Abstract
Transmission electron microscopy (TEM) is a valuable methodology for investigating radiation-induced microstructural changes and elucidating the underlying mechanisms involved in the aging and degradation of nuclear reactor materials. However, the use of electrons for imaging may result in several inadvertent effects that can potentially change the microstructure and mechanisms active in the material being investigated. In this study, in situ TEM characterization is performed on nanocrystalline nickel samples under self-ion irradiation and post irradiation annealing. During annealing, voids are formed around 200 °C only in the area illuminated by the electron beam. Based on diffraction patterns analyses, it is hypothesized that the electron beam enhanced the growth of a NiO layer resulting in a decrease of vacancy mobility during annealing. The electron beam used to investigate self-ion irradiation ultimately significantly affected the type of defects formed and the final defect microstructure.
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Muntifering, B., Dingreville, R., Hattar, K. et al. Electron Beam Effects during In-Situ Annealing of Self-Ion Irradiated Nanocrystalline Nickel. MRS Online Proceedings Library 1809, 3 (2015). https://doi.org/10.1557/opl.2015.499
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DOI: https://doi.org/10.1557/opl.2015.499