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An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography

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Abstract

Nanosphere lithography (NSL) is a technique capable of creating large-area arrays of small objects with tailor-made shapes. Here we present an algorithm, which simulates the shape and morphology of nanoparticles produced via NSL in combination with physical vapor deposition from variable angles. The key idea is based on a ray-tracing technique. Mask clogging effects have a major influence on the shape of resulting nanoobjects and are therefore taken into account. In addition, we implemented a metaball concept for the precise description of thermally modified masks. The calculated results are compared exemplarily with atomic force microscopy (AFM) data of experimentally fabricated nanostructures.

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Acknowledgments

We would like to thank the German Research Society (DFG) for financial supporting this work in connection with the Research Training Group 1464.

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Authors and Affiliations

  1. Dept. of Physics, University of Paderborn, Warburger Str. 100, 33098, Paderborn, Germany

    Christoph Brodehl, Siegmund Greulich-Weber & Jörg K. N. Lindner

  2. Center for Optoelectronics and Photonics Paderborn (CeOPP), 33098, Paderborn, Germany

    Christoph Brodehl, Siegmund Greulich-Weber & Jörg K. N. Lindner

Authors
  1. Christoph Brodehl
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  2. Siegmund Greulich-Weber
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  3. Jörg K. N. Lindner
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Brodehl, C., Greulich-Weber, S. & Lindner, J.K.N. An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography. MRS Online Proceedings Library 1748, 32–37 (2014). https://doi.org/10.1557/opl.2015.77

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  • DOI: https://doi.org/10.1557/opl.2015.77

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