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Optimization of amorphous semiconductors and low-/high-k dielectrics through percolation and topological constraint theory

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Abstract

We explore some aspects of the optimization of amorphous semiconductors as well as low- and high-dielectric-constant (low-/high-k) materials viewed purely from the perspective of percolation and topological constraint theories. We specifically illustrate how percolation, constraint theory, and mean network coordination, 〈r〉, play underlying roles in determining the electrical and mechanical properties of amorphous semiconducting and dielectric materials as well as interfaces that are important for modern micro-/nanoelectronic devices.

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Authors and Affiliations

  1. Department of Physics and Astronomy, University of Missouri–Kansas City, USA

    Michelle M. Paquette

  2. Extreme Light Laboratory, Department of Physics and Astronomy, University of Nebraska–Lincoln and University of Missouri–Kansas City, USA

    Bradley J. Nordell

  3. Department of Physics and Astronomy, University of Missouri–Kansas City, USA

    Anthony N. Caruso

  4. Department of Electrical and Electronic Engineering, Gifu University, Japan

    Masanori Sato

  5. Department of Electrical, Electronic and Computer Engineering, Gifu University, Japan

    Hiroyuki Fujiwara

  6. Logic Technology Development, Intel Corporation, USA

    Sean W. King

Authors
  1. Michelle M. Paquette
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  2. Bradley J. Nordell
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  3. Anthony N. Caruso
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  4. Masanori Sato
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  5. Hiroyuki Fujiwara
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  6. Sean W. King
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Correspondence to Michelle M. Paquette.

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Paquette, M.M., Nordell, B.J., Caruso, A.N. et al. Optimization of amorphous semiconductors and low-/high-k dielectrics through percolation and topological constraint theory. MRS Bulletin 42, 39–44 (2017). https://doi.org/10.1557/mrs.2016.297

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  • DOI: https://doi.org/10.1557/mrs.2016.297

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