Abstract
Memory technologies with higher density, higher bandwidth, lower power consumption, higher speed, and lower cost are in high demand in the current big data era. In this paper, recent progress of emerging non-volatile memories is reviewed. The current status, challenges, and opportunities of emerging non-volatile memories, such as phase-change memory, resistive random-access memory, ferroelectric field-effect transistors, and magnetic random-access memory, are discussed toward storage-class memory, embedded non-volatile memories, and near/in-memory computing applications.
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M. Horowitz, ISSCC Tech. Dig. (2014), p. 10
S. DeBoer, Symp. VLSI Technol. (2018), p. 3
S. Salahuddin, K. Ni, S. Datta, The era of hyper-scaling in electronics. Nat. Electron. 1, 442 (2018)
S. Lai, Tech. Dig. Int. Electron Devices Meet. (2003), p. 10
R.F. Freitas, W.W. Wilcke, Storage-class memory: The next storage system technology. IBM J. Res. Dev. 52, 439 (2008)
G. Servalli, Tech. Dig. Int. Electron Devices Meet. (2009), p. 113
S. H. Lee, H.C. Park, M.S. Kim, H.W. Kim, M.R. Choi, H.G. Lee, J.W. Seo, S.C. Kim, S.G. Kim, S.B. Hong, S.Y. Lee, J.U. Lee, Y.S. Kim, K.S. Kim, J.I. Kim, M.Y. Lee, H.S. Shin, S.J. Chae, J.H. Song, H.S. Yoon, J.M. Oh, S.K. Min, H.M. Lee, K.R. Hong, J.T. Cheong, S.N. Park, J.C. Ku, Y.S. Sohn, S.K. Park, T.S. Kim, Y.K. Kim, K.W. Park, C.S. Han, W. Kim, H.J. Kim, K.S. Choi, J.H. Lee, S.J. Hong, Tech. Dig. Int. Electron Devices Meet. (2011), p. 47
M.J. Kang, T.J. Park, Y.W. Kwon, D.H. Ahn, Y.S. Kang, H. Jeong, S.J. Ahn, Y.J. Song, B.C. Kim, S.W. Nam, H.K. Kang, G.T. Jeong, C.H. Chung, Tech. Dig. Int. Electron Devices Meet. (2011), p. 39
Y. Choi, I. Song, M.-H. Park, H. Chung, S. Chang, B. Cho, J. Kim, Y. Oh, D. Kwon, J. Sunwoo, J. Shin, Y. Rho, C. Lee, M.G. Kang, J. Lee, Y. Kwon, S. Kim, J. Kim, Y.-J. Lee, Q. Wang, S. Cha, S. Ahn, H. Horii, J. Lee, K. Kim, H. Joo, K. Lee, Y.-T. Lee, J. Yoo, G. Jeong, ISSCC Tech. Dig. (2012), p. 46
D. Kau, S. Tang, I.V Karpov, R. Dodge, B. Klehn, J.A. Kalb, J. Strand, A. Diaz, N. Leung, J. Wu, S. Lee, T. Langtry, K. Chang, C. Papagianni, J. Lee, J. Hirst, S. Erra, E. Flores, N. Righos, H. Castro, G. Spadini, Tech. Dig. Int. Electron Devices Meet. (2009), p. 617
S.R. Ovshinsky, Reversible electrical switching phenomena in disordered structures. Phys. Rev. Lett. 21, 1450 (1968)
S.R. Ovshinsky, H. Fritzsche, Amorphous semiconductors for switching, memory, and imaging applications. IEEE Trans. Electron Devices 20, 91 (1973)
H.-Y. Cheng, F. Carta, W.-C. Chien, H.-L. Lung, M.J. BrightSky, 3D cross-point phase-change memory for storage-class memory. J. Phys. D 52, 473002 (2019)
