Abstract
Cone-shaped patterned sapphire substrate was prepared by inductively coupled plasma etching and GaN nucleation layer was grown on it by metal-organic chemical vapor deposition. A selective growth of GaN nucleation layer was found on the slope of the cone-shaped patterned sapphire substrat, and the distribution morphology of GaN had significantly changed after it was recrystallized. GaN selective growth and redistribution were analyzed by investigating the distribution of crystallographic planes on the cone surface and the atom array of specific planes at atom level.
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Supported by the National Natural Science Foundation of China(Nos.61223005, 61376046), the Program for New Century Excellent Talents in University of China(Nos.NCET-12-0236, NCET-13-0254), the Science and Technology Developing Project of Jilin Province, China (No.20130204032GX) and the Opening Project of Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory in the Fifth Electronics Research Institute of Ministry of Industry and Information Technology of China(No.ZHD201204).
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Yang, D., Liang, H., Qiu, Y. et al. Selective growth of GaN on slope cone-shaped patterned sapphire substrate. Chem. Res. Chin. Univ. 30, 556–559 (2014). https://doi.org/10.1007/s40242-014-3556-6
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DOI: https://doi.org/10.1007/s40242-014-3556-6