Abstract
TiO2, Cr2O3, ZrO2, and SnO2 films with thicknesses of ∼10–100 nm were produced via dipping into solution and subsequent annealing in air. The films were studied by the methods of scanning electron microscopy, elemental X-ray spectral analysis, optical spectroscopy, and X-ray diffraction. The electrical conductivity of the films in air and in a vacuum was measured. The adhesion of most of the films to the substrate was found to be high. A crystalline structure was observed for films thicker than 10 nm. The films have a specific surface resistance of 108–1012 Ω in air and 109–1014 Ω in a vacuum. The films are promising as coatings for various purposes, including the development of structures of the core–shell type.
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Original Russian Text © A.M. Abyzov, 2017, published in Zhurnal Prikladnoi Khimii, 2017, Vol. 90, No. 7, pp. 869−876.
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Abyzov, A.M. Chemical solution deposited thin films of titanium, chromium, zirconium, and tin oxides. Russ J Appl Chem 90, 1082–1088 (2017). https://doi.org/10.1134/S1070427217070096
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DOI: https://doi.org/10.1134/S1070427217070096