Abstract
The dielectric barrier discharge generated in argon/oxygen mixtures at atmospheric pressure is investigated, and the effect of oxygen content on discharge characteristics at applied voltage of 4.5 kV is studied by means of electrical measurements and optical diagnostics. The results show that the filaments in the discharge regime become more densely packed with the increasing in the oxygen content, and the distribution of the filaments is more uniform in the gap. An increase in the oxygen content results in a decrease in the average power consumed and transported charges, while there exists an optimal value of oxygen content for the production of oxygen radicals. The maximal yield of oxygen radicals is obtained in mixtures of argon with 0.3% oxygen addition, and the oxygen radicals then decrease with the further increase in the oxygen content. The oxygen/argon plasma is employed to modify surface hydrophilicity of the PET films to estimate the influence of oxygen content on the surface treatment, and the static contact angles before and after the treatments are measured. The lowest contact angle is obtained at a 0.3% addition of oxygen to argon, which is in accordance with the optimum oxygen content for oxygen radicals generation. The electron density and electron temperature are estimated from the measured current and optical emission spectroscopy, respectively. The electron density is found to reduce significantly at a higher oxygen content due to the increased electron attachment, while the estimated electron temperature do not change apparently with the oxygen content.
Graphical abstract
Similar content being viewed by others
References
H.-E. Wagne, R. Brandenburg, A. Sonnenfeld, P. Michel. J.F. Behnke, Vacuum 71, 417 (2003)
X. Xu, Thin Solid Films 390, 237 (2001)
L. Bárdos, H. Baránková, Thin Solid Films 518, 6705 (2010)
C. Tendero, C. Tixier, P. Tristant, J. Desmaison, P. Leprince, Spectrochim. Acta B 61, 2 (2003)
D. Pappas, J. Vac. Sci. Technol. A 29, 020801 (2011)
H. Conrads, M. Schmidt, Plasma Sources Sci. Technol. 9, 441 (2000)
J.R. Roth, J. Rahel, X. Dai, D.M. Sherman, J. Phys. D 38, 555 (2005)
R. Ion, R. Bartnikas, G. Czeremuszkin, M.R. Wertheimer, IEEE Trans. Plasma Sci. 31, 411 (2011)
G. Fridman, G. Friedman, A. Gutsol, A.B. Shekhter, V.N. Vasilets, A. Fridman, Plasma Process. Polym. 5, 503 (2008)
Z. Fang, X. Xie, J. Li, H. Yang, Y. Qiu, E. Edmund, J. Phys. D 42, 085204 (2009)
J. Huang, H. Li, W. Chen, G.H. Lv, X.Q. Wang, G.P. Zhang, K. Ostrikov, P.Y. Wang, S.Z. Yang, Appl. Phys. Lett. 99, 253701 (2011)
O.J. Kwon, S.W. Myung, C.S. Le, H.S. Chio, J. Colloid Interface Sci. 295, 409 (2006)
J.Z. Xu, P. Zhong, J.L. Li, J. Lin, Y. Diao, J. Zhang, Plasma Sci. Technol. 12, 601 (2010)
D.S. Won, T.K. Kim, W.G. Lee, Surf. Interface Anal. 42, 1209 (2010)
M.H. Jung, H.S. Choi, Thin Solid Films 515, 2295 (2006)
Z. Xiong, X.P. Lu, A. Feng, Y. Pan, K. Ostrikov, Phys. Plasmas 17, 123502 (2010)
D.D. Pappas, A.A. Bujanda, J.A. Orlicki, R.E. Jensen, Surf. Coat. Technol. 203, 830 (2008)
Y. Jin, C.S. Ren, Q.Q. Fan, H.J. Yan, Z.F. Li, J.L. Zhang, D.Z. Wang, IEEE Trans. Plasma Sci. 40, 2706 (2012)
