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Correlation of process parameters and properties of TiO2 films grown by ion beam sputter deposition from a ceramic target

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Abstract

The correlation between process parameters and properties of TiO2 films grown by ion beam sputter deposition from a ceramic target was investigated. TiO2 films were grown under systematic variation of ion beam parameters (ion species, ion energy) and geometrical parameters (ion incidence angle, polar emission angle) and characterized with respect to film thickness, growth rate, structural properties, surface topography, composition, optical properties, and mass density. Systematic variations of film properties with the scattering geometry, namely the scattering angle, have been revealed. There are also considerable differences in film properties when changing the process gas from Ar to Xe. Similar systematics were reported for TiO2 films grown by reactive ion beam sputter deposition from a metal target [C. Bundesmann et al., Appl. Surf. Sci. 421, 331 (2017)]. However, there are some deviations from the previously reported data, for instance, in growth rate, mass density and optical properties.

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Authors and Affiliations

  1. Leibniz-Institut für Oberflächenodifizierung e.V., Permoserstraße 15, 04318, Leipzig, Germany

    Carsten Bundesmann, Thomas Lautenschläge, Daniel Spemann, Annemarie Finzel, Michael Mensing & Frank Frost

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  1. Carsten Bundesmann
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  2. Thomas Lautenschläge
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  3. Daniel Spemann
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Correspondence to Carsten Bundesmann.

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Bundesmann, C., Lautenschläge, T., Spemann, D. et al. Correlation of process parameters and properties of TiO2 films grown by ion beam sputter deposition from a ceramic target. Eur. Phys. J. B 90, 187 (2017). https://doi.org/10.1140/epjb/e2017-80326-x

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