Abstract
In this research, various electrochemical methods were used to investigate the electrochemical behavior of tantalum in borate buffer solutions of various pH values, ranging from 9.0 to 6.5. Potentiodynamic polarization curves revealed that tantalum showed excellent passive behavior in borate buffer solutions. The potentiodynamic polarization and electrochemical impedance spectroscopy results showed that the passive film formed on tantalum offered its best protective behavior when the pH is 8.0, with the passivity undergoing a drastic change as the pH moved toward higher values. The semiconductive behavior of the passive films formed on tantalum was investigated by employing Mott-Schottky analysis in conjunction with a point defect model. The results indicated that the passive film exhibited n-type semiconductive behavior and that donor densities were in the range of 1.958-7.242 × 1020 cm−3. Moreover, this analysis showed that the donor density and flat band potential were quite sensitive to the pH.
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R.W. Revie and H.H. Uhlig, Corrosion and Corrosion Control: An Introduction to Corrosion Science and Engineering. Chapter 27, 4th ed., Wiley, New Jersey, 2008
T. Kokubo, H.-M. Kim, and M. Kawashita, Novel Bioactive Materials with Different Mechanical Properties, Biomaterials, 2003, 24, p 2161–2175
H. Kato, T. Nakamura, S. Nishiguchi, Y. Matsusue, M. Kobayashi, T. Miyazaki, H.-M. Kim, and T. Kokubo, Bonding of Alkali- and Heat-Treated Tantalum Implants to Bone, J. Biomed. Mater. Res., 2000, 53, p 28–35
T. Miyazaki, H.-M. Kim, T. Kokubo, C. Ohtsuki, H. Kato, and T. Nakamura, Enhancement of Bonding Strength by Graded Structure at Interface Between Apatite Layer and Bioactive Tantalum Metal, J. Mater. Sci. Mater. Med., 2002, 13, p 651–655
T. Miyazaki, H.-M. Kim, T. Kokubo, C. Ohtsuki, H. Kato, and T. Nakamura, Mechanism of Bonelike Apatite Formation on Bioactive Tantalum Metal in a Simulated Body Fluid, Biomaterials, 2002, 23, p 827–832
H. Gao, Y.F. Jie, Z.Q. Wang, H. Wan, L. Gong, R.C. Lu, Y.K. Xue, D. Li, H.Y. Wang, L.N. Hao, and Y.Z. Zhang, Bioactive Tantalum Metal Prepared by Micro-arc Oxidation and NaOH Treatment, J. Mater. Chem. B, 2014, 2, p 1216–1224
M. Krishnan, J.W. Nalaskowski, and L.M. Cook, Chemical Mechanical Planarization: Slurry Chemistry, Materials, and Mechanisms, Chem. Rev., 2010, 110, p 178–204
A. Robin, Corrosion Behaviour of Tantalum in Sodium Hydroxide Solutions, J. Appl. Electrochem., 2003, 33, p 37–42
D.D. Macdonald, Reflections on the History of Electrochemical Impedance Spectroscopy, Electrochim. Acta, 2006, 51, p 1376–1388
B.-Y. Chang and S.-M. Park, Electrochemical Impedance Spectroscopy, Annu. Rev. Anal. Chem., 2010, 3, p 207–229
D.D. Macdonald, The History of the Point Defect Model for the Passive State: A Brief Review of Film Growth Aspects, Electrochim. Acta, 2011, 56, p 1761–1772
K. Rajeshwar, Fundamentals of Semiconductor Electrochemistry and Photoelectrochemistry, Encyclopedia of Electrochemistry, Chapter 1, Vol 6, A.J. Bard, M. Stratmann, and S. Licht, Ed., Wiley, New Jersey, 2002, p 9
R. Cabrera-Sierra, J. Vazquez-Arenas, S. Cardoso, R.M. Luna-Sánchez, M.A. Trejo, J. Marín-Cruz, and J.M. Hallen, Analysis of the Formation of Ta2O5 Passive Films in Acid Media Through Mechanistic Modeling, Electrochim. Acta, 2011, 56, p 8040–8047
