Abstract
Gallium nitride heterostructures on silicon substrates were grown by the method of gas-phase epitaxy from organometallic compounds. Based on them, transistors with a total gate width of 7.92 mm were created. The influence of the architecture of buffer layers on the characteristics of heterostructures and test transistors based on them is studied. Powerful transistors were obtained with an output pulse power of 45 W at a frequency of 1 GHz with a supply voltage of 28 V. The maximum efficiency of the transistor was 55%.
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Funding
This work was supported by the Ministry of Science and Higher Education of the Russian Federation (agreement no. 05.604.21.0214, unique identifier RFMEFI60419X0214).
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Khrapovitskaya, Y.V., Chernykh, M.Y., Ezubchenko, I.S. et al. Powerful Gallium Nitride Microwave Transistors on Silicon Substrates. Nanotechnol Russia 15, 169–174 (2020). https://doi.org/10.1134/S1995078020020123
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DOI: https://doi.org/10.1134/S1995078020020123