V. Vancoppenolle, P.Y. Jouan, A. Ricard, M. Wautelet, J.P. Dauchot, M. Hecq, Appl. Surf. Sci. 205, 249 (2003)
B. Zhao, L. Zhang, X. Wang, J. Yang, Carbon 50, 2710 (2012)
S.Z. Li, Q. Wu, W. Yan, D.Z. Wang, H.S. Uhm, Phys. Plasmas 18, 1214 (2011)
G. Park, H. Lee, G. Kim, J.K. Lee, Plasma Process. Polym. 5, 569 (2008)
K. Takeda, M. Kato, F. Jia, K. Ishikawa, H. Kano, M. Sekine, M. Hori, J. Appl. Phys. 46, 464006 (2013)
S.Z. Li, Q. Wu, J.L. Zhang, D.Z. Wang, H.S. Uhm, Thin Solid Films 519, 6990 (2011)
S. Petit, P. Laurens, J. Amouroux, F. Arefi-Khonsari, Appl. Surf. Sci. 168, 300 (2000)
C. Ton-That, D.O.H. Teare, P.A. Campbell, R.H. Bradley, Surf. Sci. 433/435, 278 (1999)
P. Laurens, S. Petit, F. Arefi-Khonsari, Plasmas Polym. 8, 281 (2003)
D. Papakonstantinou, E. Amanatides, D. Mataras, V. Ioannidis, P. Nikolopoulos, Plasma Processes Polym. 4, S1057 (2007)
V.R. Santiago, A.A. Bujanda, B.E. Stein, D.D. Pappas, Plasma Processes Polym. 8, 31 (2011)
Z. Fang, S. Ji, J. Pan, T. Shao, C. Zhang, IEEE Trans. Plasma Sci. 40, 883 (2012)
Z. Fang, T. Shao, S. Ji, J. Pan, C. Zhang, IEEE Trans. Plasma Sci. 40, 1884 (2012)
N. Merbahi, R. Bartnikas, G. Czeremuszkin, Y. Salamero, P. Millet, J. Phys. D 37, 1664 (2004)
X.C. Li, N. Zhao, T.Z. Fang, Z.H. Liu, L.C. Li, L.F. Dong, Plasma Sources Sci. Technol. 17, 015017 (2008)
P. Reichen, A. Sonnenfeld, P.R. von Rohr, J. Phys. D 20, 055015 (2011)
Z. Fang, Y. Qiu, Y. Luo, J. Phys. D 36, 2980 (2003)
Z. Fang, J. Lin, X. Xie, Y. Qiu, J. Phys. D 42, 085203 (2009)
E. Wagenaars, R. Brandenburg, W.J.M. Brok, M.D. Bowden, H.-E. Wagner, J. Phys. D 39, 700 (2006)
M.Y. Qian, C.S. Ren, D.Z. Wang, Y. Feng, J.L. Zhang, Plasma Sci. Technol. 12, 561 (2010)
S.Z. Li, W.T. Huang, J.L. Zhang, D.Z. Wang, Appl. Phys. Lett. 94, 111501 (2009)
Y.P. Raizer, Gas Discharge Physics (Springer-Verlag, New York, 1991)
X.M. Zhu, Y.K. Pu, Plasma Sources Sci. Technol. 17, 024002 (2008)
A. Yanguas-Gil, J. Cotrino, A.R. Gonzalez-Elipe, J. Appl. Phys. 99, 033104 (2006)
R. Wu, Y. Li, S.G. Zhu, H.Y. Feng, L. Zhang, J.D. Wang. Spectrosc. Spect. Anal. 28, 731 (2008)
S. Forster, C. Mohr, W. Vio, Surf. Coat. Technol. 200, 827 (2005)
G.D. Wei, C.S. Ren, M.Y. Qian, Q.Y. Nie, IEEE Trans. Plasma Sci. 39, 1842 (2011)
A. Sarani, A.Y. Nikiforov, C. Leys, Phys. Plasmas 17, 063504 (2010)
Y.H. Lee, C.H. Yi, M.J. Chung, G.Y. Yeom, Surf. Coat. Technol. 146-147, 474 (2001)
Z. Fang, Y. Liu, K. Liu, T. Shao. C. Zhang, Vacuum 86, 1305 (2012)
M. Síra, D. Trunec, P. Stahel, V. Bursíkova, Z. Navratil, J. Bursík, J. Phys. D 38, 621 (2005)
N. De Geyter, R. Morent, C. Leys, Plasma Sources Sci. Technol. 15, 78 (2006)
T. Shao, C. Zhang, K.H. Long, D.D. Zhang, J. Wang, P. Yan, Y.X. Zhou, Appl. Surf. Sci. 256, 3888 (2010)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Fang, Z., Shao, T., Wang, R. et al. Influences of oxygen content on characteristics of atmospheric pressure dielectric barrier discharge in argon/oxygen mixtures. Eur. Phys. J. D 70, 79 (2016). https://doi.org/10.1140/epjd/e2016-60438-9
Received:
Revised:
Published:
DOI: https://doi.org/10.1140/epjd/e2016-60438-9