R. Cabrera-Sierra, J.M. Hallen, J. Vazquez-Arenas, G. Vázquez, and I. González, EIS Characterization of Tantalum and Niobium Oxide Films Based on a Modification of the Point Defect Model, J. Electroanal. Chem., 2010, 638, p 51–58
R.A. Silva, M. Walls, B. Rondot, M. Da Cunha Belo, and R. Guidoin, Electrochemical and Microstructural Studies of Tantalum and its Oxide Films for Biomedical Applications in Endovascular Surgery, J. Mater. Sci. Mater. Med., 2002, 13, p 495–500
R.A. Silva, I.P. Silva, and B. Rondot, Effect of Surface Treatments on Anodic Oxide Film Growth and Electrochemical Properties of Tantalum Used for Biomedical Applications, J. Biomater. Appl., 2006, 21, p 93–103
G.T. Burstein, A Hundred Years of Tafel’s Equation: 1905–2005, Corros. Sci., 2005, 47, p 2858–2870
M. Anik and K. Osseo-Asare, Effect of pH on the Anodic Behavior of Tungsten, J. Electrochem. Soc., 2002, 149, p B224–B233
F.M. Al-Kharafi and W.A. Badawy, Electrochemical Behaviour of Vanadium in Aqueous Solutions of Different pH, Electrochim. Acta, 1997, 42, p 579–586
K.M. Ismail and W.A. Badawy, Electrochemical and XPS Investigations of Cobalt in KOH Solutions, J. Appl. Electrochem., 2000, 30, p 1303–1311
W.A. Badawy and F.M. Al-Kharafi, Corrosion and Passivation Behaviors of Molybdenum in Aqueous Solutions of Different pH, Electrochim. Acta, 1998, 44, p 693–702
W.A. Badawy and F.M. Al-Kharafi, The Electrochemical Behaviour of Naturally Passivated Hafnium in Aqueous Solutions of Different pH, J. Mater. Sci., 1999, 34, p 2483–2491
A. Kolics, A.S. Besing, P. Baradlai, R. Haasch, and A. Wieckowski, Effect of pH on Thickness and Ion Content of the Oxide Film on Aluminum in NaCl Media, J. Electrochem. Soc., 2001, 148, p B251–B259
O. Imantalab and A. Fattah-alhosseini, Electrochemical and Passive Behaviors of Pure Copper Fabricated by Accumulative Roll-Bonding (ARB) Process, J. Mater. Eng. Perform., 2015, 24, p 2579–2585
A. Fattah-alhosseini and O. Imantalab, Passivation Behavior of Ultrafine-Grained Pure Copper Fabricated by Accumulative Roll Bonding (ARB) Process, Metall. Mater. Trans. A, 2016, 47, p 572–580
B. Hirschorn, M.E. Orazem, B. Tribollet, V. Vivier, I. Frateur, and M. Musiani, Determination of Effective Capacitance and Film Thickness from Constant-Phase-Element Parameters, Electrochim. Acta, 2010, 55, p 6218–6227
A. Ehsani, M. Nasrollahzadeh, M.G. Mahjani, R. Moshrefi, and H. Mostaanzadeh, Electrochemical and Quantum Chemical Investigation of Inhibitory of 1,4-Ph(OX)2(Ts)2 on Corrosion of 1005 Aluminum Alloy in Acidic Medium, J. Ind. Eng. Chem., 2014, 20, p 4363–4370
M. Schönleber, D. Klotz, and E. Ivers-Tiffée, A Method for Improving the Robustness of Linear Kramers–Kronig Validity Tests, Electrochim. Acta, 2014, 161, p 20–27
B.A. Boukamp, Practical Application of the Kramers–Kronig Transformation on Impedance Measurements in Solid State Electrochemistry, Solid State Ion., 1993, 62, p 131–141
S. Fajardo, D.M. Bastidas, M. Criado, and J.M. Bastidas, Electrochemical Study on the Corrosion Behaviour of a New Low-Nickel Stainless Steel in Carbonated Alkaline Solution in the Presence of Chlorides, Electrochim. Acta, 2014, 129, p 160–170
