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Soft Magnetic Properties of HfxCo100−x Thin Films

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Abstract

HfxCo100−x thin films (in the atomic weight range of x = 30–36) were growth on Si (100) substrates by direct current (DC) magnetron sputtering method. Thin films produced with atomic compositions in this context depicted the amorphous structure. The films revealed soft magnetic properties and thus exhibited very low hysteresis along the hard-axis direction. Magnetic measurements indicated that Hf35Co65 thin film has the maximum saturation magnetization (1491 emu cm−3) at 300 K. Additionally, magnetization measurements show an increase in saturation magnetization value from 981 to 1491 emu cm−3 when the value of x varies between 30 and 35. The influence of varying sputtering pressure and film composition on soft magnetic properties are investigated and discussed in the present paper.

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Acknowledgements

Supported by the Ankara University BAP under Grant 15L0443005, Research Fund of the Recep Tayyip Erdoğan University (Project Numbers: BAP 2014.109.06.01 and 2014.109.06.02). G.D.Y. would like to thank TUBİTAK - BİDEB 2211-C Program for Ph.D. Scholarship.

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Authors and Affiliations

  1. Department of Engineering Physics, Faculty of Engineering, Ankara University, 06100, Beşevler, Ankara, Turkey

    G. Durak Yüzüak & Y. Elerman

  2. Department of Material Science and Nanotechnology Engineering, Faculty of Engineering, Recep Tayyip Erdoğan University, 53100, Rize, Turkey

    E. Yüzüak

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  1. G. Durak Yüzüak
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  2. E. Yüzüak
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  3. Y. Elerman
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Correspondence to G. Durak Yüzüak.

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Yüzüak, G.D., Yüzüak, E. & Elerman, Y. Soft Magnetic Properties of HfxCo100−x Thin Films. J Supercond Nov Magn 30, 3537–3540 (2017). https://doi.org/10.1007/s10948-017-4168-4

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  • DOI: https://doi.org/10.1007/s10948-017-4168-4

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