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Fabrication and Optimization of Brush-Printed n-type Bi2Te3 Thick Films for Thermoelectric Cooling Devices

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Abstract

A simple, efficient and rapid brush-printing method has been developed for preparation of n-type Bi2Te2.7Se0.3 films approximately 100–150 μm thick. X-ray diffraction, scanning electron microscopy, electron probe microanalysis, and four-point probe measurements were used to characterize the crystal structure, composition, microstructure, and electrical properties of the films. The results showed that all the n-type Bi2Te2.7Se0.3 thick films were composed of single-phase Bi2Te2.7Se0.3; the grains in the films were randomly distributed in the low-temperature-annealed samples and predominantly oriented along the (00l) plane in samples annealed at temperatures >673 K. σ and the absolute value of α first increased substantially with increasing the annealing temperature in the range 573–673 K then decreased when the annealing temperature was increased further. The dependence of σ and α on annealing temperature may be reasonably explained on the basis of the change in the microstructure induced by annealing. The performance of a prototype cooling device containing n-type Bi2Te2.7Se0.3 thick films was evaluated for temperature differences produced by use of different DC currents.

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References

  1. J.H. Yang and T. Caillat, MRS Bull. 31, 224 (2006).

    Article  Google Scholar 

  2. L.E. Bell, Science 321, 1457 (2008).

    Article  Google Scholar 

  3. D. Madan, A. Chen, P.K. Wright, and J.W. Evans, J. Appl. Phys. 109, 034904 (2011).

    Article  Google Scholar 

  4. B.C. Sales, Science 295, 1248 (2002).

    Article  Google Scholar 

  5. L.M. Goncalves, P. Alpuim, G. Min, D.M. Rowe, C. Couto, and J.H. Correia, Vacuum 82, 1499 (2008).

    Article  Google Scholar 

  6. M. Takashiri, T. Shirakawa, K. Miyazaki, and H. Tsukamoto, Sen. Actuators A 138, 329 (2007).

    Article  Google Scholar 

  7. H.L. Zou, D.M. Rowe, and G. Min, J. Cryst. Growth 222, 82 (2001).

    Article  Google Scholar 

  8. H. Huang, W.L. Luan, and S.T. Tu, Thin Solid Films 517, 3731 (2009).

    Article  Google Scholar 

  9. M. Tan, Y. Deng, Y. Wang, Z.W. Zhang, B.W. Luo, and Z. Lin, Thin Solid Films 548, 526 (2013).

    Article  Google Scholar 

  10. A. Bailini, F. Donati, M. Zamboni, V. Russo, M. Passoni, C.S. Casari, A.L. Bassi, and C.E. Bottani, Appl. Surf. Sci. 254, 1249 (2007).

    Article  Google Scholar 

  11. T. Sun, M.K. Samani, N. Khosravian, K.M. Ang, Q.Y. Yan, B.K. Tay, and H.H. Hng, Nano Energy 8, 223 (2014).

    Article  Google Scholar 

  12. N. Peranio, M. Winkler, D. Bessas, Z. Aabdin, J. König, H. Böttner, R.P. Hermann, and O. Eibl, J. Alloy Compd. 521, 163 (2012).

    Article  Google Scholar 

  13. Z. Aabdin, N. Peranio, M. Winkler, D. Bessas, J. König, R.P. Hermann, H. Böttner, and O. Eibl, J. Electron. Mater. 41, 1493 (2012).

    Article  Google Scholar 

  14. S.H. Li, H.M.A. Soliman, J. Zhou, M.S. Toprak, M. Muhammed, D. Platzek, P. Ziolkowski, and E. Müller, Chem. Mater. 20, 4403 (2008).

