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Influence of the probe sizes on the parameters of the surface morphology of hemispherical-grain polysilicon films: Estimation via atomic-force microscopy

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Abstract

The influence of probe sizes on the basic surface-morphology parameters of hemispherical-grain polysilicon films which possess substantial surface roughness and non-Gaussian height distribution functions with appreciable negative skewness is studied. The dependences between the basic surface morphology parameters S dr , S q , S al , S z , S v , S p , and S sk defined by the ISO 25178-2:2012 standard and the probe width-to-tip height (W/L) ratio are determined. It is ascertained that the relative increase S dr in the surface area is most sensitive to the “degree of sharpness” (W/L ratio) and, on the contrary, the autocorrelation length S al is least sensitive. Hemispherical-grain silicon films with considerable parameter S dr can be employed as test samples in estimating the degree of sharpness of a probe.

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Authors and Affiliations

  1. National Research University of Electronic Technology, Zelenograd, 124498, Russia

    A. V. Novak

  2. OAO Angstrem, Zelenograd, 124460, Russia

    A. V. Novak

  3. Lukin Research Institute of Physical Problems, Zelenograd, 124460, Russia

    V. R. Novak

Authors
  1. A. V. Novak
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  2. V. R. Novak
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Correspondence to A. V. Novak.

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Original Russian Text © A.V. Novak, V.R. Novak, 2016, published in Poverkhnost’, 2016, No. 9, pp. 70–80.

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Novak, A.V., Novak, V.R. Influence of the probe sizes on the parameters of the surface morphology of hemispherical-grain polysilicon films: Estimation via atomic-force microscopy. J. Surf. Investig. 10, 949–958 (2016). https://doi.org/10.1134/S1027451016050104

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  • DOI: https://doi.org/10.1134/S1027451016050104

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