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Effect of employing chromium as a buffer layer on the crystallinity of hexagonal boron nitride films grown by LPCVD

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Abstract

Using chromium (Cr), which was deposited by radio frequency magnetron sputtering, as a buffer layer for synthesizing high-quality hexagonal boron nitride (hBN) films by low-pressure chemical vapor deposition (LPCVD) was demonstrated. The effect of growth temperature and annealing process on the quality of the Cr buffer layer was investigated. The characterization of the dependence of hBN film quality on growth temperature, substrate, and annealing process was discussed. All evidence shows that using a Cr buffer layer can significantly improve the crystalline quality of hBN. A DUVPD based on hBN film using Cr as the bottom electrode was fabricated with a small leakage current. The photocurrent is 3.5 nA at a bias of 500 V, and it exhibits good switching characteristics.

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References

  1. K. Watanabe, T. Taniguchi, H. Kanda, Nat. Mater. 3(6), 404–409 (2004)

    CAS  Google Scholar 

  2. Y. Kubota, K. Watanabe, O. Tsuda, T. Taniguchi, Science 317(5840), 932–934 (2007)

    CAS  Google Scholar 

  3. J. Li, R. Dahal, S. Majety, J.Y. Lin, H.X. Jiang, Nucl. Instrum. Methods Phys. Res. A 654(1), 417–420 (2011)

    CAS  Google Scholar 

  4. W. Gannett, W. Regan, K. Watanabe, T. Taniguchi, M.F. Crommie, A. Zettl, Appl. Phys. Lett. 98(24), 242105 (2011)

    Google Scholar 

  5. C.R. Dean, A.F. Young, I. Meric, C. Lee, L. Wang, S. Sorgenfrei, K. Watanabe, T. Taniguchi, P. Kim, K.L. Shepard, J. Hone, Nat. Nanotechnol. 5(10), 722–726 (2010)

    CAS  Google Scholar 

  6. I. Naumov, A.M. Bratkovsky, V. Ranjan, Phys. Rev. Lett. 102(21), 217601 (2009)

    Google Scholar 

  7. A. Rubio, J.L. Corkill, M.L. Cohen, Phys Rev B 49(7), 5081–5084 (1994)

    CAS  Google Scholar 

  8. Z. Liu, Y. Gong, W. Zhou, L. Ma, J. Yu, J.C. Idrobo, J. Jung, A.H. MacDonald, R. Vajtai, J. Lou, P.M. Ajayan, Nat. Commun. 4, 2541 (2013)

    Google Scholar 

  9. J. Gaskell, L. Eaves, K.S. Novoselov, A. Mishchenko, A.K. Geim, T.M. Fromhold, M.T. Greenaway, Appl. Phys. Lett. 107(10), 103105 (2015)

    Google Scholar 

  10. Y.Z. Duan Xiaoming, W. Yujin et al., Mater. China 10, 001 (2015)

    Google Scholar 

  11. X.L. Ding, G.Q. Ding, X.M. Xie, F.Q. Huang, M.H. Jiang, Carbon 49(7), 2522–2525 (2011)

    CAS  Google Scholar 

  12. A. Catellani, M. Posternak, A. Baldereschi, A.J. Freeman, Phys. Rev. B 36(11), 6105–6111 (1987)

    CAS  Google Scholar 

  13. A.R. Jang, S. Hong, C. Hyun, S.I. Yoon, G. Kim, H.Y. Jeong, T.J. Shin, S.O. Park, K. Wong, S.K. Kwak, N. Park, K. Yu, E. Choi, A. Mishchenko, F. Withers, K.S. Novoselov, H. Lim, H.S. Shin, Nano Lett. 16(5), 3360–3366 (2016)

    CAS  Google Scholar 

  14. W. Chen, K.P. Loh, M. Lin, R. Liu, A.T.S. Wee, Phys. Status Solidi A 202(1), 37–45 (2005)

    CAS  Google Scholar 

  15. C. Rohr, J.-H. Boo, W.J.T.S.F. Ho, Thin Solid Films 322(1–2), 9–13 (1998)

    CAS  Google Scholar 

  16. T.C. Doan, S. Majety, S. Grenadier, J. Li, J.Y. Lin, H.X. Jiang, Nucl. Instrum. Methods Phys. Res. A 783, 121–127 (2015)

    CAS  Google Scholar 

  17. M. Chubarov, H. Pedersen, H. Högberg, A. Henry, S. Czigány, J. Vac. Sci. Technol. A 33(6), 061520 (2015)

    Google Scholar 

  18. W. Auwarter, M. Muntwiler, J. Osterwalder, T. Greber, Surf. Sci. 545(1–2), L735–L740 (2003)

    CAS  Google Scholar 

  19. R. Simonson, M. Paffett, M. Jones, B. Koel, Surf. Sci. 254(1–3), 29–44 (1991)

    CAS  Google Scholar 

  20. A.B. Preobrajenski, A.S. Vinogradov, N. Martensson, Surf. Sci. 582(1–3), 21–30 (2005)

    CAS  Google Scholar 

  21. A. Goriachko, Y. He, M. Knapp, H. Over, M. Corso, T. Brugger, S. Berner, J. Osterwalder, T. Greber, Langmuir 23(6), 2928–2931 (2007)

    CAS  Google Scholar 

  22. D.E. Starr, E.M. Pazhetnov, A.I. Stadnichenko, A.I. Boronin, S.K. Shaikhutdinov, Surf. Sci. 600(13), 2688–2695 (2006)

