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The effect of illumination on p-n junction diodes based on Yb-doped CuO thin films produced by ultrasonic spray pyrolysis method

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Abstract

On the glass substrate, un-doped and different proportions of Yb (1, 2, 3, 4, and 5 wt%) doped CuO thin films were deposited by the ultrasonic spray pyrolysis (USP) method. According to X-ray diffraction (XRD) analysis, the (− 111) plane was the preferred crystallographic orientation for all thin films. It was obtained from atomic force microscopy (AFM) analysis that the surfaces of the produced CuO thin films were not smooth and the roughness increased as the Yb doping ratio increased. Scanning electron microscopy (SEM) analysis reveals that the surfaces of 4 and 5 wt% Yb-doped CuO thin films were porous. The forbidden bandgap values of un-doped and 1, 2, 3, 4, and 5 wt% Yb-doped CuO thin films were calculated by using the Tauc plot. It was observed that 3 wt% Yb-doped CuO thin films with the narrowest bandgap of 1.64 eV. The 3 wt% Yb-doped CuO thin films were deposited on both non-etched and KOH-etched n-type Si by the USP method, and so, p-CuO/n-Si p-n junction diodes were produced. The influence of illumination on several electrical properties of the generated p-n diodes, such as ideality factor (n), zero-bias barrier height (Φbo), and series resistance (Rs), was examined. The p-CuO (un-doped and 3 wt% doped Yb)/n-Si (KOH-etched) diodes exhibited photovoltaic behavior. These diodes show promise for photodiode applications in the optoelectronics industry.

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The data that support the findings of this study are available from the corresponding author, upon reasonable request.

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  1. Department of Energy Systems Engineering, Graduate Education Institute, Isparta University of Applied Sciences, 32260, Isparta, Turkey

    Havva Elif Lapa

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HEL: studies conceptualization, writing (original draft) the manuscript, the experimental process, and the data collection and analysis.

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Lapa, H.E. The effect of illumination on p-n junction diodes based on Yb-doped CuO thin films produced by ultrasonic spray pyrolysis method. J Mater Sci: Mater Electron 34, 425 (2023). https://doi.org/10.1007/s10854-023-09866-x

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