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Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist

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Abstract

A series of copolymers Poly (TBA-CA-St-ASM)(PTCSA) were synthesized via precipitation polymerization by using tert-Butyl acrylate (TBA), Styrene (St), p-acetoxy styrene (ASM), and cedryl methacrylate (CA) as co-monomer. Then, Poly (TBA-CA-St-HS)(PTCSH) was prepared in the presence of sodium methoxide in methanol. The fourier transfer infrared (FT-IR) spectra and proton nuclear magnetic resonance (1H–NMR) spectra indicated that the synthesis was successful. The molecular weight, glass transition temperature (Tg) and thermal decomposition temperature (T(10%)) of the copolymers increased with the addition of CA. Moreover, a positive-tone chemically amplified Krypton Fluoride (KrF) photoresist was prepared, and the photolithography performance of the photoresist was evaluated using a KrF laser exposure system, the result showed that the resolution could reach the level of 0.25 μm.

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Acknowledgments

This work was supported by Innovation Foundation of Jiangsu (No.BY2015019-14), the National Science and Technology Major Project of China (No.2010ZX02304), the National Nature Science Foundation of Jiangsu Province (No.BK20140160), the Fundamental Research Funds for the Central Universities (No. JUSRP51719A) and Suzhou Rui Hong Electronic Chemicals Co., Ltd.

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Authors and Affiliations

  1. The Key Laboratory of Synthestic and Biological Colloids, Ministry of Education and School of Chemical and Material Engineering, Jiangnan University, Wuxi, Jiangsu, 214122, China

    Xiangfei Zheng, Changwei Ji, Qingtao Zeng, Jingcheng Liu, Ren Liu & Xiaoya Liu

  2. Suzhou Rui Hong Electronic Chemicals Co., Ltd., Suzhou, Jiangsu, 215124, China

    Qidao Mu

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  1. Xiangfei Zheng
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  2. Changwei Ji
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  3. Qingtao Zeng
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  4. Jingcheng Liu
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  5. Ren Liu
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  6. Qidao Mu
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  7. Xiaoya Liu
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Correspondence to Jingcheng Liu or Xiaoya Liu.

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Zheng, X., Ji, C., Zeng, Q. et al. Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist. J Polym Res 24, 198 (2017). https://doi.org/10.1007/s10965-017-1370-9

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