Abstract
We have examined the possibility of utilizing thin-film contact layers for producing reliable Ohmic contacts to proposed intermediate-temperature (Bi,Sb)2Te3-based thermoelectric materials with improved thermoelectric properties, which allow the working temperature range to be extended to 600 K. Three contact configurations have been produced by ion-plasma magnetron sputtering: a single Ni layer, Mo/Ni bilayer, and Ni/Ta–W–N/Ni three-layer system. It has been shown that reliable contacts can be produced using Mo/Ni and Ni/Ta–W–N/Ni layers, which prevent interdiffusion between the materials to be joined and ensure good adhesion to the thermoelectric element.
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Original Russian Text © D.G. Gromov, Yu.I. Shtern, M.S. Rogachev, A.S. Shulyat’ev, E.P. Kirilenko, M.Yu. Shtern, V.A. Fedorov, M.S. Mikhailova, 2016, published in Neorganicheskie Materialy, 2016, Vol. 52, No. 11, pp. 1206–1210.
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Gromov, D.G., Shtern, Y.I., Rogachev, M.S. et al. Mo/Ni and Ni/Ta–W–N/Ni thin-film contact layers for (Bi,Sb)2Te3-based intermediate-temperature thermoelectric elements. Inorg Mater 52, 1132–1136 (2016). https://doi.org/10.1134/S0020168516110030
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DOI: https://doi.org/10.1134/S0020168516110030