M.-J. Lee, D. Lee, H. Kim, H.-S. Choi, J.-B. Park, H.G. Kim, Y.-K. Cha, U.-I. Chung, I.-K. Yoo, K. Kim, Tech. Dig. Int. Electron Devices Meet. (2012), p. 33
D. Garbin, W. Devulder, R. Degraeve, G.L. Donadio, S. Clima, K. Opsomer, A. Fantini, D. Cellier, W.G. Kim, M. Pakala, A. Cockburn, C. Detavernier, R. Delhougne, L. Goux, G.S. Kar, Tech. Dig. Int. Electron Devices Meet. (2019), p. 35.1.1
H.Y. Cheng, W.C. Chien, I.T. Kuo, E.K. Lai, Y. Zhu, J.L. Jordan-Sweet, A. Ray, F. Carta, F.M. Lee, P.H. Tseng, M. H. Lee, Y.Y. Lin, W. Kim, R. Bruce, C.W. Yeh, C.H. Yang, M. BrightSky, H.L. Lung, Tech. Dig. Int. Electron Devices Meet. (2017), p. 28
C.W. Yeh, W.C. Chien, R.L. Bruce, H.Y. Cheng, I.T. Kuo, C.H. Yang, A. Ray, H. Miyazoe, W. Kim, F. Carta, E.K. Lai, M. BrightSky, H.L. Lung, Symp. VLSI Technol. (2018), p. 205
H.Y. Cheng, W.C. Chien, I.T. Kuo, C.W. Yeh, L. Gignac, W. Kim, E.K. Lai, Y.F. Lin, R.L. Bruce, C. Lavoie, C.W. Cheng, A. Ray, F.M. Lee, F. Carta, C.H. Yang, M.H. Lee, H.Y. Ho, M. BrightSky, H.L. Lung, Tech. Dig. Int. Electron Devices Meet. (2018), p. 37.3.1
H.Y. Cheng, I.T. Kuo, W.C. Chien, C.W. Yeh, Y.C. Chou, N. Gong, L. Gignac, C.H. Yang, C.W. Cheng, C. Lavoie, M. Hopstaken, R.L. Bruce, L. Buzi, E.K. Lai, F. Carta, A. Ray, M.H. Lee, H.Y. Ho, W. Kim, M. BrightSky, H.L. Lung, Symp. VLSI Technol. (2020), p. TM1.6
T. Kim, H. Choi, M. Kim, J. Yi, D. Kim, S. Cho, H. Lee, C. Hwang, E.-R. Hwang, J. Song, S. Chae, Y. Chun, J.-K. Kim, Tech. Dig. Int. Electron Devices Meet. (2018), p. 37.1.1
A. Fazio, Tech. Dig. Int. Electron Devices Meet. (2020), p. 24.1.1
T.W. Hickmott, Low-frequency negative resistance in thin anodic oxide films. J. Appl. Phys. 33, 2669 (1962)
H.-S.P. Wong, H.-Y. Lee, S. Yu, Y.-S. Chen, Y. Wu, P.-S. Chen, B. Lee, F.T. Chen, M.-J. Tsai, “Metal–Oxide RRAM.” Proc. IEEE. 100, 1951 (2012)
M.N. Kozicki, M. Park, M. Mitkova, Nanoscale memory elements based on solid-state electrolytes. IEEE Trans. Nanotechnol. 4, 331 (2005)
E. Wu, T. Ando, B. Li, R. Southwick, J. Stathis, Fundamental roles of extreme-value distributions in dielectric breakdown and memory applications (minimum-value versus maximum-value statistics). Jpn. J. Appl. Phys. 59, 0803 (2020)
R. Waser, R. Dittmann, G. Staikov, K. Szot, Redox-based resistive switching memories–nanoionic mechanisms, prospects, and challenges. Adv. Mater. 21, 2632 (2009)
I.G. Baek, C.J. Park, H. Ju, D.J. Seong, H.S. Ahn, J.H. Kim, M.K. Yang, S.H. Song, E.M. Kim, S.O. Park, C.H. Park, C.W. Song, G.T. Jeong, S. Choi, H.K. Kang, C. Chung, Tech. Dig. Int. Electron Devices Meet. (2011), p. 31.8.1
H.W. Pan, K.P. Huang, S.Y. Chen, P.C. Peng, Z.S. Yang, C.-H. Kuo, Y.-D. Chih, Y.-C. King, C.J. Lin, Tech. Dig. Int. Electron Devices Meet. (2015), p. 10.5.1
