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Magnetic and Electrical Properties of Sputtered Ni Films

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Abstract

This paper portrays the effect of growth rate on the structural, magnetic, and electrical properties of sputtered Ni thin films. Seventy-five nanometer thick Ni films were grown on Si <100> substrates at room temperature by high power impulse magnetron sputtering with varying growth rates such as 0.27, 0.57, 1.01, 2.18, and 2.65 Å/s. All the films crystallized in a single FCC type structure devoid of any impurity phase. With an increase in the growth rate, the density of the Ni films was found to increase. The surface roughness and the stresses developed in Ni films were found to decrease with an increase in the growth rate. Microstructural investigations indicated an island of surface morphology for all the films. An increase in growth rate was also found to affect the magnetic properties of Ni thin films considerably. Saturation magnetization increased with an increase in growth rate both along the in-plane and out-of-direction owing to the increase in the density of the film and reduction in stresses and surface roughness. Further, the in-plane magnetization studies also showed an increase in in-plane magnetic anisotropy in Ni films with an increase in growth rate. Evidences for improvement in the in-plane magnetic anisotropy were derived from the increase in the in-plane coercivity and remanence. Temperature variation of electrical resistivity in Ni films indicated a metallic behavior. Films grown at higher growth rates exhibited high-temperature co-efficient of resistance suitable for resistance temperature detector applications.

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Acknowledgements

The authors thank the Director, DMRL for the constant support and encouragement. The authors also thank Group Head, EMG for providing electron microscopy facilities. One of the authors (Nalin Prashant Poddar) would like to thank DMRL DRDO for the award of Research Associateship.

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Authors and Affiliations

  1. Defence Metallurgical Research Laboratory, Hyderabad, 500 058, India

    Nalin Prashant Poddar, J. Arout Chelvane, N. D. Vara Prasad & M. Manivel Raja

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  1. Nalin Prashant Poddar
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  2. J. Arout Chelvane
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  3. N. D. Vara Prasad
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  4. M. Manivel Raja
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Contributions

(1) Nalin Prashant Poddar—conceptualization, formal analysis, investigation, writing—original draft, writing—review and editing, (2) J. Arout Chelvane—conceptualization, formal analysis, investigation, writing—original draft, writing—review and editing, (3) N. D. Vara Prasad—investigation, (4) Dr. M. Manivel Raja—project administration.

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Correspondence to Nalin Prashant Poddar.

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Poddar, N.P., Chelvane, J.A., Prasad, N.D.V. et al. Magnetic and Electrical Properties of Sputtered Ni Films. J Supercond Nov Magn (2024). https://doi.org/10.1007/s10948-024-06722-9

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