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Subwavelength grating wideband reflectors with tapered sidewall profile

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Abstract

One main difference between practical device and ideal design for subwavelength grating structure is the tapered sidewall profile of grating, which is normally obtained by the practical CMOS-compatible fabrication and etching process. Our work has investigated the impacts of tapered sidewall profile on the subwavelength grating wideband reflector characteristics. Both zero-contrast gratings (ZCG) and high- contrast gratings (HCG) are numerically investigated in detail and the results show a distinct differences of the impacts of tapered sidewall profile of grating. The simulation results reveal that this factor play a critical role in determining the reflection bandwidth, average reflectance, and the band edge. Our study has potential in guiding the utilization of subwavelength grating wideband reflector on application of a variety of nanophotonic devices and their integration, as well as to facilitate the design of the fabrication process on the control of tapered sidewall profile.

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Authors and Affiliations

  1. University of Michigan, MI, USA

    W. Yu, D. Wu & Y. Yi

  2. Massachusetts Institute of Technology, Cambridge, MA, USA

    X. Duan & Y. Yi

Authors
  1. W. Yu
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  2. D. Wu
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  3. X. Duan
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  4. Y. Yi
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Correspondence to Y. Yi.

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Yu, W., Wu, D., Duan, X. et al. Subwavelength grating wideband reflectors with tapered sidewall profile. MRS Advances 1, 1683–1691 (2016). https://doi.org/10.1557/adv.2015.18

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  • DOI: https://doi.org/10.1557/adv.2015.18

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