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Optical and fractal properties of sputter deposited TiO2 films

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Abstract

In this study, TiO2 films were deposited on the glass substrates at different pressures using a DC magnetron sputtering system. The surface topography, fractality, particle size, transparency spectra, and roughness of the deposited films were analyzed through atomic force microscopy in non-contact mode and spectrophotometer (UV–visible) analysis. The Gwyddion open source software was used to analyze the AFM results. The surface morphology, absorption spectra, transparency, and energy band gap of the films were studied through analytical and mathematical relations, including fractal and multifractal dimensions of the films. The pressure influenced the particle size leading to the changes in the surface roughness and fractality of the films. When the working pressure increased above 8 × 10−3 Torr, the nonuniformity in the distribution of surface properties and multifractality increased. Additionally, using optical data and the Tauc’s method, their energy gap was calculated. It was revealed that the TiO2 coatings have a relatively large energy gap of ~ 4 eV, probably due to their small grain size.

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This manuscript has associated data in a data repository. [Author’s comment: Some or all data, models or code that support the findings of this study are available from the corresponding author upon reasonable request.]

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Acknowledgements

We acknowledge the financial support of the Ministry of Industry and Trade of the Czech Republic on the project MPO TRIO (POMITE), Grant No. FV40238.

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Authors and Affiliations

  1. Department of Physics, Faculty of Science, Imam Khomeini International University, Qazvin, Iran

    R. Shakoury & E. Nahvifard

  2. Vacuum Technology Research Group, ACECR, Sharif University Branch, Tehran, Iran

    A. Arman, M. Mardani & Ghasem Amraee-Rad

  3. Department of Physics, Faculty of Science, University of Kurdistan, Sanandaj, Kurdistan, 66177-15175, Iran

    B. Astinchap

  4. Faculty of Electrical Engineering, Institute of Aurel Stodola, University of Žilina, Nálepku 1390, 031 01, Liptovský Mikuláš, Slovakia

    S. Jurečka

  5. CEITEC BUT, Brno University of Technology, Purkynova 123, 61200, Brno, Czech Republic

    S. Mirzaei

  6. Fraunhofer Institute for Material and Beam Technology (IWS), 01277, Dresden, Germany

    S. Mirzaei

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  1. R. Shakoury
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Contributions

RSh and EN: conceptualization and analyses; AA, SJ, BA: stereometric, fractal Methodology, writing, and editing; MM: investigation and editing; GhA: optical measurements; SM: resources, review, and editing.

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Correspondence to A. Arman or S. Mirzaei.

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Shakoury, R., Nahvifard, E., Arman, A. et al. Optical and fractal properties of sputter deposited TiO2 films. Opt Quant Electron 55, 125 (2023). https://doi.org/10.1007/s11082-022-04295-2

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