Abstract
Laser frequency stabilization is one of the key technologies in atomic physics experimental system. In this paper, the basic principles, and features and the latest research progress on various kinds of semiconductor laser, active frequency stabilization techniques based on different locking reference standards are systematically described, and their practical applications in different fields are briefly overviewed. Finally, we provide a prospective development trends for semiconductor laser, active frequency stabilization technologies.
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References
R.N. Hall, G.E. Fenner, J.D. Kingsley, Phys. Rev. Lett. 9, 186 (1962)
M.I. Nathan, W.P. Dumke, G. Burns, Appl. Phys. Lett. 1, 62 (1962)
T.M. Quist, R.H. Rediker, R.J. Keyes, Appl. Phys. Lett. 1, 91 (1962)
A.D. Ludlow, M.M. Boyd, J. Ye, E. Peik, P.O. Schmidt, Rev. Mod. Phys. 87, 637 (2015)
H. Haeffner, C.F. Roos, R. Blatt, Phys. Rep. 469, 155 (2008)
K.B. Macadam, A. Steinbach, C. Wieman, Am. J. Phys. 60, 1098 (1992)
S. Herrmann, A. Senger, K. Möhle, M. Nagel, E.V. Kovalchuk, A. Peters, Phys. Rev. D Part F. Gravit. Cosmol. 80, 11 (2009)
S.E. Park, H.S. Lee, T.Y. Kwon, Opt. Commun. 192, 57 (2001)
G. Moon, H.R. Noh, J. Korean Phys. Soc. 50, 1037 (2007)
G. Moon, H.R. Noh, J. Opt. Soc. Am. B 25, 2101 (2008)
C. Wieman, T.W. Hansch, Phys. Rev. Lett. 36, 1170 (1976)
H.M. Wang, Z.S. Xu, S.C. Ma, Opt. Lett. 44, 5816 (2019)
B. Wu, Y. Zhou, K. Weng, J. Opt. Soc. Am. B 35, 2705 (2018)
S.E. Park, H.R. Noh, Opt. Express 21, 14066 (2013)
H.R. Noh, S.E. Park, Opt. Commun. 336, 173 (2015)
S. Pustelny, V. Schultze, T. Scholtes, Rev. Sci. Instrum. 87, 063107 (2016)
G.W. Choi, H.R. Noh, J. Phys. B 48, 115008 (2015)
K.U. Schreiber, A. Gebauer, J.P.R. Wells, Opt. Lett. 38, 3574 (2013)
M.J. Thorpe, L. Rippe, T.M. Fortier, Nat. Photonics 5, 688 (2011)
K. Harada, T. Aoki, S. Ezure, K. Kato, Appl. Opt. 55, 1164 (2016)
P. Del’Haye, A. Schliesser, O. Arcizet, T. Wilken, R. Holzwarth, T.J. Kippenberg, Nature 450, 1214 (2007)
Y.J. Yao, J. Semicond. 39, 11 (2018)
D.W. Allan, Ultrasonics ferroelectrics and frequency control. IEEE Trans. 34, 647–654 (1987)
J.A. Barnes, A.R. Chi, IEEE Trans. Instrum. Meas. IM–20, 105–120 (1971)
P.H. Lee, M.L. Skolnick, Appl. Phys. Lett. 10, 303 (1967)
Y. Sakai, I. Yokohama, G. Kano, Photonics Technol. Lett. IEEE 4, 96 (1992)
Q. Wang, J. Duan, X.H. Qi, Chin. Phys. Lett. 32, 054206 (2015)
Y. Ohta, S. Maehara, K. Hasebe, Proc. SPIE Int. Soc. Opt. Eng. 17, 241 (2006)
G. Genov, T.E. Lellinger, T. Halfmann, J. Opt. Soc. Am. B 34, 2018 (2017)
C.P. Pearman, C.S. Adams, S.G. Cox, J. Phys. B 35, 5141 (2002)
S. Nakayama, Jpn. J. Appl. Phys. Part 1 24, 1 (1985)
S. Nakayama, Phys. Scr. T70, 64 (1997)
M.L. Harris, C.S. Adams, S.L. Cornish, I.C. McLeod, Phys. Rev. A 73, 062509 (2006)
V.B. Tiwari, S. Singh, S.R. Mishra, Opt. Commun. 263, 249 (2006)
Y.B. Kale, V.B. Tiwari, J. Opt. Soc. Am. B 21, 2531 (2014)
R.W.P. Drever, J.L. Hall, F.V. Kowalski, Appl. Phys. B 31, 97 (1983)
E.D. Black, Am. J. Phys. 69, 79 (2000)
B.C. Young, Phys. Rev. Lett. 82, 3799 (1990)
K. Numata, Phys. Rev. Lett. 93, 250602 (2004)
N.C. Wong, J.L. Hall, J. Opt. Soc. Am. B 2, 1527 (1985)
Z. Li, X. Sun, Y. Wang, Y. Zheng, K. Peng, Opt. Express 26, 18957 (2018)
S. Häfner, Opt. Lett. 40, 2112 (2015)
Y.Y. Jiang, Nature Photon. 5, 158 (2011)
T.L. Nicholson, Phys. Rev. Lett. 109, 230801 (2012)
T. Kessler, C. Hagemann, C. Grebing, Nat. Photonics 6, 687 (2011)
D.G. Matei, T. Legero, S. Hfner, Phys. Rev. Lett. (2017). https://doi.org/10.1103/PhysRevLett.118.263202
H. Shen, L. Li, J. Bi, J. Wang, L. Chen, Phys. Rev. A (2015). https://doi.org/10.1103/PhysRevA.92.063809
