Abstract
Thin tantalum nitride films were grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS) while varying the fractional N2 flow rate at fixed substrate temperature of 400°C. The film properties were compared to films grown by conventional dc magnetron sputtering (dcMS) at similar conditions. Structural characterization was carried out using X-ray diffraction and reflection methods. The HiPIMS process produces slightly less dense films than does dcMS and the surface roughness is similar for both the HiPIMS and dcMS grown films. The deposition rate for HiPIMS is up to 80 % lower than for dcMS but it can be roughly doubled by lowering the magnetic field strength by 30 %.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
K. Valleti, A. Subrahmanyam, S. V. Joshi, A. R. Phani, M. Passacantando, S. Santucci, Journal of Physics D: Applied Physics 41 (4) (2008) 045409.
S. K. Kim, B. C. Cha, Thin Solid Films 475 (1–2) (2005) 202 – 207.
A. Mellberg, S. P. Nicols, N. Rorsman, H. Zirath, Electrochemical and Solid-State Letters 7 (11) (2004) G261 – G263.
J. D. Plummer, M. D. Deal, P. B. Griffin, Silicon VLSI Technology: Fundamentals, Practice, and Modeling, Prentice Hall, New Jersey, 2000
A. E. Kaloyeros, E. Eisenbraun, Annual Review of Materials Science 30 (2000) 363 – 385.
C.-S. Shin, Y.-W. Kim, D. Gall, J. E. Greene, I. Petrov, Thin Solid Films 402 (12) (2002) 172 – 182.
U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, J. T. Gudmundsson, Thin Solid Films 513 (1–2) (2006) 1 – 24.
J. T. Gudmundsson, N. Brenning, D. Lundin, U. Helmersson, Journal of Vacuum Science and Technology A 30 (3) (2012) 030801.
D. Gerstenberg, C. J. Calbick, Journal of Applied Physics 35 (2) (1964) 402 – 407.
R. Saha, J. A. Barnard, Journal of Crystal Growth 174 (14) (1997) 495 – 500.
M. Grosser, M. Münch, J. Brenner, M. Wilke, H. Seidel, C. Bienert, A. Roosen, U. Schmid, Microsystem Technologies 16 (5) (2010) 825 – 836.
W.-H. Lee, J.-C. Lin, C. Lee, Materials Chemistry and Physics 68 (1-3) (2001) 266 – 271.
G. R. Lee, H. Kim, H. S. Choi, J. J. Lee, Applied Surface Science 258 (3) (2011) 1033 – 1037.
G. R. Lee, H. Kim, H. S. Choi, J. J. Lee, Surface and Coatings Technology 201 (9–11) (2007) 5207 – 5210.
U. B. Arnalds, J. S. Agustsson, A. S. Ingason, A. K. Eriksson, K. B. Gylfason, J. T. Gudmundsson, S. Olafsson, Review of Scientific Instruments 78 (10) (2007) 103901.
M. Samuelsson, D. Lundin, J. Jensen, M. A. Raadu, J. T. Gudmundsson and U. Helmersson, Surface and Coating Technology 202 (2) 591 – 596
W.D. Sproul, D. J. Christie and D. C. Carter, “The Reactive Sputter Deposition of Aluminum Oxide Coatings Using High Power Pulsed Magnetron Sputtering (HPPMS)”, 47th Annual Society of Vacuum Coaters Technical Conference Proceedings, April 24 – 29, 2004, Dallas, TX, USA, p. 96–100.
A. Mishra, P. J. Kelly and J. W. Bradley, Plasma Sources Science and Technology 19 (4) 045014
JCPDS-ICDD File Card No. 32–1283
JCPDS-ICDD File Card No. 26–985
F. Magnus, A. S. Ingason, S. Olafsson and J. T. Gudmundsson, IEEE Electron Device Letters, 33(7) (2012) 1045 – 1047
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Thorsteinsson, D.O., Tryggvason, T.K. & Gudmundsson, J.T. Morphology of Tantalum Nitride Thin Films Grown on Fused Quartz by Reactive High Power Impulse Magnetron Sputtering (HiPIMS). MRS Online Proceedings Library 1803, 4 (2015). https://doi.org/10.1557/opl.2015.518
Published:
DOI: https://doi.org/10.1557/opl.2015.518