O. Golonzka, U. Arslan, P. Bai, M. Bohr, O. Baykan, Y. Chang, A. Chaudhari, A. Chen, J. Clarke, C. Connor, N. Das, C. English, T. Ghani, F. Hamzaoglu, P. Hentges, P. Jain, C. Jezewski, I. Karpov, H. Kothari, R. Kotlyar, B. Lin, M. Metz, J. Odonnell, D. Ouellette, J. Park, A. Pirkle, P. Quintero, D. Seghete, M. Sekhar, A. Sen Gupta, M. Seth, N. Strutt, C. Wiegand, H.J. Yoo, K. Fischer, Symp. VLSI Technol. (2019), p. T230
T. Gokmen, Y. Vlasov, Acceleration of deep neural network training with resistive cross-point devices: Design considerations. Front. Neurosci. 10, 333 (2016)
N. Gong, T. Idé, S. Kim, I. Boybat, A. Sebastian, V. Narayanan, T. Ando, Signal and noise extraction from analog memory elements for neuromorphic computing. Nat. Commun. 9, 1 (2018)
T. Gokmen, W. Haensch, Algorithm for training neural networks on resistive device arrays. Front. Neurosci. 14, 103 (2020)
H. Kim, M. Rasch, T. Gokmen, T. Ando, H. Miyazoe, J.-J. Kim, J. Rozen, S. Kim, Zero-shifting technique for deep neural network training on resistive cross-point arrays. Preprint, arXiv:1907.10228 (2019)
I.M. Ross, Semiconductive translating device, US Patent 2,791,760 (1957)
H. Ishiwara, Current status and prospects of FET-type ferroelectric memories. FED J. 11, 27 (2000)
T.P. Ma, J.-P. Han, Why is nonvolatile ferroelectric memory field-effect transistor still elusive? IEEE Electron Device Lett. 23, 386 (2002)
T.S. Böscke, J. Müller, D. Bräuhaus, U. Schröder, U. Böttger, Ferroelectricity in hafnium oxide thin films. Appl. Phys. Lett. 99, 102903 (2011)
J. Muller, T.S. Boscke, U. Schroder, S. Mueller, D. Brauhaus, U. Bottger, L. Frey, T. Mikolajick, Ferroelectricity in simple binary ZrO2 and HfO2. Nano Lett. 12, 4318 (2012)
S. Dunkel, M. Trentzsch, R. Richter, P. Moll, C. Fuchs, O. Gehring, M. Majer, S. Wittek, B. Muller, T. Melde, H. Mulaosmanovic, S. Slesazeck, S. Muller, J. Ocker, M. Noack, D.-A. Lohr, P. Polakowski, J. Muller, T. Mikolajick, J. Hontschel, B. Rice, J. Pellerin, S. Beyer, Tech. Dig. Int. Electron Devices Meet. (2017), p. 19.7.1
X. Tian, S. Shibayama, T. Nishimura, T. Yajima, S. Migita, A. Toriumi, Evolution of ferroelectric HfO2 in ultrathin region down to 3 nm. Appl. Phys. Lett. 112, 102902 (2018)
X. Lyu, M. Si, X. Sun, M.A. Capano, H. Wang, P.D. Ye, Symp. VLSI Technol. (2019), p. T44
S.S. Cheema, D. Kwon, N. Shanker, R. dos Reis, S.-L. Hsu, J. Xiao, H. Zhang, R. Wagner, A. Datar, M.R. McCarter, C.R. Serrao, A.K. Yadav, G. Karbasian, C.-H. Hsu, A.J. Tan, L.-C. Wang, V. Thakare, X. Zhang, A. Mehta, E. Karapetrova, R.V. Chopdekar, P. Shafer, E. Arenholz, C. Hu, R. Proksch, R. Ramesh, J. Ciston, S. Salahuddin, Enhanced ferroelectricity in ultrathin films grown directly on silicon. Nature 580, 478 (2020)
