Abstract
Ternary Fe-Co-Si B20 phase structure was formed by implanting Fe and Co ions consecutively into Si(100) substrate at 50 keV energy, each with a fluence of 1.0 × 1017 atoms/cm2 and post-thermal vacuum annealing at 500 oC for 60 minutes. An in-situ magnetic field was used to enhance the formation of the ternary phase in the Si substrate during the implantation process. The magnetic field of 0.05 T was applied perpendicular to the incoming ion beam direction and parallel to the substrate surface to form elongated clusters in the transverse direction of the sample. Prior to the implantation of ions, the implant ions depth profiles were simulated using a dynamic ion-solid interaction code (TRIDYN). The TRIDYN simulation predicted a saturation in the peak concentration of the Fe and Co ions at a fluence of 1.0 × 1017 atoms/cm2. XPS measurement at the peak concentration depth (40 nm) showed the presence of Fe (23 %) and Co (32 %) in the Si matrix. XRD characterization confirmed the presence of stable Fe-Co-Si B20 phase structure in the annealed samples implanted with the in-situ magnetic field.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Mark E. Schlesinger, Chemical Reviews 90 (4), 607–628 (1990).
K. J. Reeson, M. S. Finney, M. A. Harry, S. V. Hutchinson, Y. S. Tan, D. Leong, T. R. Bearda, Z. Yang, G. Curello, K. P. Homewood, R. M. Gwilliam and B. J. Sealy, Nucl. Instr. Meth. Phys. Res. B 106 (1–4), 364–371 (1995).
R. A. de Groot, F. M. Mueller, P. G. van Engen, and K. H. J. Buschow, Phys. Rev. Lett. 50, 2024–2027 (1983).
H. Kijima, T. Ishikawa, T. Marukame, K.-I. Matsuda, T. Uemura, and M. Yamamoto, Journal of Magnetism and Magnetic Materials 310 (2)-3, 2006–2008 (2007), Proceedings of the 17th International Conference on Magnetism.
Sabine Wurmehl, Gerhard H. Fecher, Hem C. Kandpal, Vadim Ksenofontov, Claudia Felser, Hong-Ji Lin, and Jonder Morais, Phys. Rev. B, 72, 184434 (2005).
I. Dzsi, Cs. Fetzer, M. Kiss, H. Pattyn, A. Vantomme, and G. Langouche, Applied Physics Letters 76 (14), 1917–1919 (2000).
Karen J. Reeson, Jane Sharpe, Milton Harry, Daniel Leong, Colin McKinty, Adrian Kewell, Manon Loureno, Yan Ling Chen, G. Shao and Kevin P. Homewood, Microelectronic Engineering 50 (1–4), 223–235 (2000).
Bibhudutta Rout, Mangal S. Dhoubhadel, Prakash R. Poudel, Venkata C. Kummari, Bimal Pandey, Naresh T. Deoli, Wickramaarachchige J. Lakshantha, Stephen J. Mulware, Jacob Baxley, Jack E. Manuel, Jose L. Pacheco, Szabolcs Szilasi, Duncan L. Weathers, Tilo Reinert, Gary A. Glass, Jerry L. Duggan, and Floyd D. McDaniel, Radiation Physics, AIP Conference Proceedings 1544, 11–18 (2013).
David Meeker, Finite Element Method Magnetics, version 4.2 (2015). Aavailable at http://www.femm.info (accessed 17 November 2016).
W. Eckstein, Computer simulation of ion-solid interactions, Springer, Berlin, 1991.
W. Moller and M. Posselt, TRIDYN-HZDR user manual, Institute of Ion Beam Physics and Material Research, Helmholtz-Zentrum Dresden-Rossendorf, 01314, Germany, version 17 ed. (2012).
Wickramaarachchige J. Lakshantha, Venkata C. Kummari, Tilo Reinert, Floyd D. McDaniel, and Bibhudutta Rout, Nucl. Instr. Meth. Phys. Res. B 332, 33–36 (2014).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Lakshantha, W.J., Singh, S., McDaniel, F.D. et al. Formation of Fe-Co-Si Structure in Fe and Co Implanted Si Substrate. MRS Advances 2, 2309–2314 (2017). https://doi.org/10.1557/adv.2017.271
Published:
Issue Date:
DOI: https://doi.org/10.1557/adv.2017.271