Abstract
RF magnetron sputtering technique was employed to deposit Li-doped ZnO thin films onto quartz substrate at different substrate temperatures ranging from room temperature (RT) to 500 \(^{\circ }\hbox {C}\). X-ray diffraction analysis revealed that the deposited films had a hexagonal-wurtzite crystal structure with preferred orientation along the c-axis. Increasing the substrate temperature improved the crystallinity and caused a significant increase in the crystallite size (182 nm) for the film deposited at 500 \(^{\circ }\hbox {C}\). The energy band gap of the films deposited at RT, 350, 400, 450 and 500 \(^{\circ }\hbox {C}\) were found to be 3.292, 3.282, 3.281, 3.28 and 3.269 eV, respectively. All films exhibited a broad UV-violet emission band centered on 407 nm and attributed to the radiative recombination processes near the band edge. A Hall mobility of \(\sim \)33.3 \(\hbox {cm}^{2}\)/V s, concentration (\(n\)) of \(\sim \)7.6 \(\times 10^{18}\,\hbox {cm}^{-3}\) and resistivity of \(\sim \)39.7 \(\Omega \)-cm were obtained for the film deposited at 500 \(^{\circ }\hbox {C}\). The results show that the substrate temperature plays a crucial role in the structural, morphological, optical and electrical properties.
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This work has been partly supported by Program for New Century Excellent Talents in University (NCET-10-0066), 863 project Grants (2013AA031502) and the project of 2011RFLXG006.
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Babikier, M., Li, Q., Wang, J. et al. Li doped ZnO thin film: effect of substrate temperature on structure, optical and electrical properties. Opt Quant Electron 47, 3655–3665 (2015). https://doi.org/10.1007/s11082-015-0256-5
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DOI: https://doi.org/10.1007/s11082-015-0256-5