T.S. Boscke, J. Muller, D. Brauhaus, U. Schroder, U. Bottger, Tech. Dig. Int. Electron Devices Meet. (2011), p. 24.5.1
N. Gong, T.-P. Ma, IEEE Electron Device Lett. 37, 1123 (2016)
W. Chung, M. Si, P.R. Shrestha, J.P. Campbell, K.P. Cheung, P. D. Ye, Symp. VLSI Technol. (2018), p. 89
M. Si, X. Lyu, P.R. Shrestha, X. Sun, H. Wang, K.P. Cheung, P.D. Ye, Ultrafast measurements of polarization switching dynamics on ferroelectric and anti-ferroelectric hafnium zirconium oxide. Appl. Phys. Lett. 115, 72107 (2019)
X. Lyu, M. Si, P.R. Shrestha, K.P. Cheung, P.D. Ye, Tech. Dig. Int. Electron Devices Meet. (2019), p. 15.2.1
Y.-C. Chiu, C.-H. Cheng, C.-Y. Chang, M.-H. Lee, H.-H. Hsu, S.-S. Yen, Symp. VLSI Technol. (2015), p. T184
J. Muller, T.S. Boscke, U. Schroder, R. Hoffmann, T. Mikolajick, L. Frey, Nanosecond polarization switching and long retention in a novel MFIS-FET based on ferroelectric HfO2. IEEE Electron Device Lett. 33, 185 (2012)
E. Yurchuk, J. Muller, J. Paul, T. Schlosser, D. Martin, R. Hoffmann, S. Mueller, S. Slesazeck, U. Schroeder, R. Boschke, R. van Bentum, T. Mikolajick, Impact of scaling on the performance of HfO2-based ferroelectric field effect transistors. IEEE Trans. Electron Devices 61, 3699 (2014)
K. Ni, P. Sharma, J. Zhang, M. Jerry, J.A. Smith, K. Tapily, R. Clark, S. Mahapatra, S. Datta, Critical role of interlayer in Hf0.5Zr0.5O2 ferroelectric FET nonvolatile memory performance. IEEE Trans. Electron Devices 65, 2461 (2018)
M. Si, X. Lyu, P.D. Ye, Ferroelectric polarization switching of hafnium zirconium oxide in a ferroelectric/dielectric stack. ACS Appl. Electron. Mater. 1, 745 (2019)
M. Si, Z. Lin, J. Noh, J. Li, W. Chung, D.Y. Peide, The impact of channel semiconductor on the memory characteristics of ferroelectric field-effect transistors. IEEE J. Electron Devices Soc. 8, 846 (2020)
M. Si, P.D. Ye, The critical role of charge balance on the memory characteristics of ferroelectric field-effect transistors. IEEE Trans. Electron Devices 68, 5108 (2021)
K. Toprasertpong, M. Takenaka, S. Takagi, Tech. Dig. Int. Electron Devices Meet. (2019), p. 23.7.1
M. Si, J. Andler, X. Lyu, C. Niu, S. Datta, R. Agrawal, P.D. Ye, Indium–tin-oxide transistors with one nanometer thick channel and ferroelectric gating. ACS Nano 14, 11542 (2020)
A.A. Sharma, B. Doyle, H.J. Yoo, I.-C. Tung, J. Kavalieros, M.V Metz, M. Reshotko, P. Majhi, T. Brown-Heft, Y.-J. Chen, V.H. Le, Tech. Dig. Int. Electron Devices Meet. (2020), p. 18.5.1
S. Dutta, H. Ye, W. Chakraborty, Y.-C. Luo, M.S. Jose, B. Grisafe, A. Khanna, I. Lightcap, S. Shinde, S. Yu, S. Datta, Tech. Dig. Int. Electron Devices Meet. (2020), p. 36.4.1
K. Florent, S. Lavizzari, L. Di Piazza, M. Popovici, E. Vecchio, G. Potoms, G. Groeseneken, J. Van IHoudt, Symp. VLSI Technol. (2017), p. T158
