Abstract
Electronically active block polymers based on π-conjugated macromolecules have been investigated for applications where nanostructured electrodes are of prime import; however, controlling the nanoscale order of these materials has proven challenging. Here, we demonstrate that diblock copolymers that utilize a non-conjugated radical polymer moiety as the electronically active block assemble into ordered thin-film nanostructures. Specifically, the diblock copolymer polydimethylsiloxane-b-poly(2,2,6,6-tetramethylpiperidinyloxy methacrylate) (PDMS–PTMA) was synthesized via atom transfer radical polymerization to generate polymers with readily controlled molecular properties. Importantly, solvent annealing of the PDMS–PTMA thin films led to well-defined nanostructures with domain spacings of the order of ∼30–40 nm.
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Acknowledgments
We gratefully acknowledge financial support from the Air Force Office of Scientific Research through the Young Investigator Program (AFOSR YIP, Grant number FA9550-12-1-0243, Program Manager: Dr. Charles Lee). L. R. and J. S. L. appreciatively acknowledge the National Science Foundation forsupport through the Graduate Research Fellowship Program (Grant number DGE-1333468). A. R. M. thanks the National Science Foundation for partial support of his work through the Nanotechnology Undergraduate Education (NUE) in Engineering Program (Award number 1242171, Program Manager: Dr. Mary Poats). Further support of the work of A. R. M. was generously provided by the Intel Corporation and the Semiconductor Research Corporation (SRC) Education Alliance. We thank Gamini Mendis for assistance with the differential scanning calorimetry experiments.
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Rostro, L., Baradwaj, A.G., Muller, A.R. et al. Synthesis and thin-film self-assembly of radical-containing diblock copolymers. MRS Communications 5, 257–263 (2015). https://doi.org/10.1557/mrc.2015.27
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DOI: https://doi.org/10.1557/mrc.2015.27