Abstract
A polyphenol derivative of the sumanene-containing triad with a central perylenetetracarboxylic diimide moiety was synthesized via several consecutive chemical transformations of N,N'-bis(3',5'-dimethoxybenzyl)-1,7-bis[4''-(N,N'-disumanenyl)aminophenyl]perylene-3,4:9,10-tetracarboxylic diimide. The phenolic hydroxyl groups of the resulting derivative were partly protected by introduction of two different protective groups, pentaspiran and tert-butyl butyrate ones. It was shown that this modified derivative can be used to obtain a promising positive-tone photoresists with high parameters for extreme ultraviolet nanolithography on exposure to light at 13.5 nm for the manufacture of 20 to 16 nanometer chips.
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Original Russian Text © A.Ya. Vainer, K.M. Dymaev, A.M. Kovalenko, T.D. Belskii, S.A. Krichevskaya, L.I. Martova, 2016, published in Doklady Akademii Nauk, 2016, Vol. 469, No. 5, pp. 577–581.
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Vainer, A.Y., Dymaev, K.M., Kovalenko, A.M. et al. Supramolecular 3,4:9,10-perylenetetracarboxylic diimide triads containing moieties of sumanene polyphenol derivative: Synthesis and photochemical transformations. Dokl Chem 469, 233–237 (2016). https://doi.org/10.1134/S0012500816080036
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DOI: https://doi.org/10.1134/S0012500816080036