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Effects of the annealing heating rate on sputtered aluminum oxide films

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Abstract

Al x O y films by DC reactive magnetron sputtering were annealed in air ambient at 500 °C for 1 h with different heating rates of 5, 15, and 25 °C/min.Then heat treatments at 900 °Cwere carried out on these 500 °C-annealed films to simulate the high-temperature application environment. Effects of the annealing heating rate on structure and properties of both 500 °C-annealed and 900 °C-heated films were investigated systematically.It was found that distinct γ-Al2O3 crystallization was observed in the 900 °C-heated films only when the annealing heating rates are 15 and 25 °C/min. The 500 °C-annealed film possessed the most compact surface morphology in the case of 25 °C/min. The highest microhardness of both 500 °C-annealed and 900 °C-heated films were obtained when the annealing heating rate was 15 °C/min.

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Authors and Affiliations

  1. School of Applied Physics and Materials, Wuyi University, Jiangmen, 529020, China

    Xiufeng Tang  (唐秀凤)

  2. State Key Laboratory of Solidification Processing, School of Materials Science and Engineering, Northwestern Polytechnical University, Xi’an, 710072, China

    Xiufeng Tang  (唐秀凤)

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  1. Xiufeng Tang  (唐秀凤)
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Correspondence to Xiufeng Tang  (唐秀凤).

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Tang, X. Effects of the annealing heating rate on sputtered aluminum oxide films. J. Wuhan Univ. Technol.-Mat. Sci. Edit. 32, 94–99 (2017). https://doi.org/10.1007/s11595-017-1565-2

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  • DOI: https://doi.org/10.1007/s11595-017-1565-2

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