Abstract—
This short communication presents an approach to obtaining a deep, up to several tens of micrometers, surface relief in photosensitive silicate glasses. The approach is based on a local change in the resistance of glasses to chemical etching due to their crystallization. Under the action of a laser beam, a region is formed in photosensitive glasses, in which, after heat treatment, nuclei of the crystalline phase are formed, and local crystallization occurs. During subsequent etching, the crystalline regions are etched faster, and this provides the formation of surface relief, with the relief pattern being set by a laser beam, which makes it possible to avoid “wet” lithography. The formation of grooves up to 50 µm deep in photosensitive silicate glasses has been experimentally demonstrated.
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The authors are grateful to the Ministry of Science and Higher Education for supporting research within the FSRM-2020-001 project.
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Kaasik, V.P., Babich, E.S., Zhurikhina, V.V. et al. Formation of a Deep Surface Relief in Photo-Sensitive Silicate Glasses. Glass Phys Chem 48, 584–587 (2022). https://doi.org/10.1134/S1087659622600351
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DOI: https://doi.org/10.1134/S1087659622600351