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Effects of annealing process and the additive on the electrical properties of chemical solution deposition derived 0.65Pb(Mg1/3Nb2/3)O3–0.35PbTiO3 thin films

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Abstract

0.65Pb(Mg1/3Nb2/3)O3–0.35PbTiO3 (PMN–PT) thin films were deposited on (111)Pt/Ti/SiO2/Si substrates via the chemical solution deposition. Both of the annealing process and additive methanamide play an obvious part in the structure and electrical properties of PMN–PT films. The optimized high-qualitied PMN–PT thin film in present work is fabricated with the methanamide in the precursor and annealed at 650 °C for 20 min. The film exhibits pure perovskite phase and superior ferroelectricity. The saturation polarization Ps and remanent polarization Pr are 52.1 µC/cm2 and 18.7 µC/cm2 at 500 kV/cm with 1000 Hz. It also shows low leakage current density of approximately 1.0 × 10− 8 A/cm2 at 200 kV/cm.

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References

  1. Y. Lu, J. Zheng, M. Golomb, F. Wang, H. Jiang, J. Zhao, Appl. Phys. Lett. 74, 3764 (1999)

    Article  CAS  Google Scholar 

  2. R. Herdier, M. Detalle, D. Jenkins, C. Soyer, D. Remiens, Sens. Actuators A 148, 122–128 (2008)

    Article  CAS  Google Scholar 

  3. J.C. Frederick, T.H. Kim, W. Maeng, A.A. Brewer, J.P. Podkaminer, W. Saenrang, V. Vaithyanathan, F. Li, L.Q. Chen, D.G. Schlom, S. Trolier-McKinstry, M.S. Rzchowski, C.B. Eom, Appl. Phys. Lett. 108, 132902 (2016)

    Article  Google Scholar 

  4. J.C. Ho, K.S. Liu, I.N. Lin, J. Mater. Sci. 28, 4497–4502 (1993)

    Article  CAS  Google Scholar 

  5. D.G. Zhou, H.J. Sun, X.F. Liu, H.T. Sui, Q.H. Gou, P.D. Liu, Y. Ruan, Ceram. Int. 43, 5901–5906 (2017)

    Article  CAS  Google Scholar 

  6. T.Y. Koo, S.W. Cheong, Appl. Phys. Lett. 80, 4205–4207 (2002)

    Article  CAS  Google Scholar 

  7. H. Luo, G. Xu, H. Xu, P. Wang, Z. Yin, Jpn. J. Appl. Phys. 39, 5581–5581 (2000)

    Article  CAS  Google Scholar 

  8. Y.C. Zhang, Z.Z. Yang, W.N. Ye, C.J. Lu, L.H. Xia, J. Mater. Sci. Mater. Electron. 22, 309–314 (2011)

    Article  CAS  Google Scholar 

  9. S.H. Baek, J. Park, D.M. Kim, V.A. Aksyuk, R.R. Das, S.D. Bu, D.A. Felker, J. Lettieri, V. Vaithyanathan, S.S.N. Bharadwaja, N. Bassiri-Gharb, Y.B. Chen, H.P. Sun, C.M. Folkman, H.W. Jang, D.J. Kreft, S.K. Streiffer, R. Ramesh, X.Q. Pan, S. Trolier-McKinstry, D.G. Schlom, M.S. Rzchowski, R.H. Blick, C.B. Eom, Science 334, 958–961 (2011)

