Abstract
Deposition pressure is an important factor for the preparation of amorphous carbon (a-C) films through vacuum method. However, researches about the properties, especially optical and electrical properties of a-C films influenced by deposition pressure are still rare. In this work, hot-filament chemical vapor deposition (HFCVD) was used to deposit conductive a-C films under different deposition pressure conditions. As deposition pressure raised from 5 to 160 Pa, a structural transition from a-C to nanocrystalline graphite that led to the increase of cluster size, sp2 content and crystalline quality of a-C films was observed. The hybrid structure composed of amorphous and nanocrystalline phases was also revealed by high-resolution transmittance electron microscope. The mobility, transmittance and conductivity of films increased while the optical gap and carrier concentration decreased by elevating the deposition pressure. As a result, a-C films prepared at 160 Pa showed the best property with a roughness of 0.412 nm, a transmittance of 67%, an optical bandgap of 1.25 eV, a resistivity of 75 μΩ m and a mobility of 3.17 cm2 V−1 s−1, which is comparable to those prepared through other methods. The small roughness, good transmittance and low resistivity implied that high quality a-C films can be prepared through HFCVD method by adjusting the deposition pressure.
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References
A.C. Ferrari, J. Robertson, Phys. Rev. B 61, 14095 (2000)
L. Li, L.L. Liu, X. Li, P. Guo, P. Ke, A. Wang, A.C.S. Appl, Mater. Interfaces 10, 13187–13198 (2018)
T.J. Raeber, Z.C. Zhao, B.J. Murdoch, D.R. McKenzie, D.G. McCulloch, J.G. Partridge, Carbon 136, 280–285 (2018)
B. Ghosh, S.C. Ray, R. Espinoza-González, R. Villarroel, S.A. Hevia, P. Alvarez-Vega, Chem. Phys. Lett. 698, 60–66 (2018)
A.S. Saleemi, R. Singh, Z. Luo, X. Zhang, Diam. Relat. Mater. 72, 108–113 (2017)
J. Robertson, Mater. Sci. Eng., R 37, 129–281 (2002)
W. Zhang, Y. Hirai, T. Tsuchiya, O. Tabata, Appl. Surf. Sci. 443, 48–54 (2018)
K. Ankit, A. Varade, N. Reddy, S. Dhan, M. Chellamalai, N. Balashanmugam, P. Krishna, Diam. Relat. Mater. 78, 39–43 (2017)
Z. Zhai, H. Shen, J. Chen, X. Li, Y. Jiang, A.C.S. Appl, Mater. Interfaces 10, 17427–17436 (2018)
D. Du, D. Liu, Z. Ye, X. Zhang, F. Li, Z. Zhou, L. Yu, Appl. Surf. Sci. 313, 462–469 (2014)
B. Ren, L. Wang, L. Wang, J. Huang, K. Tang, Y. Lou, D. Yuan, Z. Pan, Y. Xia, Vacuum 107, 1–5 (2014)
A.A. Solovyev, K.V. Oskomov, A.S. Grenadyorov, P.D. Maloney, Thin Solid Films 650, 37–43 (2018)
N. Konkhunthot, S. Tunmee, X.L. Zhou, K. Komatsu, P. Photongkam, H. Saitoh, P. Wongpanya, Thin Solid Films 653, 317–325 (2018)
M. Tsuchiya, K. Murakami, K. Magara, K. Nakamura, H. Ohashi, K. Tokuda, T. Takami, H. Ogasawara, Y. Enta, Y. Suzuki, Jpn. J. Appl. Phys. 55(6), 065502 (2016)
R.U.R. Sagar, X. Zhang, C. Xiong, Y. Yu, Carbon 76, 64–70 (2014)
Z. Zhai, H. Shen, J. Chen, J. Li, S. Zhang, RSC Adv. 6(48), 42353–42360 (2016)
N. Salah, A. Alshahrie, J. Iqbal, P.M.Z. Hasan, M.S. Abdel-wahab, Tribol. Int. 103, 274–280 (2016)
Z. Zhai, H. Shen, J. Chen, Y. Jiang, Q. Tang, Carbon 117, 322–330 (2017)
H. Nakayama, K. Takatsuji, S. Moriwaki, K. Murakami, K. Mizoguchi, M. Nakayama, Y. Miura, Thin Solid Films 430, 309–312 (2003)
T. Wu, H. Shen, B. Cheng, Y. Pan, B. Liu, J. Shen, Appl. Surf. Sci. 258, 999–1003 (2011)
H. Oh, K. Cho, S. Kim, J. Korean Phys. Soc. 67(4), 638–642 (2015)
M.R. Derakhshandeh, M.J. Eshraghi, M.M. Hadavi, M. Javaheri, S. Khamseh, M.G. Sari, P. Zarrintaj, M.R. Saeb, M. Mozafari, Surf. Innov. 6(3), 167–175 (2018)
D. Bootkul, B. Supsermpol, N. Saenphinit, C. Aramwit, S. Intarasiri, Appl. Surf. Sci. 310, 284–292 (2014)
J.L. Andújar, F.J. Pino, M.C. Polo, A. Pinyol, C. Corbella, E. Bertran, Diam. Relat. Mater. 11, 1005–1009 (2002)
C. Wang, J. Shi, R. Xia, Z. Geng, Surf. Interface Anal. 45(4), 800–804 (2013)
J. Hao, T. Xu, W. Liu, J. Non-Cryst, Solids 351(49–51), 3671–3676 (2005)
M. Rusop, A.M.M. Omer, S. Adhikari, S. Adhikary, H. Mokutani, N. Hasegawa, S. Kato, H. Uchida, T. Soga, T. Jimbo, M. Umeno, Surf. Rev. Lett. 11(06), 553–558 (2004)
N. Ma, D. Jena, Phys. Rev. X 4(1), 011043 (2014)
M. Khadem, O.V. Penkov, V.E. Pukha, M.V. Maleyev, D.E. Kim, Carbon 80, 534–543 (2014)
S. Bhaviripudi, X. Jia, M.S. Dresselhaus, J. Kong, Nano Lett. 10(10), 4128–4133 (2010)
Y. Wang, H. Li, L. Ji, F. Zhao, X. Liu, Q. Kong, Y. Wang, W. Quan, H. Zhou, J. Chen, J. Phys. D 43(50), 505401 (2010)
X.L. Peng, Z.H. Barber, T.W. Clyne, Surf. Coat. Tech. 138, 23–32 (2001)
J. Tauc, Mater. Res. Bull. 3(1), 37–46 (1968)
Acknowledgements
Financial support from National Nature Science Foundation of China (Grant Nos. 61774084, 51702159) and a Project Funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions is gratefully acknowledged. Also, this work is supported by Funding for Outstanding Doctoral Dissertation in NUAA (Grant No. BCXJ17-08), Postgraduate Research & Practice Innovation Program of Jiangsu Province (Grant No. KYCX17_0251), NSF of Jiangsu province (Grant No. BK20170791), National and Jiangsu Postdoctoral Research Funds (Grant Nos. 2017M610328, 2018T110494, 1701141B), and Open Fund of Jiangsu Key Laboratory of Materials and Technology for Energy Conversion (Grant No. MTEC-2018M02).
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Zhai, Z., Shen, H., Chen, J. et al. Effect of deposition pressure on the properties of amorphous carbon films by hot-filament chemical vapor deposition. J Mater Sci: Mater Electron 30, 10145–10151 (2019). https://doi.org/10.1007/s10854-019-01350-9
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DOI: https://doi.org/10.1007/s10854-019-01350-9