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Substrate Heating Effect on c-Axis Texture and Piezoelectric Properties of AlN Thin Films Deposited by Unbalanced Magnetron Sputtering

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Abstract

Aluminum nitride (AlN) thin films with highly preferred (002) orientations have been reactively deposited by a pulsed-closed field unbalanced magnetron sputtering system using TiN/Ti as the seed/adhesion layer with various substrate temperatures. The texture, orientation and piezoelectric properties of AlN films were characterized by means of x-ray diffraction, rocking curves and laser interferometry. A Michelson laser interferometer was designed and built to obtain the converse piezoelectric response of the deposited AlN thin films. It was found that a slight substrate temperature increase would significantly affect the (002) orientation and the piezoelectric coefficient of AlN thin films compared to the coating obtained with no intentional substrate heating, while higher temperature applications on substrate deteriorated the c-axis texture of the coatings without significant improvement in the piezoelectric response of AlN films.

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Acknowledgements

Support for this research program from Department of Energy (DOE-OIT), Advanced Technology Institute (ATI), and the North American Die Casting Association (NADCA) is gratefully acknowledged.

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Authors and Affiliations

  1. School of Metallurgy and Materials Engineering, Iran University of Science and Technology (IUST), Tehran, Iran

    Masood Hasheminiasari

  2. Surface Engineering & Materials Chemistry, Southwest Research Institute, San Antonio, TX, USA

    Jianliang Lin

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  1. Masood Hasheminiasari
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  2. Jianliang Lin
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Correspondence to Masood Hasheminiasari.

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Hasheminiasari, M., Lin, J. Substrate Heating Effect on c-Axis Texture and Piezoelectric Properties of AlN Thin Films Deposited by Unbalanced Magnetron Sputtering. JOM 68, 1667–1671 (2016). https://doi.org/10.1007/s11837-016-1893-2

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  • DOI: https://doi.org/10.1007/s11837-016-1893-2

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