M.-K. Kim, I.-J. Kim, J.-S. Lee, CMOS-compatible ferroelectric NAND flash memory for high-density, low-power, and high-speed three-dimensional memory. Sci. Adv. 7, eabe1341 (2021)
M. Jerry, P.-Y. Chen, J. Zhang, P. Sharma, K. Ni, S. Yu, S. Datta, Tech. Dig. Int. Electron Devices Meet. (2017), p. 6.2.1
W. Chung, M. Si, P.D. Ye, Tech. Dig. Int. Electron Devices Meet. (2018), p. 15.2.1
Z. Wang, B. Crafton, J. Gomez, R. Xu, A. Luo, Z. Krivokapic, L. Martin, S. Datta, A. Raychowdhury, A.I. Khan, Tech. Dig. Int. Electron Devices Meet. (2018), p. 13.3.1
A. Keshavarzi, K. Ni, W. Van Den Hoek, S. Datta, A. Raychowdhury, Ferroelectronics for edge intelligence. IEEE Micro 40, 33 (2020)
J.C. Slonczewski, Conductance and exchange coupling of two ferromagnets separated by a tunneling barrier. Phys. Rev. B 39, 6995 (1989)
J.C. Slonczewski, Current-driven excitation of magnetic multilayers. J. Magn. Magn. Mater. 159, L1 (1996)
L. Berger, Emission of spin waves by a magnetic multilayer traversed by a current. Phys. Rev. B 54, 9353 (1996)
J.Z. Sun, Current-driven magnetic switching in manganite trilayer junctions. J. Magn. Magn. Mater. 202, 157 (1999)
J.A. Katine, F.J. Albert, R.A. Buhrman, E.B. Myers, D.C. Ralph, Current-driven magnetization reversal and spin-wave excitations in Co/Cu/Co pillars. Phys. Rev. Lett. 84, 3149 (2000)
T. Miyazaki, N. Tezuka, Giant magnetic tunneling effect in Fe/Al2O3/Fe junction. J. Magn. Magn. Mater. 139, L231 (1995)
J.S. Moodera, L.R. Kinder, T.M. Wong, R. Meservey, Large magnetoresistance at room temperature in ferromagnetic thin film tunnel junctions. Phys. Rev. Lett. 74, 3273 (1995)
W.H. Butler, X.-G. Zhang, T.C. Schulthess, J.M. MacLaren, Spin-dependent tunneling conductance of Fe|MgO|Fe sandwiches. Phys. Rev. B 63, 54416 (2001)
S. Yuasa, T. Nagahama, A. Fukushima, Y. Suzuki, K. Ando, Giant room-temperature magnetoresistance in single-crystal Fe/MgO/Fe magnetic tunnel junctions. Nat. Mater. 3, 868 (2004)
S.S.P. Parkin, C. Kaiser, A. Panchula, P.M. Rice, B. Hughes, M. Samant, S.-H. Yang, Giant tunnelling magnetoresistance at room temperature with MgO (100) tunnel barriers. Nat. Mater. 3, 862 (2004)
S. Ikeda, J. Hayakawa, Y. Ashizawa, Y.M. Lee, K. Miura, H. Hasegawa, M. Tsunoda, F. Matsukura, H. Ohno, Tunnel magnetoresistance of 604% at 300 K by suppression of Ta diffusion in CoFeB/MgO/CoFeB pseudo-spin-valves annealed at high temperature. Appl. Phys. Lett. 93, 82508 (2008)
J.Z. Sun, Spin-current interaction with a monodomain magnetic body: A model study. Phys. Rev. B. 62, 570 (2000)
D.C. Worledge, G. Hu, P.L. Trouilloud, D.W. Abraham, S. Brown, M.C. Gaidis, J. Nowak, E.J. O’Sullivan, R.P. Robertazzi, J.Z. Sun, W.J. Gallagher, Tech. Dig. Int. Electron Devices Meet. (2010), p. 12.5.1
