Skip to main content
SpringerLink
Log in

Evidence of secondary electron emission during PIII pulses as measured by calorimetric probe

  • Regular Article
  • Published:
The European Physical Journal D Aims and scope Submit manuscript

Abstract

Secondary electrons are an ubiquitous nuisance during plasma immersion ion implantation (PIII) necessitating excessive current supplies and shielding for X-rays generated by them. However, additional effects – especially at low pulse voltages – can include interactions with the plasma and transient increases in the plasma density. Here, it is shown that the transient thermal flux associated with secondary electrons emitted from the pulsed substrate can be directly measured using a passive calorimetric probe mounted near the chamber wall away from the pulsed substrate holder. A small increase of a directed energy flux from the substrate towards the probe is consistently observed on top of the isotropic flux from the plasma surrounding the probe, scaling with pulse frequency, pulse voltage, pulse length – as well as depending on gas and substrate material. A strong correlation between voltage and substrate-probe distance is observed, which should allow further investigation of low energy electrons with the plasma itself.

Graphical abstract

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. J.R. Conrad, J.L. Radtke, R.A. Dodd, F.J. Worzala, J. Appl. Phys. 62, 4591 (1987)

    Article  ADS  Google Scholar 

  2. R.B. Liebert, S.R. Walther, S.B. Felch, Z. Fang, B.O. Pedersen, D. Hacker, Plasma doping system for 200 and 300 mm wafers, in Ion Implantation Technology, edited by H. Ryssel (IEEE Press, Piscataway, NJ, 2000), pp. 472-475

  3. B.P. Wood, I. Henins, R.J. Gribble, W.A. Reass, R.J. Faehl, M. Nastasi, D.J. Rej, J. Vac. Sci. Technol. B 12, 870 (1994)

    Article  Google Scholar 

  4. D.J. Rej, R.J. Faehl, J.N. Matossian, Surf. Coat. Technol. 96, 45 (1997)

    Article  Google Scholar 

  5. J.N. Matossian, J.D. Williams, U.S. Patent 5498290, 1996

  6. B. Szapiro, J.J. Rocca, J. Appl. Phys. 65, 3713 (1989)

    Article  ADS  Google Scholar 

  7. A. Anders, G.Yu. Yushkov, Surf. Coat. Technol. 136, 111 (2001)

    Article  Google Scholar 

  8. Y. Itikawa, M. Hayashi, A. Ichimura, K. Onda, K. Sakimoto, K. Takayanagi, M. Nakamura, H. Nishimura, T. Takayanagi, J. Phys. Chem. Ref. Data 15, 985 (1986)

    Article  ADS  Google Scholar 

  9. A.V. Phelps, J. Phys. Chem. Ref. Data 20, 557 (1991)

    Article  ADS  Google Scholar 

  10. M.M. Shamim, J.T. Scheuer, R.Pl. Fetherston. J.R. Conrad, J. Appl. Phys. 70, 4756 (1991)

    Article  ADS  Google Scholar 

  11. B.P. Cluggish, C.P. Munson, J. Appl. Phys. 84, 5945 (1998)

    Article  ADS  Google Scholar 

  12. S. Mändl, R. Günzel, W. Möller, J. Phys. D 31, 1109 (1998)

    Article  ADS  Google Scholar 

  13. S. Mändl, B. Rauschenbach, J. Appl. Phys. 88, 3323 (2000)

    Article  ADS  Google Scholar 

  14. S. Bornholdt, H. Kersten, Eur. Phys. J. D 67, 176 (2013)

    Article  ADS  Google Scholar 

  15. M. Stahl, T. Trottenberg, H. Kersten, Rev. Sci. Instrum. 81, 023504 (2010)

    Article  ADS  Google Scholar 

  16. S. Mändl, J. Brutscher, R. Günzel, W. Möller, J. Vac. Sci. Technol. B 14, 2701 (1996)

    Article  Google Scholar 

  17. M.A. Lieberman, J. Appl. Phys. 65, 4186 (1989)

    Article  ADS  Google Scholar 

  18. I. Langmuir, K.B. Blodgett, Phys. Rev. 22, 347 (1923)

    Article  ADS  Google Scholar 

  19. A. Wucher, H. Oechsner, Surf. Sci. 199, 567 (1988)

    Article  ADS  Google Scholar 

  20. J.F. Ziegler, M.D. Ziegler, J.P. Biersack, Nucl. Instrum. Methods B 268, 1818 (2010)

    Article  ADS  Google Scholar 

  21. I. Langmuir, K.B. Blodgett, Phys. Rev. 22, 347 (1923)

    Article  ADS  Google Scholar 

  22. S. Mändl, Plasma Proc. Polymers 4, 23 (2007)

    Google Scholar 

  23. C.D. Child, Phys. Rev. 32, 492 (1911)

    ADS  Google Scholar 

  24. D. Manova, S. Mändl, B. Rauschenbach, Plasma Sources Sci. Technol. 10, 423 (2001)

    ADS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Institut für Experimentelle und Angewandte Physik, Christian-Albrechts-Universität zu, Kiel, Germany

    Fabian Haase & Holger Kersten

  2. Leibniz-Institut für Oberflächenmodifizierung, Permoserstr. 15, 04318, Leipzig, Germany

    Darina Manova & Stephan Mändl

Authors
  1. Fabian Haase
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Darina Manova
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Stephan Mändl
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Holger Kersten
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Darina Manova.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Haase, F., Manova, D., Mändl, S. et al. Evidence of secondary electron emission during PIII pulses as measured by calorimetric probe. Eur. Phys. J. D 70, 186 (2016). https://doi.org/10.1140/epjd/e2016-70234-2

Download citation

  • Received:

  • Revised:

  • Published:

  • DOI: https://doi.org/10.1140/epjd/e2016-70234-2

Keywords

Search

Navigation