    CAS  Google Scholar 

  23. F. Orlando, P. Lacovig, L. Omiciuolo, N.G. Apostol, R. Larciprete, A. Baraldi, S. Lizzit, ACS Nano 8(12), 12063–12070 (2014)

    CAS  Google Scholar 

  24. A. Nagashima, N. Tejima, Y. Gamou, T. Kawai, C. Oshima, Phys. Rev. B 51(7), 4606–4613 (1995)

    CAS  Google Scholar 

  25. N. Guo, J. Wei, L. Fan, Y. Jia, D. Liang, H. Zhu, K. Wang, D. Wu, Nanotechnology 23(41), 415605 (2012)

    Google Scholar 

  26. Y. Shi, C. Hamsen, X. Jia, K.K. Kim, A. Reina, M. Hofmann, A.L. Hsu, K. Zhang, H. Li, Z.Y. Juang, M.S. Dresselhaus, L.J. Li, J. Kong, Nano Lett. 10(10), 4134–4139 (2010)

    CAS  Google Scholar 

  27. K.K. Kim, A. Hsu, X. Jia, S.M. Kim, Y. Shi, M. Hofmann, D. Nezich, J.F. Rodriguez-Nieva, M. Dresselhaus, T. Palacios, J. Kong, Nano Lett. 12(1), 161–166 (2012)

    Google Scholar 

  28. L. Song, L. Ci, H. Lu, P.B. Sorokin, C. Jin, J. Ni, A.G. Kvashnin, D.G. Kvashnin, J. Lou, B.I. Yakobson, P.M. Ajayan, Nano Lett. 10(8), 3209–3215 (2010)

    CAS  Google Scholar 

  29. F. Zhou, J. Szczech, M.T. Pettes, A.L. Moore, S. Jin, L. Shi, Nano Lett. 7(6), 1649–1654 (2007)

    CAS  Google Scholar 

  30. S. Kondratyuk, G. L’vova, I. Radomysel’skii, I. Shlyakhtich, Sov. Powder Metall. Met. Ceram. 18(6), 400–404 (1979)

    Google Scholar 

  31. V.A. Shabashov, L.G. Korshunov, V.V. Sagaradze, N.V. Kataeva, A.E. Zamatovskii, A.V. Litvinov, K.A. Lyashkov, Phys. Met. Metall. 114(8), 681–691 (2013)

    Google Scholar 

  32. M.G. Barker, P. Hubberstey, A.T. Dadd, S.A. Frankham, J. Nucl. Mater. 114(2–3), 143–149 (1983)

    CAS  Google Scholar 

  33. J.A. Thornton, J. Tabock, D.J.T.S.F. Hoffman, Thin Solid Films 64(1), 111–119 (1979)

    CAS  Google Scholar 

  34. J.J. Olaya, S.E. Rodil, S. Muhl, E. Sanchez, Thin Solid Films 474(1–2), 119–126 (2005)

    CAS  Google Scholar 

  35. V. Guilbaud-Massereau, A. Celerier, J.J.T.S.F. Machet, Thin Solid Films 258(1–2), 185–193 (1995)

    CAS  Google Scholar 

  36. T. Takahashi, H. Itoh, A.J. Takeuchi, J. Cryst. Growth 47(2), 245–250 (1979)

    CAS  Google Scholar 

  37. M.D. Allendorf, C.F. Melius, T.H. Osterheld, Mater. Res. Soc. Symp. Proc. (1995). https://doi.org/10.1557/PROC-410-459

    Article  Google Scholar 

  38. S. Wang, C. Vipulanadan, Cem. Concr. Res. 30(3), 385–389 (2000)

    CAS  Google Scholar 

  39. Y. Kobayashi, T. Akasaka, J. Cryst. Growth 310(23), 5044–5047 (2008)

    CAS  Google Scholar 

  40. R. Lynch, H.G. Drickamer, J. Chem. Phys. 44(1), 181–184 (1966)

    CAS  Google Scholar 

  41. X.K. Cao, B. Clubine, J.H. Edgar, J.Y. Lin, H.X. Jiang, Appl. Phys. Lett. 103(19), 191106 (2013)

    Google Scholar 

  42. Z.Y. Zhao, Z.G. Yang, Y. Wen, Y.H. Wang, J. Am. Ceram. Soc. 94(12), 4496–4501 (2011)

    CAS  Google Scholar 

  43. T.H. Yuzuriha, D.W. Hess, Thin Solid Films 140(2), 199–207 (1986)

    CAS  Google Scholar 

Download references

Acknowledgement

This work was supported by the National Natural Science Foundation of China under Grant Nos. 61474055, 60976043, and 61775077.

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Authors and Affiliations

  1. State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China

    Xi Chen, Kairan Luan, Wenbo Zhang, Jihong Zhao, Yanjun Gao, Junfeng Song & Zhanguo Chen

  2. College of Communication Engineering, Jilin University, Changchun, 130012, China

    Xiuhuan Liu

  3. College of Information Technology, Jilin Agricultural University, Changchun, 130118, China

    Lixin Hou

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  1. Xi Chen
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Chen, X., Luan, K., Zhang, W. et al. Effect of employing chromium as a buffer layer on the crystallinity of hexagonal boron nitride films grown by LPCVD. J Mater Sci: Mater Electron 32, 13961–13971 (2021). https://doi.org/10.1007/s10854-021-05972-w

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