    Article  CAS  Google Scholar 

  10. S. Nagakari, K. Kamigaki, S. Nambu, Jpn. J. Appl. Phys. 35, 4933–4935 (1996)

    Article  CAS  Google Scholar 

  11. T.C. Goel, P. Kumar, A.R. James, C. Prakash, J. Electroceram. 13, 503–507 (2004)

    Article  CAS  Google Scholar 

  12. W. Gong, J.F. Li, X. Chu, L. Li, J. Am. Ceram. Soc. 87, 1031–1034 (2004)

    Article  CAS  Google Scholar 

  13. P. Kumar, Sonia, R.K. Patel, C. Prakash, T.C. Goel, Mater. Chem. Phys. 110, 7–10 (2008)

    Article  CAS  Google Scholar 

  14. J.H. Lee, M.R. Choi, W. Jo, J.Y. Jang, M.Y. Kim, Ultramicroscopy 108, 1106–1109 (2008)

    Article  CAS  Google Scholar 

  15. S.Y. Lee, M.C.C. Custodio, H.J. Lim, R.S. Feigelson, J.P. Maria, S. Trolier-McKinstry, J. Cryst. Growth 226, 247–253 (2001)

    Article  CAS  Google Scholar 

  16. X.L. Wang, L. Zhang, X.H. Hao, S.L. An, Mater. Res. Bull. 65, 73–79 (2015)

    Article  CAS  Google Scholar 

  17. X.Y. Chen, J. Wang, K.H. Wong, C.L. Mak, G.X. Chen, J.M. Liu, M. Wang, Z.G. Liu, Appl. Phys. A 81, 1145–1149 (2005)

    Article  CAS  Google Scholar 

  18. M. Nayak, S.Y. Lee, T.Y. Tseng, Mater. Chem. Phys. 77, 34–42 (2002)

    Article  Google Scholar 

  19. M. Feng, W. Wang, H. Ke, J.C. Rao, Y. Zhou, J. Alloys Compd 495, 154–157 (2010)

    Article  CAS  Google Scholar 

  20. T. Arai, T. Ohno, T. Matsuda, N. Sakamoto, N. Wakiya, H. Suzuki, Thin Solid Films 585, 86–90 (2015)

    Article  CAS  Google Scholar 

  21. Y.C. Zhang, W.N. Ye, Z.Z. Yang, C.J. Lu, L.H. Xia, J. Mater. Sci. Mater. Electron. 22, 91–95 (2011)

    Article  CAS  Google Scholar 

  22. K. Okuwada, M. Imai, K. Kukuno, Jpn. J. Appl. Phys. 29, L1271–L1273 (1989)

    Article  Google Scholar 

  23. Y. Narendar, G.L. Messing, J. Am. Ceram. Soc. 80, 915–924 (1997)

    Article  CAS  Google Scholar 

  24. J.F. Scott, J. Phys. Condens. Matter 20, 021001 (2008)

    Article  Google Scholar 

  25. Y. Ishibashiand, H. Orihara, Integr. Ferroelectr. 9, 57–61 (1995)

    Article  Google Scholar 

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Acknowledgements

This work was supported by the National Natural Science Foundation of China (51572123); A Project Funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions (PAPD). The authors would thank Professor Y. H. Lin and Dr. J. Ma of Tsinghua University for their helpful discussion.

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Authors and Affiliations

  1. State Key Laboratory of Mechanics and Control of Mechanical Structures, College of Aerospace Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China

    Bowen Shen, Jing Wang, Kongjun Zhu & Jinhao Qiu

  2. School of Materials Science and Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China

    Bowen Shen

  3. School of Materials Science and Engineering, and State Key Lab of New Ceramics and Fine Processing, Tsinghua University, Beijing, 100084, China

    Hao Pan, Jiahui Chen, Jialu Wu, Mingfeng Chen & Ruixue Zhao

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  1. Bowen Shen
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  2. Jing Wang
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  3. Hao Pan
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  4. Jiahui Chen
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  9. Jinhao Qiu
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Correspondence to Jing Wang.

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Shen, B., Wang, J., Pan, H. et al. Effects of annealing process and the additive on the electrical properties of chemical solution deposition derived 0.65Pb(Mg1/3Nb2/3)O3–0.35PbTiO3 thin films. J Mater Sci: Mater Electron 29, 16997–17002 (2018). https://doi.org/10.1007/s10854-018-9795-4

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  • DOI: https://doi.org/10.1007/s10854-018-9795-4

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