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Effects of Wet Chemical Etching on Scratch Morphology and Laser Damage Resistance of Fused Silica

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Abstract

Brittle scratches are responsible for the damage ignition when exposed to pulsed UV laser. We investigated the morphology evolution and damage resistance of glass with HF etching. The light intensity around scratches is found to increase with the dimension of scratches. Laser damage tends to be initiated at scratches edge and this is correlated with the peak electrical/light intensification and/or the mechanical weakening due to the chevron-cracks along the scratch. Moreover, the laser-induced damage threshold (LIDT) fluctuates when the length of chevron cracks varied and/or the electric/light intensification factor (LIF) is increased with the size of scratches in chemical etching.

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References

  1. Suratwala T, Steele R, Feit MD, Wong L, Miller P, Menapace J, Davis P (2008) Effect of rogue particles on the sub-surface damage of fused silica during grinding/polishing. J Non-Cryst Solids 354:2023–2037

    Article  CAS  Google Scholar 

  2. Li Y, Ye H, Yuan Z, Liu Z, Zheng Y, Zhang Z, Zhao S, Wang J, Xu Q (2016) Generation of scratches and their effects on laser damage performance of silica glass. Sci Rep 6(34818)

  3. Camp DW, Kozlowskim M, Sheehan L, Nichols M, Dovik M, Raether R, Thomas I (1998) Subsurface damage and polishing compound affect the 355nm laser damage threshold of fused silica surfaces. Proc SPIE 3244:356–364

    Article  CAS  Google Scholar 

  4. Fernandes BDC, Pfiffer M, Cormont P, Dussauze M, Bousquet B, Fargin E, Neauport J (2018) Understanding the effect of wet etching on damage resistance of surface scratches. Sci Rep 8(1337)

  5. Wong J, Ferriera JL, Lindsey EF, Haupt DL, Hutcheon ID, Kinney JH (2006) Morphology and microstructure in fused silica induced by high fluence ultraviolet 3ω (355nm) laser pulses. J Non-Cryst Solids 352:255–272

    Article  CAS  Google Scholar 

  6. Kalceff MAS, Stesmans A, Wong J (2002) Defects induced in fused silica by high fluence ultraviolet laser pulses at 355 nm. Appl Phys Lett 80:758–760

    Article  Google Scholar 

  7. Shen N, Bude JD, Carr CW (2014) Model laser damage precursors for high quality optical materials. Opt Express 22(3):3393–3404

    Article  Google Scholar 

  8. Carr CW, Radousky HB, Rubenchik AM, Feit MD, Demos SG (2004) Localized dynamics during laserinduced damage in optical materials. Phys Rev Lett 92(8):087401

    Article  CAS  Google Scholar 

  9. Shi F, Tian Y, Peng XQ, Dai YF (2014) Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics. Appl Opt 53:598–604

    Article  CAS  Google Scholar 

  10. Ye H, Li Y, Yuan Z, Zhang Q (2018) Ultrasonic-assisted wet chemical etching of fused silica for high-power laser systems. Int J Appl Glas Sci 9:288–295

    Article  CAS  Google Scholar 

  11. Ye H, Li Y, Yuan Z, Wang J, Xu Q, Yang W (2015) Improving UV laser damage threshold of fused silica optics by wet chemical etching technique. Proc SPIE 9532:953221

    Article  Google Scholar 

  12. Ye H, Li Y, Yuan Z, Wang J, Yang W, Xu Q (2015) Laser induced damage characteristics of fused silica optics treated by wet chemical processes. Appl Surf Sci 357:498–505

    Article  CAS  Google Scholar 

  13. Ye H, Li Y, Zhang Q, Wang W, Yuan Z, Wang J, Xu Q (2016) Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers. Appl Opt 55:3017–3025

    Article  CAS  Google Scholar 

  14. D. B. Ge, Y. B. Yan. Finite difference time domain method for electromagnetic wave (second edition). Xi'an, Xi'an university of electronic science and technology press, 11–24 (2005) (in Chinese)

  15. Chen KN (2010) FDTD analysis on influence of micro-nano surface on near field light intensity distribution in KDP crystal. Master’s thesis. Harbin Institute of Technology

  16. H. Ye, Y. Li, Q. Xu, C. Jiang, Z. Wang. Resistance of scratched fused silica surface to UV laser induced damage, (to be published)

  17. Wong LL, Suratwala T, Feit MD, Miller PE, Steele R (2009) The effect of HF/NH4F etching on the morphology of surface fractures on fused silica. J Non-cryst Solid 355:791–810

    Article  Google Scholar 

  18. Ahn Y, Cho NG, Lee SH, Lee D (2003) Lateral crack in abrasive wear of brittle materials. JSME International Journal Series A 46(2):140–144

    Article  Google Scholar 

  19. Li Y, Yuan Z, Wang J, Xu Q (2017) Laser-induced damage characteristics in fused silica surface due to mechanical and chemical defects during manufacturing processes. Opt Laser Technol 91:179–158

    Article  CAS  Google Scholar 

  20. Wang J, Li Y, Yuan Z, Ye H, Xie R, Chen X, Xu Q (2015) Producing fused silica optics with high UV-damage resistance to nanosecond pulsed lasers. Proc SPIE 9532:95320H

    Article  Google Scholar 

  21. Hygh JS, DeCarolis JF, Hill DB, Ranjithan SR (2012) Multivariate regression as an energy assessment tool in early building design. Build Environ 57:165–175

    Article  Google Scholar 

  22. Eck DJ (2018) Bootstrapping for multivariate linear regression models. Stat Probabil Lett 134:141–149

    Article  Google Scholar 

Download references

Acknowledgements

The damage testing by Mr. Zhichao Liu is thankfully appreciated, and the atomic force microscopy testing by Mr. Huan Yang is also thankfully appreciated. This work was partly supported by National Natural Science Foundation of China (No. 51505444 and 51475310), Science Challenge Project (No. JCKY2016212A506-0503), Outstanding Youth Talents Project (No. 2017-JCJQ-ZQ-024), Shanghai Sailing Program (No. 18YF1417700), Foundation of Key Laboratory for Precision Manufacturing Technology of CAEP (No. ZZ15004), Foundation for Youth Talents of LFRC, CAEP (No. LFRC-PD012).

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Authors and Affiliations

  1. School of Mechanical Engineering, University of Shanghai for Science and Technology, Shanghai, 200093, China

    Hui Ye & Chen Jiang

  2. Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, China

    Yaguo Li & Qiao Xu

  3. Department of Mechanical and Electrical Engineering, Xiamen University, Xiamen, 361005, China

    Wei Yang

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  1. Hui Ye
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  2. Yaguo Li
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  3. Qiao Xu
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  4. Wei Yang
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  5. Chen Jiang
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Correspondence to Yaguo Li.

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Ye, H., Li, Y., Xu, Q. et al. Effects of Wet Chemical Etching on Scratch Morphology and Laser Damage Resistance of Fused Silica. Silicon 12, 425–432 (2020). https://doi.org/10.1007/s12633-019-00150-4

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