Abstract
Thin films of Ti0.26Al0.163Si0.012N0.565, with alternating nanocrystalline TiSiN and AlSiN nanolayers were deposited on steel by arc ion plating. Oxidation at 800–900 °C for up to 75 h led to the formation of rutile-TiO2 and α-Al2O3. Silicon accumulated around the interface between the film and oxide scale. The scale structure changed from Al2O3/TiO2 bilayers, through TiO2/Al2O3/TiO2 triple layers, to TiO2/Al2O3/(TiO2, Al2O3, SiO2)-mixed triple layers, as the oxidation time increased.
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References
H. Ichimura and A. Kawana, Journals of Materials Research 8, 1093 (1993).
S. H. Yao, Y. L. Su, W. H. Kao and T. H. Liu, Tribology International 39, 332 (2006).
C. Feng, M. Li, L. Xin, S. Zhu, Z. Shao and Q. Zhao, Surface and Coatings Technology 232, 88 (2013).
F. Vaz, L. Rebouta, M. Andritschky, M. F. Da Silva and J. C. Soares, Surface and Coatings Technology 98, 912 (1998).
A. Vennemann, H. R. Stock, J. Kohlscheen, S. Rambadt and G. Erkens, Surface and Coatings Technology 174–175, 408 (2003).
M. Pfeiler, J. Zechner, M. Penoy, C. Michotte, C. Mitterer and M. Kathrein, Surface and Coatings Technology 203, 3104 (2009).
N. Fukumoto, H. Ezura and T. Suzuki, Surface and Coatings Technology 204, 902 (2009).
Y. Y. Chang and S. M. Yang, Thin Solid Films 518, s34 (2010).
A. Flink, J. M. Andersson, B. Alling, R. Daniel, J. Sjölén, L. Karlsson and L. Hultman, Thin Solid Films 517, 714 (2008).
M. Parlinska-Wojtan, A. Karimi, O. Coddet, T. Cselle and M. Morstein, Surface and Coatings Technology 188–189, 344 (2004).
O. Durand-Drouhin, A. E. Santana, A. Karimi, V. H. Derflinger and A. Schütze, Surface and Coatings Technology 163–164, 260 (2003).
L. Xin, Q. Chen, Y. Teng, W. Wang, A. Sun, S. Zhu and F. Wang, Surface and Coatings Technology 228, 48 (2013).
N. Birks, G. H. Meier and F. S. Pettit, Introduction to the High-Temperature Oxidation of Metals, 2nd edn. (Cambridge University Press, England, 2006), p. 62.
Y. M. Chiang, D. P. Birnie III and W. D. Kingery, Physical Ceramics, (Wiley, New York, 1996), p. 107.
J. C. Lee, S. K. Kim, T. D. Nguyen and D. B. Lee, Journal of Nanoscience and Nanotechnology 11, 6563 (2011).
Acknowledgments
This work was supported by the Korea Institute of Energy Technology Evaluation and Planning (KETEP) grant funded by the Korea government Ministry of Trade, Industry and Energy (No. 20143030050070).
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Bak, S.H., Lee, D.B. Oxidation of Nano-multilayered TiAlSiN Films at 800–900 °C in Air. Oxid Met 84, 345–352 (2015). https://doi.org/10.1007/s11085-015-9558-z
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DOI: https://doi.org/10.1007/s11085-015-9558-z