J. Xu, W. Hu, S. Xu, P. Munroe, and Z.-H. Xie, Electrochemical Properties of a Novel β-Ta2O5 Nanoceramic Coating Exposed to Simulated Body Solutions, ACS Biomater. Sci. Eng., 2016, 2, p 73–89
G.J. Brug, A.L.G. van den Eeden, M. Sluyters-Rehbach, and J.H. Sluyters, The Analysis of Electrode Impedances Complicated by the Presence of a Constant Phase Element, J. Electroanal. Chem. Interfacial Electrochem., 1984, 176, p 275–295
C.H. Hsu and F. Mansfeld, Technical Note: Concerning the Conversion of the Constant Phase Element Parameter Y0 into a Capacitance, Corrosion, 2001, 57, p 747–748
B.D. Hirschorn, M.E. Orazem, B. Tribollet, V. Vivier, I. Frateur, and M. Musiani, Constant-Phase-Element Behavior Caused by Resistivity Distributions in Films: I. Theory, J. Electrochem. Soc., 2010, 157, p C452–C457
W. Wang and A. Alfantazi, An Electrochemical Impedance Spectroscopy and Polarization Study of the Role of Crystallographic Orientation on Electrochemical Behavior of Niobium, Electrochim. Acta, 2014, 131, p 79–88
B. Hirschorn, M.E. Orazem, B. Tribollet, V. Vivier, I. Frateur, and M. Musiani, Constant-Phase-Element Behavior Caused by Resistivity Distributions in Films: II. Applications, J. Electrochem. Soc., 2010, 157, p C458–C463
E. Sikora and D.D. Macdonald, Defining the Passive State, Solid State Ion., 1997, 94, p 141–150
W. Wang, F. Mohammadi, and A. Alfantazi, Corrosion, Behaviour of Niobium in Phosphate Buffered Saline Solutions with Different Concentrations of Bovine Serum Albumin, Corros. Sci., 2012, 57, p 11–21
J.W. Schultze and M.M. Lohrengel, Stability, Reactivity and Breakdown of Passive Films. Problems of Recent and Future Research, Electrochim. Acta, 2000, 45, p 2499–2513
J.W. Schultze, M. Pilaski, M.M. Lohrengel, and U. König, Single, Crystal Experiments on Grains of Polycrystalline Materials: Oxide Formation on Zr and Ta, Faraday Discuss., 2002, 121, p 211–227
E. Sikora, J. Sikkora, and D.D. Macdonald, A New Method for Estimating the Diffusivities of Vacancies in Passive Films, Electrochim. Acta, 1996, 41, p 783–789
W.-J. Chun, A. Ishikawa, H. Fujisawa, T. Takata, J.N. Kondo, M. Hara, M. Kawai, Y. Matsumoto, and K. Domen, Conduction and Valence Band Positions of Ta2O5, TaON, and Ta3N5 by UPS and Electrochemical Methods, J. Phys. Chem. B, 2003, 107, p 1798–1803
F. Di Quarto, C. Gentile, S. Piazza, and C. Sunseri, A Photoelectrochemical Study on Anodic Tantalum Oxide Films, Corros. Sci., 1993, 35, p 801–808
J. D. Sloppy, PhD thesis, Pennsylvania State University, USA, 2009
D.D. Macdonald, On the Existence of Our Metals-Based Civilization: I. Phase-Space Analysis, J. Electrochem. Soc., 2006, 153, p B213–B224
R. Cabrera-Sierra, M.A. Pech-Canul, and I. González, The Role of Hydroxide in the Electrochemical Impedance Response of Passive Films in Corrosion Environments, J. Electrochem. Soc., 2006, 153, p B101–B107
P. Acevedo-Peña, J. Vázquez-Arenas, R. Cabrera-Sierra, L. Lartundo-Rojas, and I. González, Hydration and Structural Transformations During Titanium Anodization Under Alkaline Conditions, ECS Trans., 2013, 50, p 21–32
P. Acevedo-Peña, J. Vázquez-Arenas, R. Cabrera-Sierra, L. Lartundo-Rojas, and I. González, Ti Anodization in Alkaline Electrolyte: The Relationship Between Transport of Defects, Film Hydration and Composition, J. Electrochem. Soc., 2013, 160, p C277–C284
