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Analysis of TiAlSiN coatings deposited by reactive magnetron sputtering under high-current ion assistance

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Abstract

TiAlSiN nanocomposite coatings are obtained by the reactive magnetron sputtering of one-component targets with a widely varying (5–25) ratio of the ion current density j i to the atomic flux density j n on the sample surface. The plasma in the deposition chamber is generated by a broad (80 cm2) low-energy (100 eV) electron beam. The beam current is varied from 5 to 30 A, which makes it possible to adjust j i in the range of 1.8 to 9 mA/cm2. It is shown that an increase in the ratio j i /j n is accompanied by a nonmonotonic variation in the hardness and texture of the coatings under the action of internal stresses. It is established that exceeding the value j i /j n at which the maximum hardness of the coating is reached (43 GPa) leads to the relaxation of intrinsic stresses and a reduction in the hardness to 36 GPa.

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Authors and Affiliations

  1. Institute of Electrophysics, Ural Branch, Russian Academy of Sciences, Yekaterinburg, 620016, Russia

    N. V. Gavrilov & A. S. Kamenetskikh

  2. Ural Federal University, Yekaterinburg, 620002, Russia

    A. V. Chukin

Authors
  1. N. V. Gavrilov
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  2. A. S. Kamenetskikh
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  3. A. V. Chukin
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Correspondence to A. S. Kamenetskikh.

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Original Russian Text © N.V. Gavrilov, A.S. Kamenetskikh, A.V. Chukin, 2017, published in Poverkhnost’, 2017, No. 6, pp. 106–112.

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Gavrilov, N.V., Kamenetskikh, A.S. & Chukin, A.V. Analysis of TiAlSiN coatings deposited by reactive magnetron sputtering under high-current ion assistance. J. Surf. Investig. 11, 671–676 (2017). https://doi.org/10.1134/S1027451017030272

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  • DOI: https://doi.org/10.1134/S1027451017030272

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