H. Hwang, C. Park, Nanometer-scale phase transformation determines threshold and memory switching mechanism. Adv. Mater. 29(30), 1701752 (2017). https://doi.org/10.1002/adma.201701752
A. Mannodi-Kanakkithodi, M..Y. Toriyama, F..G.. Sen, M..J.. Davis, R..F. Klie, M..K..Y. Chan, Machine-learned impurity level prediction for semiconductors: the example of Cd-based chalcogenides. NPJ Comput. Mater. 6(1), 39 (2020). https://doi.org/10.1038/s41524-020-0296-7
A. Mannodi-Kanakkithodi, X. Xiang, L. Jacoby, R. Biegaj, S.T. Dunham, D.R. Gamelin, M.K.Y. Chan, Universal machine learning framework for defect predictions in zinc blende semiconductors. Patterns 3(3), 100450 (2022). https://doi.org/10.1016/j.patter.2022.100450
Acknowledgments
A.M.K. acknowledges support from the School of Materials Engineering at Purdue University under Account Number F.10023800.05.002. G.T. acknowledges support from Wayne State University and NSF Grant CCF-2153177.
Author information
Authors and Affiliations
Corresponding author
Ethics declarations
Conflict of interest
On behalf of all authors, the corresponding author states that there is no conflict of interest.
Rights and permissions
Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
About this article
Cite this article
Tutuncuoglu, G., Mannodi-Kanakkithodi, A. Role of defects in resistive switching dynamics of memristors. MRS Communications 12, 531–542 (2022). https://doi.org/10.1557/s43579-022-00243-z
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1557/s43579-022-00243-z