Fabrication and Characterization of Poly-Si Thin Film Solar Cell using IR Optical Interaction Technique

Abstract

Fabricating photovoltaic (PV) solar cells on a large scale and at competitive prices is a milestone waiting to be served. Currently, the lack of such fabrication method for effective methods to increase. The either difficult or expensive due to the necessity of the fabrication in a vacuum environment. However, for the class of thin solar cells, solar cell material that can be processed in solution, and manufacturing techniques of the vacuum can be imagined. As has been the activation energy values are calculated from the temperature dependence of saturation current for polycrystalline Si solar cells. Word using alkaline ion reactive etching (Re) installation process, we obtained a fill factor of 77.4% with a conversion efficiency of 16.8% for a polycrystalline like silicon wafer with an active surface area of 240 cm². Compared to alkaline composition, and this shows the conversion efficiency increase of 0.45%. Thus, in a large area, such as polycrystalline silicon solar cells with high efficiency and low cost it can be fabricated.