    Article  Google Scholar 

  15. H.M.A. Soliman and A.B. Kashyout, Engineering 3, 659 (2011).

    Article  Google Scholar 

  16. D. Madan, Z.Q. Wang, A. Chen, R. Winslow, P.K. Wright, and J.W. Evans, Appl. Phys. Lett. 104, 013902 (2014).

    Article  Google Scholar 

  17. K.T. Kim and G.H. Ha, J. Nanosci. Nanotechnol. 12, 1577 (2012).

    Article  Google Scholar 

  18. J. Weber, K. Potje-Kamloth, F. Haase, P. Detemple, F. Volklein, and T. Doll, Sens. Actuators A 132, 325 (2006).

    Article  Google Scholar 

  19. G. Liu, W.Y. Zhao, H.Y. Zhou, P. Wei, J. Yu, D.G. Tang, and Q.J. Zhang, J. Electron. Mater. 41, 1376 (2011).

    Article  Google Scholar 

  20. H.Y. Zhou, W.Y. Zhao, G. Liu, H. Cheng, and Q.J. Zhang, J. Electron. Mater. 41, 1436 (2013).

    Article  Google Scholar 

  21. X.A. Fan, J.Y. Yang, R.G. Chen, H.S. Yun, W. Zhu, S.Q. Bao, and X.K. Duan, J. Phys. D 39, 740 (2006).

    Article  Google Scholar 

  22. J. Jiang, L. Chen, S. Bai, Q. Yao, and Q. Wang, Mater. Sci. Eng. B 117, 334 (2005).

    Article  Google Scholar 

  23. W.S. Liu, Q.Y. Zhang, Y.C. Lan, S. Chen, X. Yan, Q. Zhang, H. Wang, D.Z. Wang, G. Chen, and Z.F. Ren, Adv. Energy Mater. 1, 577 (2011).

    Article  Google Scholar 

  24. L.P. Hu, T.J. Zhu, X.H. Liu, and X.B. Zhao, Adv. Funct. Mater. 24, 5211 (2014).

    Article  Google Scholar 

  25. D. Li, R.R. Sun, and X.Y. Qin, Intermetallics 19, 2002 (2011).

    Article  Google Scholar 

  26. D.H. Kim, C. Kim, K. Je, G.H. Ha, and H. Kim, Acta. Mater. 59, 4957 (2011).

    Article  Google Scholar 

  27. D.B. Hyun, J.S. Hwang, and J.D. Shim, J. Mater. Sci. 36, 1285 (2001).

    Article  Google Scholar 

  28. W.E. Bies, R.J. Radtke, H. Ehrenreich, and E. Runge, Phys. Rev. B 65, 085208 (2002).

    Article  Google Scholar 

  29. J.R. Sootsman, D.Y. Chung, and M.G. Kanatzidis, Angew. Chem. Int. Ed. 48, 8616 (2009).

    Article  Google Scholar 

  30. Z. Zhang, Y. Wang, Y. Deng, and Y. Xu, Solid State Commun. 151, 1520 (2011).

    Article  Google Scholar 

  31. Z.Y. Lu, M. Layani, X.X. Zhao, L.P. Tan, T. Sun, S.F. Fan, Q.Y. Yan, S. Magdassi, and H.H. Hng, Small 10, 3551 (2014).

    Article  Google Scholar 

  32. W. Seifert, M. Ueltzen, and E. Müller, Phys. Status Solidi A 194, 277 (2002).

    Article  Google Scholar 

  33. M.J. Huang, P.K. Chou, and M.C. Lin, Sens. Actuators A 126, 122 (2006).

    Article  Google Scholar 

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Acknowledgements

This work was supported by the National Basic Research Program of China (973-program) under Project No. 2013CB632505 and the National Natural Science Foundation of China (No. 11274248).

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Authors and Affiliations

  1. State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan, 430070, China

    Xing Liu, Wen-yu Zhao, Hong-yu Zhou, Xin Mu, Dan-qi He, Wan-ting Zhu, Ping Wei, Han Wu & Qing-jie Zhang

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  1. Xing Liu
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  2. Wen-yu Zhao
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  3. Hong-yu Zhou
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  4. Xin Mu
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  5. Dan-qi He
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  7. Ping Wei
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  8. Han Wu
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  9. Qing-jie Zhang
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Correspondence to Wen-yu Zhao.

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Liu, X., Zhao, Wy., Zhou, Hy. et al. Fabrication and Optimization of Brush-Printed n-type Bi2Te3 Thick Films for Thermoelectric Cooling Devices. J. Electron. Mater. 45, 1328–1335 (2016). https://doi.org/10.1007/s11664-015-4027-7

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  • DOI: https://doi.org/10.1007/s11664-015-4027-7

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