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Oriented crystallization of thick Pd–Ru films during magnetron sputtering of target

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Inorganic Materials: Applied Research Aims and scope

Abstract

The possibility of obtaining thick films (3 to 7 µm) of solid solution Pd–6 wt % Ru by magnetron sputtering of a target having the corresponding composition is shown. The structure, phase composition, and surface morphology of films condensed on the surface of oxidized silicon, fluorphlogopite, and anodic aluminum oxide at 300–950 K are studied. A general trend of formation of a gradient grain structure of thick films (with a high grain dispersity level at the initial growth stage) and subsequent selective growth of grains and subgrains having an anisotropic shape and primary orientation <111> is independent of the structure and morphology of the substrate surface.

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Authors and Affiliations

  1. Baikov Institute of Metallurgy and Materials Science, Russian Academy of Sciences, Moscow, Russia

    V. M. Ievlev, G. S. Burkhanov, N. R. Roshan & E. M. Chistov

  2. Voronezh State University, Voronezh, Russia

    V. M. Ievlev, A. A. Maksimenko, E. K. Belonogov, S. V. Kannykin & B. V. Sladkopevtsev

Authors
  1. V. M. Ievlev
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  2. A. A. Maksimenko
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  3. E. K. Belonogov
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  4. S. V. Kannykin
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  5. B. V. Sladkopevtsev
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  6. G. S. Burkhanov
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  7. N. R. Roshan
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  8. E. M. Chistov
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Correspondence to V. M. Ievlev.

Additional information

Original Russian Text © V.M. Ievlev, A.A. Maksimenko, E.K. Belonogov, S.V. Kannykin, B.V. Sladkopevtsev, G.S. Burkhanov, N.R. Roshan, E.M. Chistov, 2015, published in Materialovedenie, 2015, No. 2, pp. 37–40.

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Ievlev, V.M., Maksimenko, A.A., Belonogov, E.K. et al. Oriented crystallization of thick Pd–Ru films during magnetron sputtering of target. Inorg. Mater. Appl. Res. 6, 311–315 (2015). https://doi.org/10.1134/S2075113315040127

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  • DOI: https://doi.org/10.1134/S2075113315040127

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