Abstract
By SEM, AFM, electrostatic force microscopy, and X-ray diffraction methods, the structure, phase composition, and local electrical properties of tin–fullerite films implanted with B+ ions (E = 80 keV, F = 5 × 1017 ions/cm–2) are investigated. Ion mixing and solid- phase interaction of tin and fullerite layers are found to occur under ion implantation, and a heterophase structure with nonuniform local electrical properties is formed at the same time.
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Original Russian Text © L.V. Baran, 2015, published in Fizika i Khimiya Obrabotki Materialov, 2015, No. 5, pp. 5–9.
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Baran, L.V. Modification of the structure and properties of tin–fullerite films irradiated by boron ions. Inorg. Mater. Appl. Res. 7, 340–343 (2016). https://doi.org/10.1134/S2075113316030035
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DOI: https://doi.org/10.1134/S2075113316030035