S. Ikeda, K. Miura, H. Yamamoto, K. Mizunuma, H.D. Gan, M. Endo, S. Kanai, J. Hayakawa, F. Matsukura, H. Ohno, A perpendicular-anisotropy CoFeB-MgO magnetic tunnel junction. Nat. Mater. 9, 721 (2010)
D.C. Worledge, G. Hu, D.W. Abraham, J.Z. Sun, P.L. Trouilloud, J. Nowak, S. Brown, M.C. Gaidis, E.J. O’sullivan, R.P. Robertazzi, Spin torque switching of perpendicular Ta∣CoFeB∣MgO-based magnetic tunnel junctions. Appl. Phys. Lett. 98, 22501 (2011)
G. Hu, T. Topuria, P.M. Rice, J. Jordan-Sweet, D.C. Worledge, Optimization of tunneling magnetoresistance in perpendicular magnetic tunnel junctions with Co|Pd reference layers. IEEE Magn. Lett. 4, 3000104 (2013)
G. Hu, D. Kim, J. Kim, C. Kothandaraman, G. Lauer, H.K. Lee, N. Marchack, M. Reuter, R.P. Robertazzi, J.Z. Sun, T. Suwannasiri, J.J. Nowak, P.L. Trouilloud, S. Woo, D.C. Worledge, M.G. Gottwald, S.L. Brown, B. Doris, C.P. D’Emic, P. Hashemi, D. Houssameddine, Q. He, Tech. Dig. Int. Electron Devices Meet. (2019), p. 2.6.1
E.R.J. Edwards, G. Hu, S.L. Brown, C.P. D’Emic, M.G. Gottwald, P. Hashemi, H. Jung, J. Kim, G. Lauer, J.J. Nowak, J.Z. Sun, T. Suwannasiri, P.L. Trouilloud, S. Woo, D.C. Worledge, Tech. Dig. Int. Electron Devices Meet. (2020), p. 24.4.1
H. Honjo, T.V.A. Nguyen, T. Watanabe, T. Nasuno, C. Zhang, T. Tanigawa, S. Miura, H. Inoue, M. Niwa, T. Yoshiduka, Y. Noguchi, M. Yasuhira, A. Tamakoshi, M. Natsui, Y. Ma, H. Koike, Y. Takahashi, K. Furuya, H. Shen, S. Fukami, H. Sato, S. Ikeda, T. Hanyu, H. Ohno, T. Endoh, Tech. Dig. Int. Electron Devices Meet. (2019), p. 28.5.1
K. Garello, F. Yasin, H. Hody, S. Couet, L. Souriau, S.H. Sharifi, J. Swerts, R. Carpenter, S. Rao, W. Kim, J. Wu, K.K.V. Sethu, M. Pak, N. Jossart, D. Crotti, A. Furnemont, G.S. Kar, Symp. VLSI Technol. (2019), p. T194
M. Wang, W. Cai, D. Zhu, Z. Wang, J. Kan, Z. Zhao, K. Cao, Z. Wang, Y. Zhang, T. Zhang, C. Park, J.-P. Wang, A. Fert, W. Zhao, Field-free switching of a perpendicular magnetic tunnel junction through the interplay of spin–orbit and spin-transfer torques. Nat. Electron. 1, 582 (2018)
N. Sato, G.A. Allen, W.P. Benson, B. Buford, A. Chakraborty, M. Christenson, T.A. Gosavi, P.E. Heil, N.A. Kabir, B.J. Krist, K.P. O’Brien, K. Oguz, R.R. Patil, J. Pellegren, A.K. Smith, E.S. Walker, P. J. Hentges, M.V. Metz, M. Seth, B. Turkot, C.J. Wiegand, H.J. Yoo, I.A. Young, Symp. VLSI Technol. (2020), p. 1
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Si, M., Cheng, HY., Ando, T. et al. Overview and outlook of emerging non-volatile memories. MRS Bulletin 46, 946–958 (2021). https://doi.org/10.1557/s43577-021-00204-2
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DOI: https://doi.org/10.1557/s43577-021-00204-2