Z. Li, W. Ma, W. Yang, Y. Wang, Y. Zheng, Opt. Lett. 41, 3331 (2016)
J. Bi, Y. Zhi, L. Li, L. Chen, Appl. Opt. 58, 690 (2019)
Q. Zhang, J. Chang, Z. Cong, Z. Wang, F. Wang, Sensors 18, 4255 (2018)
W. Zhang, Opt. Lett. 39, 1980 (2014)
Z. Tai, Opt. Lett. 41, 5584 (2016)
M.L. Eickhoff, J.L. Hall, IEEE Trans. Instrum. Meas. 44, 155–158 (1995)
R.K. Saj, D. Bloch, J.J. Snyder, Phys. Rev. Lett. 44, 1251 (1980)
L.S. Ma, J.L. Hall, IEEE J. Quantum Electron. 26, 2006 (1990)
E. Jaatinen, Opt. Commun. 120, 91–97 (1995)
F. Bertinetto, P. Cordiale, G. Galzerano, E. Bava, IEEE Trans. Instrum. Meas. 50, 490 (2001)
J. Zhang, D. Wei, C. Xie, K. Peng, Opt. Express 11, 1338 (2003)
D.J. Mccarron, S.A. King, S.L. Cornish, Meas. Technol. 19, 252 (2008)
Z. Fei, X.J. Wu, W.C. Zhong, Appl. Opt. 56, 2649 (2017)
S. Lee, S.B. Lee, S.E. Park, Opt. Lasers Eng. 146, 106698 (2021)
J.B. Long, S.J. Yang, Opt. Express 26, 27773 (2018)
K.L. Corwin, Z.T. Lu, C.F. Hand, Appl. Opt. 37, 3295 (1998)
D.J. Mccarron, I.G. Hughes, P. Tierney, Rev. Sci. Instrum. 78, 685 (2007)
E. Talker, P. Arora, R. Zektzer, CLEO Appl. Technol. JW2A,110 (2019)
C. Lee, G.Z. Iwata, E. Corsini, Rev. Sci. Instrum. 82, 3295 (2011)
T. Xiao, T. Wang, B. Yan, Rev. Sci. Instrum. 89, 046106 (2018)
G. Wasik, W. Gawlik, J. Zachorowski, Appl. Phys. B 75, 613 (2002)
S. Okubo, K. Iwakuni, T. Hasegawa, Opt. Commun. 285, 4107 (2012)
P. Marin, C.H. David, Opt. Commun. 285, 50 (2012)
G.W. Choi, H.R. Noh, J. Phys. B At. Mol. Phys. 48, 115008 (2015)
D.Q. Su, T.F. Meng, Z.H. Ji, Appl. Opt. 53, 7011 (2014)
L.J. Zhang, H. Zhang, Y.T. Zhao, Chin. Phys. B 28, 84211 (2019)
T.W. Hänsch, Rev. Mod. Phys. 78, 1297 (2006)
J.L. Hall, Rev. Mod. Phys. 78, 1279 (2006)
Q. Quraishi, M. Griebel, T. Kleine-Ostmann, Opt. Lett. 30, 3231 (2005)
E. Benkler, F. Rohde, H.R. Telle, Opt. Lett. 38, 555 (2013)
J. Tsuboi, T. Kuboki, K. Kato, Jpn. J. Appl. Phys. 55, 08RB10 (2016)
R. Antoine, L. Peng, K. Naoya, Optica 5, 1070 (2018)
L. Rippe, B. Julsgaard, A. Walther, Opt. Express 15, 11444 (2006)
R.L. Cone, C.W. Thiel, Y. Sun, Laser Sci. LTu1G, 3 (2013)
M.J. Thorpe, D.R. Leibrandt, T. Rosenband, New J. Phys. 15, 33006 (2012)
P. Siddons, C.S. Adams, I.G. Hughes, J. Phys. B At. Mol. Opt. Phys. 42, 175004 (2009)
S.L. Kemp, I.G. Hughes, S.L. Cornish, J. Phys. B At. Mol. Opt. Phys. 44, 235004 (2011)
W. Quan, Y. Li, R. Li, Appl. Opt. 55, 2503 (2016)
N.D. Lemke, A.D. Ludlow, Z.W. Barber, Phys. Rev. Lett. 103, 063001 (2009)
N. Hinkley, J.A. Sherman, Science 341, 1215 (2013)
Y. Li, Y. Ge, Chin. Opt. Lett. 16, 051402 (2018)
Y. Bai, F.X. Yu, In 2019 Joint Conference of the C International Frequency Control Symposium and European Frequency and Time Forum (EFTF/IFC), IEEE (2019)
J. Ren, H. Liu, X.T. Lu, H. Chang, Appl. Sci. 10, 4928 (2020)
J.A. Devlin, M.R. Tarbutt, Phys. Rev. A (2018). https://doi.org/10.1103/PhysRevA.98.063415
V. Singh, V.B. Tiwari, S.R. Mishra, Appl. Phys. B 122, 225 (2016)
C. Charbel, M. Isam, Z. Samir, Opt. Express 28, 494 (2020)
Acknowledgements
This work was supported by the Major Scientific Project of Zhejiang Laboratory (2019MB0AE01). Y. W. initiated the manuscript. Y. W., B. S. and X. L. participated in the revision of the manuscript. Y. W. provided overall supervision. All authors have read and agreed to the published version of the manuscript.
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Wu, Y., Sun, B. & Li, X. Semiconductor laser active frequency stabilization technologies: a review. J. Korean Phys. Soc. 79, 795–809 (2021). https://doi.org/10.1007/s40042-021-00308-7
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DOI: https://doi.org/10.1007/s40042-021-00308-7