Abstract
The principles of the construction of a virtual scanning electron microscope (SEM) are discussed. It is demonstrated that such a microscope cannot be created using a imitator of real SEM operation. It is concluded that a virtual SEM must be developed using a simulator of information similar to that which is obtained by means of a real microscope. The possibilities of reducing the time required to generate micro- and nanostructure images to values comparable with the imaging duration of real SEMs are analyzed.
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References
International Technology Roadmap for Semiconductors, 2013 Edition. Metrology. 2013. public.itrs.net
M. T. Postek and A. E. Vladar, in Handbook of Silicon Semiconductor Metrology, Ed. by A. C. Diebold (Marcel Dekker, New York, Basel, 2001), p. 295.
Yu. A. Novikov and A. V. Rakov, Russ. Microelectron. 25, 368 (1996).
T. Hatsuzawa, K. Toyoda, and Y. Tanimura, Rev. Sci. Instrum. 61, 975 (1990).
Yu. A. Novikov, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 8, 1244 (2014).
D. C. Joy, Monte Carlo Modeling for Electron Microscopy and Microanalysis (Oxford Univ. Press, New York, Oxford, 1995).
Yu. A. Novikov, Surf.: Phys., Chem., Mech. 11, 1077 (1995).
C. G. Frase, D. Gnieser, and H. Bosse, J. Phys. D: Appl. Phys. 42, 183001-1 (2009).
Y. G. Li, S. F. Mao, and Z. J. Ding, in Applications of Monte Carlo Method in Science and Engineering, Ed. by S. Mordechai (InTech, 2011), p. 232.
G. R. Brandes, K. F. Canter, T. N. Horsky, P. H. Lippel, and A. P. Mills, Rev. Sci. Instrum. 59, 228 (1988).
Yu. A. Novikov, and A. V. Rakov, Surf. Invest. 15, 1177 (2000).
Yu. A. Novikov and A. V. Rakov, in Mechanisms of Secondary Electron Emission from a Relief Surface of Solids, Moscow: Nauka, Fizmatlit, 1998, P. 3–99. (Proc. IOFAN, Vol. 55). [in Russian].
M. T. Postek, Proc. SPIE 4608, 84 (2002).
M. Postek, Vestn. Tekh. Regulirovan., No. 7, 8 (2007) [in Russian].
Ch. P. Volk, E. S. Gornev, Yu. A. Novikov, Yu. V. Ozerin, Yu. I. Plotnikov, A. M. Prokhorov, and A. V. Rakov, Russ. Microelectron. 31, 207 (2002).
Yu. A. Novikov, V. P. Gavrilenko, Yu. V. Ozerin, A. V. Rakov, and P. A. Todua, Proc. SPIE 6648, 66480R (2007).
Ch. P. Volk, E. S. Gornev, Yu. A. Novikov, Yu. V. Ozerin, Yu. I. Plotnikov, and A. V. Rakov, Russ. Microelectron. 33, 342 (2004).
Yu. A. Novikov, V. P. Gavrilenko, A. V. Rakov, and P. A. Todua, Proc. SPIE 7042, 704208 (2008).
Ch. P. Volk, E. S. Gornev, Yu. A. Novikov, Yu. I. Plotnikov, A. V. Rakov, and P. A. Todua, in Linear Measurements in Micrometer and Nanometer Ranges for Microelectronics and Nanotechnology, Moscow: Nauka, 2006, P. 77–120. (Proc. IOFAN, Vol. 62) [in Russian].
V. P. Gavrilenko, Yu. A. Novikov, A. V. Rakov, and P. A. Todua, Proc. SPIE 7042, 70420C (2008).
Yu. A. Novikov, S. V. Peshekhonov, and I. B. Strizhkov, in Problems of Linear Measurements of Microobjects in Nanometer and Submicron Ranges, Moscow: Nauka, 1995, P. 20–40. (Proc. IOFAN, Vol. 49) [in Russian].
Yu. A. Novikov, J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 5, 917 (2011).
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Novikov, Y.A. Virtual scanning electron microscope: 2. Principles of instrument construction. J. Surf. Investig. 9, 604–611 (2015). https://doi.org/10.1134/S1027451015030325
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DOI: https://doi.org/10.1134/S1027451015030325