An electron probe method for measuring the thickness of oxide films on silicon surfaces is proposed. The measurement range, lateral resolution, and measurement errors are estimated.
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This work was supported by the Russian Science Foundation (Agreement No. 14-19-01652 of June 27, 2014).
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Translated from Izmeritel’naya Tekhnika, No. 9, pp. 13–16, September, 2015.
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Gavrilenko, V.P., Kuzin, A.Y., Mityukhlyaev, V.B. et al. Electron Probe Measurements of Oxide Film Thickness on Silicon Surfaces. Meas Tech 58, 953–957 (2015). https://doi.org/10.1007/s11018-015-0824-x
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DOI: https://doi.org/10.1007/s11018-015-0824-x