L. Hamadou, L. Aïnouche, A. Kadri, S. Ait Ali Yahia, and N. Benbrahim, Electrochemical Impedance Spectroscopy Study of Thermally Grown Oxides Exhibiting Constant Phase Element Behaviour, Electrochim. Acta, 2013, 113, p 99–108
M. Khanuja, H. Sharma, B.R. Mehta, and S.M. Shivaprasad, XPS Depth-Profile of the Suboxide Distribution at the Native Oxide/Ta Interface, J. Electron Spectrosc. Relat. Phenom., 2009, 169, p 41–45
R.M. Fleming, D.V. Lang, C.D.W. Jones, M.L. Steigerwald, D.W. Murphy, G.B. Alers, Y.-H. Wong, R.B. van Dover, J.R. Kwo, and A.M. Sergent, Defect Dominated Charge Transport in Amorphous Ta2O5 Thin Films, J. Appl. Phys., 2000, 88, p 850–862
W. Wang and A. Alfantazi, Effect of Microstructure and Temperature on Electrochemical Behavior of Niobium in Phosphate-Buffered Saline Solutions, J. Electrochem. Soc., 2013, 160, p C1–C11
D.J. Blackwood, Influence of the Space-Charge Region on Electrochemical Impedance Measurements on Passive Oxide Films on Titanium, Electrochim. Acta, 2000, 46, p 563–569
P.W. Carter, J. Zhang, J. Wang, and S. Li, Characterization and Use of Quinones as Selective Oxidizers of Tantalum in CMP Applications, J. Electrochem. Soc., 2008, 155, p H378–H382
S.V. Babu, A. Jindal, and Y. Li, Chemical-Mechanical Planarization of Cu and Ta, JOM, 2001, 53, p 50–52
S.C. Kuiry, S. Seal, W. Fei, J. Ramsdell, V.H. Desai, Y. Li, and B. Wood, Effect of pH and H2O2 on Ta Chemical Mechanical Planarization: Electrochemistry and X-ray Photoelectron Spectroscopy Studies, J. Electrochem. Soc., 2003, 150, p C36–C43
S. Ramarajan, Y. Li, M. Hariharaputhiran, Y. Her, and S.V. Babu, Effect of pH and Ionic Strength on Chemical Mechanical Polishing of Tantalum, Electrochem. Solid State Lett., 2000, 3, p 232–234
K.A. Assiongbon, S.B. Emery, C.M. Pettit, S.V. Babu, and D. Roy, Chemical Roles of Peroxide-Based Alkaline Slurries in Chemical–Mechanical Polishing of Ta: Investigation of Surface Reactions Using Time-Resolved Impedance Spectroscopy, Mater. Chem. Phys., 2004, 86, p 347–357
A. Jindal and S.V. Babu, Effect of pH on CMP of Copper and Tantalum, J. Electrochem. Soc., 2004, 151, p G709–G716
C.M. Pettit and D. Roy, Role of Iodate Ions in Chemical Mechanical and Electrochemical Mechanical Planarization of Ta Investigated Using Time-Resolved Impedance Spectroscopy, Mater. Lett., 2005, 59, p 3885–3889
S.V.S.B. Janjam, S. Peddeti, D. Roy, and S.V. Babu, Tartaric Acid as a Complexing Agent for Selective Removal of Tantalum and Copper in CMP, Electrochem. Solid State Lett., 2008, 11, p H327–H330
T. Du, D. Tamboli, V. Desai, V.S. Chathapuram, and K.B. Sundaram, Chemical Mechanical Polishing of Tantalum: Oxidizer and pH Effects, J. Mater. Sci.: Mater. Electron., 2004, 15, p 87–90
J. Zhang, S. Li, and P.W. Carter, Chemical Mechanical Polishing of Tantalum: Aqueous Interfacial Reactivity of Tantalum and Tantalum Oxide, J. Electrochem. Soc., 2007, 154, p H109–H114
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Attarzadeh, F.R., Attarzadeh, N., Vafaeian, S. et al. Effect of pH on the Electrochemical Behavior of Tantalum in Borate Buffer Solutions. J. of Materi Eng and Perform 25, 4199–4209 (2016). https://doi.org/10.1007/s11665-016-2295-x
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DOI: https://doi.org/10.1007/s11665-016-2295-x