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Photocatalytic degradation of ofloxacin and evaluation of the residual antimicrobial activity

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Abstract

Ofloxacin is an antimicrobial agent frequently found in significant concentrations in wastewater and surface water. Its continuous introduction into the environment is a potential risk to non-target organisms or to human health. In this study, ofloxacin degradation by UV/TiO2 and UV/TiO2/H2O2, antimicrobial activity (E. coli) of samples subjected to these processes, and by-products formed were evaluated. For UV/TiO2, the degradation efficiency was 89.3% in 60 min of reaction when 128 mg L−1 TiO2 were used. The addition of 1.68 mmol L−1 hydrogen peroxide increased degradation to 97.8%. For UV/TiO2, increasing the catalyst concentration from 4 to 128 mg L−1 led to an increase in degradation efficiency. For both processes, the antimicrobial activity was considerably reduced throughout the reaction time. The structures of two by-products are presented: m/z 291 (9-fluoro-3-methyl-10-(methyleneamino)-7-oxo-2,3-dihydro-7H-[1,4]oxazino[2,3,4-ij]quinoline-6-carboxylic acid) and m/z 157 ((Z)-2-formyl-3-((2-oxoethyl)imino)propanoic acid).

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Authors and Affiliations

  1. UNICAMP, FEC/DSA, Campinas, São Paulo, Brazil

    M. S. Peres, M. G. Maniero & J. R. Guimarães

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  1. M. S. Peres
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  2. M. G. Maniero
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  3. J. R. Guimarães
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Correspondence to J. R. Guimarães.

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Peres, M.S., Maniero, M.G. & Guimarães, J.R. Photocatalytic degradation of ofloxacin and evaluation of the residual antimicrobial activity. Photochem Photobiol Sci 14, 556–562 (2015). https://doi.org/10.1039/c4pp00256c

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  • DOI: https://doi.org/10.1039/c4pp00256c

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