Abstract
The present work describes the effect of deposition potentials on structural, morphological, optical, electrical and photoconductivity responses of cuprous oxide (Cu2O) thin films deposited on fluorine-doped tin oxide glass substrate by employing electrodeposition technique. X-ray diffraction patterns reveal that the deposited films have a cubic structure grown along the preferential (111) growth orientation and crystallinity of the film deposited at − 0.4 V is improved compared to the films deposited at − 0.2, − 0.3 and − 0.5 V. Scanning electron microscopy displays that surface morphology of Cu2O film has a well-defined three-sided pyramid-shaped grains which are uniformly distributed over the surface of the substrates and are significantly changed as a function of deposition potential. Raman and photoluminescence spectra manifest that the film deposited at − 0.4 V has a good crystal quality with higher acceptor concentration compared to other films. UV–visible analysis illustrates that the absorption of Cu2O thin film deposited at − 0.4 V is notably higher compared to other films and the band gap of Cu2O thin films decreases from 2.1 to 2.04 eV with an increase in deposition potential from − 0.2 to − 0.5 V. The frequency–temperature dependence of impedance analysis shows that the film deposited at − 0.4 V has a high conductivity. I–V measurements elucidate that the film deposited at − 0.4 V exhibits a good photoconductivity response compared to films deposited in other deposition potentials.
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Acknowledgements
We gratefully acknowledge the funding and support from the RUSA-Phase 2.0 grant sanctioned vide Letter. No. F. 24-51/2014-U, Policy (TNMulti-Gen), Dept. of Edn. Govt. of India. Dt. 09.10.2018.
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Ganesan, K.P., Anandhan, N., Marimuthu, T. et al. Effect of Deposition Potential on Synthesis, Structural, Morphological and Photoconductivity Response of Cu2O Thin Films by Electrodeposition Technique. Acta Metall. Sin. (Engl. Lett.) 32, 1065–1074 (2019). https://doi.org/10.1007/s40195-019-00876-5
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DOI: https://doi.org/10.1007/s40195-019-00876-5